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Thermal conductivity of titanium nitride/titanium aluminum nitride multilayer coatings deposited by lateral rotating cathode arc”. Samani MK, Ding XZ, Khosravian N, Amin-Ahmadi B, Yi Y, Chen G, Neyts EC, Bogaerts A, Tay BK, Thin solid films : an international journal on the science and technology of thin and thick films 578, 133 (2015). http://doi.org/10.1016/j.tsf.2015.02.032
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Modeling a Langmuir probe in atmospheric pressure plasma at different EEDFs”. Trenchev G, Kolev S, Kiss’ovski Z, Plasma sources science and technology 26, 055013 (2017). http://doi.org/10.1088/1361-6595/aa63c2
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QDB: a new database of plasma chemistries and reactions”. Tennyson J, Rahimi S, Hill C, Tse L, Vibhakar A, Akello-Egwel D, Brown DB, Dzarasova A, Hamilton JR, Jaksch D, Mohr S, Wren-Little K, Bruckmeier J, Agarwal A, Bartschat K, Bogaerts A, Booth J-P, Goeckner MJ, Hassouni K, Itikawa Y, Braams BJ, Krishnakumar E, Laricchiuta A, Mason NJ, Pandey S, Petrovic ZL, Pu Y-K, Ranjan A, Rauf S, Schulze J, Turner MM, Ventzek P, Whitehead JC, Yoon J-S, Plasma sources science and technology 26, 055014 (2017). http://doi.org/10.1088/1361-6595/aa6669
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Dehazing redox homeostasis to foster purple bacteria biotechnology”. Alloul A, Blansaer N, Cabecas Segura P, Wattiez R, Vlaeminck SE, Leroy B, Trends in biotechnology : regular edition 41, 106 (2023). http://doi.org/10.1016/J.TIBTECH.2022.06.010
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A 2D model for a gliding arc discharge”. Kolev S, Bogaerts A, Plasma sources science and technology 24, 015025 (2015). http://doi.org/10.1088/0963-0252/24/1/015025
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Addition of yttrium into HfO2 films: microstructure and electrical properties”. Dubourdieu C, Rauwel E, Roussel H, Ducroquet F, Hollaender B, Rossell M, Van Tendeloo G, Lhostis S, Rushworth S, Journal of vacuum science and technology: A: vacuum surfaces and films 27, 503 (2009). http://doi.org/10.1116/1.3106627
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Aerosol synthesis and characterization of ultrafine fullerene particles”. van Cleempoel A, Joutsensaari J, Kauppinen E, Gijbels R, Claeys M, Fullerene science and technology 6, 599 (1998). http://doi.org/10.1080/10641229809350223
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Alternative metals for advanced interconnects”. Adelmann C, Wen LG, Peter AP, Pourtois G, et al, 2014 Ieee International Interconnect Technology Conference / Advanced Metallization Conference (iitc/amc) , 173 (2014)
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Analysis of silver halide microcrystals using different modes of a scanning transmission electron microscope and digital image processing”. Geuens I, Gijbels R, Jacob WA, Verbeeck A, de Keyzer R, The journal of imaging science and technology 36, 534 (1992)
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Asymmetric dyes align inside carbon nanotubes to yield a large nonlinear optical response”. Cambré, S, Campo J, Beirnaert C, Verlackt C, Cool P, Wenseleers W, Nature nanotechnology 10, 248 (2015). http://doi.org/10.1038/nnano.2015.1
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Bloch and localized electrons in semiconductor superlattices”. Helm M, Hilber W, Fromherz T, Peeters FM, Alavi K, Pathak RN, Semiconductor science and technology 9, 1989 (1994). http://doi.org/10.1088/0268-1242/9/11S/022
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CdSe quantum dot formation: alternative paths to relaxation of a strained CdSe layer and influence of the capping conditions”. Robin I-C, Aichele T, Bougerol C, André, R, Tatarenko S, Bellet-Amalric E, van Daele B, Van Tendeloo G, Nanotechnology 18, 265701 (2007). http://doi.org/10.1088/0957-4484/18/26/265701
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Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model”. Bultinck E, Bogaerts A, Plasma sources science and technology 20, 045013 (2011). http://doi.org/10.1088/0963-0252/20/4/045013
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Chemical solution deposition: a path towards low cost coated conductors”. Obradors X, Puig T, Pomar A, Sandiumenge F, Piñol S, Mestres N, Castaño O, Coll M, Cavallaro A, Palau A, Gázquez J, González JC, Gutiérrez J, Romá, N, Ricart S, Moretó, JM, Rossell MD, Van Tendeloo G, Superconductor science and technology 17, 1055 (2004). http://doi.org/10.1088/0953-2048/17/8/020
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A comparative investigation of replication techniques used for the study of (S+Au) sensitized AgBr microcrystals”. Buschmann V, Schryvers D, van Landuyt J, van Roost C, de Keyzer R, The journal of imaging science and technology 40, 189 (1996)
