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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Dumpala, S.; Broderick, S.R.; Khalilov, U.; Neyts, E.C.; van Duin, A.C.T.; Provine, J.; Howe, R.T.; Rajan, K. |
Integrated atomistic chemical imaging and reactive force field molecular dynamic simulations on silicon oxidation |
2015 |
Applied physics letters |
106 |
19 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Yan, M.; Bogaerts, A.; Gijbels, R. |
Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge |
2001 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
63 |
4 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Chen, Z.; Bogaerts, A. |
Laser ablation of Cu and plume expansion into 1 atm ambient gas |
2005 |
Journal of applied physics |
97 |
131 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bleiner, D.; Bogaerts, A.; Belloni, F.; Nassisi, V. |
Laser-induced plasmas from the ablation of metallic targets: the problem of the onset temperature, and insights on the expansion dynamics |
2007 |
Journal of applied physics |
101 |
31 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Local and fast relaxation phenomena after laser-induced photodetachment in a strongly electronegative rf discharge |
2002 |
Physical review : E : statistical, nonlinear, and soft matter physics |
65 |
2 |
UA library record; WoS full record; WoS citing articles |
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Ignatova, V.A.; Lebedev, O.I.; Watjen, U.; van Vaeck, L.; van Landuyt, J.; Gijbels, R.; Adams, F. |
Metal and composite nanocluster precipitate formation in silicon dioxide implanted with Sb+ ions |
2002 |
Journal of applied physics |
92 |
5 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Modeling network for argon glow discharges: the output cannot be better than the input |
2000 |
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1 |
UA library record; WoS full record; WoS citing articles |
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Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. |
Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model |
2002 |
Journal of applied physics |
92 |
15 |
UA library record; WoS full record; WoS citing articles |
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de Witte, H.; Vandervorst, W.; Gijbels, R. |
Modeling of bombardment induced oxidation of silicon |
2001 |
Journal of applied physics |
89 |
16 |
UA library record; WoS full record; WoS citing articles |
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Ariskin, D.A.; Schweigert, I.V.; Alexandrov, A.L.; Bogaerts, A.; Peeters, F.M. |
Modeling of chemical processes in the low pressure capacitive radio frequency discharges in a mixture of Ar/C2H2 |
2009 |
Journal of applied physics |
105 |
21 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
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Wendelen, W.; Mueller, B.Y.; Autrique, D.; Bogaerts, A.; Rethfeld, B. |
Modeling ultrashort laser-induced emission from a negatively biased metal |
2013 |
Applied physics letters |
103 |
8 |
UA library record; WoS full record; WoS citing articles |
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Gou, F.; Neyts, E.; Eckert, M.; Tinck, S.; Bogaerts, A. |
Molecular dynamics simulations of Cl+ etching on a Si(100) surface |
2010 |
Journal of applied physics |
107 |
15 |
UA library record; WoS full record; WoS citing articles |
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de Bleecker, K.; Bogaerts, A.; Goedheer, W.J. |
Nanoparticle growth and transport mechanisms in capacitively coupled silane discharges: a numerical investigation |
2005 |
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UA library record; WoS full record; |
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Georgieva, V.; Bogaerts, A. |
Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics |
2005 |
Journal of applied physics |
98 |
75 |
UA library record; WoS full record; WoS citing articles |
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Georgieva, V.; Bogaerts, A.; Gijbels, R. |
Numerical study of Ar/CF4/N2 discharges in single and dual frequency capacitively coupled plasma reactors |
2003 |
Journal of applied physics |
94 |
90 |
UA library record; WoS full record; WoS citing articles |
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Cenian, A.; Chernukho, A.; Bogaerts, A.; Gijbels, R.; Leys, C. |
Particle-in-cell Monte Carlo modeling of Langmuir probes in an Ar plasma |
2005 |
Journal of applied physics |
97 |
18 |
UA library record; WoS full record; WoS citing articles |
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Georgieva, V.; Bogaerts, A.; Gijbels, R. |
Particle-in-cell/Monte Carlo simulation of a capacitively coupled radio frequency Ar/Cf4 discharge: effect of gas composition |
2003 |
Journal of applied physics |
93 |
57 |
UA library record; WoS full record; WoS citing articles |
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Neyts, E.; Yan, M.; Bogaerts, A.; Gijbels, R. |
Particle-in-cell/Monte Carlo simulations of a low-pressure capacitively coupled radio-frequency discharge: effect of adding H2 to an Ar discharge |
2003 |
Journal of applied physics |
93 |
15 |
UA library record; WoS full record; WoS citing articles |
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Chen, Z.; Bogaerts, A.; Vertes, A. |
Phase explosion in atmospheric pressure infrared laser ablation from water-rich targets |
2006 |
Applied physics letters |
89 |
32 |
UA library record; WoS full record; WoS citing articles |
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Wen, D.-Q.; Zhang, Q.-Z.; Jiang, W.; Song, U.-H.; Bogaerts, A.; Wang, Y.-N. |
Phase modulation in pulsed dual-frequency capacitively coupled plasmas |
2014 |
Journal of applied physics |
115 |
8 |
UA library record; WoS full record; WoS citing articles |
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Martens, T.; Bogaerts, A.; van Dijk, J. |
Pulse shape influence on the atmospheric barrier discharge |
2010 |
Applied physics letters |
96 |
35 |
UA library record; WoS full record; WoS citing articles |
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Chen, Z.; Bogaerts, A. |
Response to “Comment on 'Laser ablation of Cu and plume expansion into 1 atm ambient gas'” [J. Appl. Phys. 115, 166101 (2014)] |
2014 |
Journal of applied physics |
115 |
1 |
UA library record; WoS full record; WoS citing articles |
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Autrique, D.; Gornushkin, I.; Alexiades, V.; Chen, Z.; Bogaerts, A.; Rethfeld, B. |
Revisiting the interplay between ablation, collisional, and radiative processes during ns-laser ablation |
2013 |
Applied physics letters |
103 |
13 |
UA library record; WoS full record; WoS citing articles |
|
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Bogaerts, A.; Gijbels, R. |
The role of fast argon ions and atoms in the ionization of argon in a direct current glow discharge: a mathematical simulation |
1995 |
Journal of applied physics |
78 |
60 |
UA library record; WoS full record; WoS citing articles |
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Autrique, D.; Clair, G.; L'Hermite, D.; Alexiades, V.; Bogaerts, A.; Rethfeld, B. |
The role of mass removal mechanisms in the onset of ns-laser induced plasma formation |
2013 |
Journal of applied physics |
114 |
31 |
UA library record; WoS full record; WoS citing articles |
|
|
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Bogaerts, A.; Gijbels, R. |
Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model |
1996 |
Journal of applied physics |
79 |
81 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description |
1999 |
Journal of applied physics |
86 |
50 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Baguer, N.; Bogaerts, A.; Gijbels, R. |
Role of the fast Ar atoms, Ar+ ions and metastable Ar atoms in a hollow cathode glow discharge: study by a hybrid model |
2003 |
Journal of applied physics |
94 |
19 |
UA library record; WoS full record; WoS citing articles |
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Depla, D.; Li, X.Y.; Mahieu, S.; van Aeken, K.; Leroy, W.P.; Haemers, J.; de Gryse, R.; Bogaerts, A. |
Rotating cylindrical magnetron sputtering: simulation of the reactive process |
2010 |
Journal of applied physics |
107 |
15 |
UA library record; WoS full record; WoS citing articles |
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