|
Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. |
Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges |
2010 |
Plasma sources science and technology |
19 |
116 |
UA library record; WoS full record; WoS citing articles |
|
|
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. |
Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations |
2011 |
Plasma sources science and technology |
20 |
38 |
UA library record; WoS full record; WoS citing articles |
|
|
Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. |
Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis |
2015 |
Plasma sources science and technology |
24 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
|
|
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. |
Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges |
2013 |
Plasma sources science and technology |
22 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
|
|
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. |
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation |
2013 |
Plasma sources science and technology |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
|
|
Kozák, T.; Bogaerts, A. |
Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model |
2015 |
Plasma sources science and technology |
24 |
100 |
UA library record; WoS full record; WoS citing articles |
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. |
Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas |
2013 |
Plasma sources science and technology |
22 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. |
Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux |
2005 |
Plasma sources science and technology |
14 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
|
|
Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. |
Modeling of a dielectric barrier discharge used as a flowing chemical reactor |
2008 |
Journal of physics : conference series |
133 |
6 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Aerts, R.; Snoeckx, R.; Somers, W.; Van Gaens, W.; Yusupov, M.; Neyts, E. |
Modeling of plasma and plasma-surface interactions for medical, environmental and nano applications |
2012 |
Journal of physics : conference series |
399 |
7 |
UA library record; WoS full record; WoS citing articles |
|
|
Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
|
|
de Bleecker, K.; Bogaerts, A.; Goedheer, W. |
Modelling of nanoparticle coagulation and transport dynamics in dusty silane discharges |
2006 |
New journal of physics |
8 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
Van Gaens, W.; Iseni, S.; Schmidt-Bleker, A.; Weltmann, K.-D.; Reuter, S.; Bogaerts, A. |
Numerical analysis of the effect of nitrogen and oxygen admixtures on the chemistry of an argon plasma jet operating at atmospheric pressure |
2015 |
New journal of physics |
17 |
29 |
UA library record; WoS full record; WoS citing articles |
|
|
Van Gaens, W.; Bruggeman, P.J.; Bogaerts, A. |
Numerical analysis of the NO and O generation mechanism in a needle-type plasma jet |
2014 |
New journal of physics |
16 |
34 |
UA library record; WoS full record; WoS citing articles |
|
|
Jiang, W.; Zhang, Y.; Bogaerts, A. |
Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors |
2014 |
New journal of physics |
16 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Bultinck, E.; Bogaerts, A. |
Particle-in-cell/Monte Carlo collisions treatment of an Ar/O2 magnetron discharge used for the reactive sputter deposition of TiOx films |
2009 |
New journal of physics |
11 |
24 |
UA library record; WoS full record; WoS citing articles |
|
|
Georgieva, V.; Bogaerts, A. |
Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model |
2006 |
Plasma sources science and technology |
15 |
35 |
UA library record; WoS full record; WoS citing articles |
|
|
Mao, M.; Bogaerts, A. |
Plasma chemistry modeling for an inductively coupled plasma used for the growth of carbon nanotubes |
2011 |
Journal of physics : conference series |
275 |
|
UA library record |
|
|
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. |
Reaction mechanisms and thin a-C:H film growth from low energy hydrocarbon radicals |
2007 |
Journal of physics : conference series |
86 |
22 |
UA library record; WoS full record; WoS citing articles |
|
|
Van Gaens, W.; Bogaerts, A. |
Reaction pathways of biomedically active species in an Ar plasma jet |
2014 |
Plasma sources science and technology |
23 |
34 |
UA library record; WoS full record; WoS citing articles |
|
|
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. |
Reactive sputter deposition of TiNx films, simulated with a particle-in-cell/Monte Carlo collisions model |
2009 |
New journal of physics |
11 |
23 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Neyts, E.C.; Rousseau, A. |
Special issue on fundamentals of plasmasurface interactions |
2014 |
Journal of physics: D: applied physics |
47 |
2 |
UA library record; WoS full record; WoS citing articles |
|
|
Kozák, T.; Bogaerts, A. |
Splitting of CO2 by vibrational excitation in non-equilibrium plasmas : a reaction kinetics model |
2014 |
Plasma sources science and technology |
23 |
170 |
UA library record; WoS full record; WoS citing articles |
|
|
Yusupov, M.; Saraiva, M.; Depla, D.; Bogaerts, A. |
Sputter deposition of MgxAlyOz thin films in a dual-magnetron device : a multi-species Monte Carlo model |
2012 |
New journal of physics |
14 |
2 |
UA library record; WoS full record; WoS citing articles |
|
|
Zhang, Y.; Wang, H.-yu; Jiang, W.; Bogaerts, A. |
Two-dimensional particle-in cell/Monte Carlo simulations of a packed-bed dielectric barrier discharge in air at atmospheric pressure |
2015 |
New journal of physics |
17 |
22 |
UA library record; WoS full record; WoS citing articles |
|
|
Neyts, E.C.; Bogaerts, A. |
Understanding plasma catalysis through modelling and simulation : a review |
2014 |
Journal of physics: D: applied physics |
47 |
130 |
UA library record; WoS full record; WoS citing articles |
|