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Comprehensive modelling network for dc glow discharges in argon”. Bogaerts A, Plasma sources science and technology 8, 210 (1999). http://doi.org/10.1088/0963-0252/8/2/003
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Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition”. Tinck S, Bogaerts A, Plasma sources science and technology 20, 015008 (2011). http://doi.org/10.1088/0963-0252/20/1/015008
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Control and readout of current-induced magnetic flux quantization in a superconducting transformer”. Kerner C, Hackens B, Golubović, DS, Poli S, Faniel S, Magnus W, Schoenmaker W, Bayot V, Maes H, Superconductor science and technology 22, 025001 (2009). http://doi.org/10.1088/0953-2048/22/2/025001
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Controllable synthesis of novel one-dimensional carbon nanomaterials on an alkali-element-modified Cu catalyst”. Tao XY, Zhang XB, Cheng J-P, Liu F, Li Y, Van Tendeloo G, Nanotechnology 17, 224 (2006). http://doi.org/10.1088/0957-4484/17/1/037
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Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges”. Paulussen S, Verheyde B, Tu X, De Bie C, Martens T, Petrovic D, Bogaerts A, Sels B, Plasma sources science and technology 19, 034015 (2010). http://doi.org/10.1088/0963-0252/19/3/034015
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Critical assessment of the process of growth of a YBa2Cu3O7-\delta layer on Y2BaCuO5”. Jacques P, Verbist K, Lapin J, Ryelandt L, Van Tendeloo G, Delannay F, Superconductor science and technology 9, 176 (1996). http://doi.org/10.1088/0953-2048/9/3/008
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Crystalline structure of very hard tungsten carbide thin films obtained by reactive pulsed laser deposition”. Mihailescu IN, Gyorgy E, Marin G, Popescu M, Teodorescu VS, van Landuyt J, Grivas C, Hatziapostolou A, Journal of vacuum science and technology: A: vacuum surfaces and films 17, 249 (1999). http://doi.org/10.1116/1.581579
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Crystallographic aspects related to advanced tribological multilayers of Cr/CrN and Ti/TiN types produced by pulsed laser deposition (PLD)”. Major L, Morgiel J, Major B, Lackner JM, Waldhauser W, Ebner R, Nistor L, Van Tendeloo G, Surface and coatings technology 200, 6190 (2006). http://doi.org/10.1016/j.surfcoat.2005.11.021
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Crystallographic plane tuning of charge and spin transport in semiconductor quantum wires”. Wang M, Chang K, Wang LG, Dai N, Peeters FM, Nanotechnology 20, 365202 (2009). http://doi.org/10.1088/0957-4484/20/36/365202
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Defects in high-dose oxygen implanted silicon : a TEM study”. Deveirman A, van Landuyt J, Vanhellemont J, Maes HE, Yallup K, Vacuum: the international journal and abstracting service for vacuum science and technology T2 –, 1ST SIOMX WORKSHOP ( SEPARATION BY IMPLANTATION OF OXYGEN ) ( SWI-88 ), NOV 07-08, 1988, UNIV SURREY, GUILDFORD, ENGLAND 42, 367 (1991). http://doi.org/10.1016/0042-207X(91)90055-N
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Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations”. De Bie C, Martens T, van Dijk J, Paulussen S, Verheyde B, Corthals S, Bogaerts A, Plasma sources science and technology 20, 024008 (2011). http://doi.org/10.1088/0963-0252/20/2/024008
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Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis”. Peerenboom K, Parente A, Kozák T, Bogaerts A, Degrez G, Plasma sources science and technology 24, 025004 (2015). http://doi.org/10.1088/0963-0252/24/2/025004
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Effect of high-frequency electromagnetic field on Te+-implanted (001) Si</tex>”. Kalitzova M, Vlakhov E, Marinov Y, Gesheva K, Ignatova VA, Lebedev O, Muntele C, Gijbels R, Vacuum: the international journal and abstracting service for vacuum science and technology 76, 325 (2004). http://doi.org/10.1016/j.vacuum.2004.07.055
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Effect of selenium content of CuInSex alloy nanopowder precursors on recrystallization of printed CuInSe2 absorber layers during selenization heat treatment”. E Zaghi A, Buffière M, Koo J, Brammertz G, Batuk M, Verbist C, Hadermann J, Kim WK, Meuris M, Poortmans J, Vleugels J;, Thin solid films : an international journal on the science and technology of thin and thick films , 1 (2014). http://doi.org/10.1016/j.tsf.2014.10.003
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The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 21, 025008 (2012). http://doi.org/10.1088/0963-0252/21/2/025008
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