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Author Title Year Publication Volume Times cited Additional Links
Verbist, K.; Lebedev, O.I.; Verhoeven, M.A.J.; Winchern, R.; Rijnders, A.J.H.M.; Blank, D.H.A.; Tafuri, F.; Bender, H.; Van Tendeloo, G. Microstructure of YBa2Cu3O7-\delta Josephson junctions in relation to their properties 1998 Superconductor science and technology 11 UA library record; WoS full record; WoS citing articles
Vasiliev, A.L.; Van Tendeloo, G.; Boikov, Y.; Olsson, E.; Ivanov, S. Microstructure of YBa2Cu3O7-x films on buffered Si for microelectronic applications 1997 Superconductor science and technology 10 2 UA library record; WoS full record; WoS citing articles
Zhang, Y.-R.; Tinck, S.; De Schepper, P.; Wang, Y.-N.; Bogaerts, A. Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime 2015 Journal of vacuum science and technology: A: vacuum surfaces and films 33 3 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; de Bleecker, K.; Kolev, I.; Madani, M. Modeling of gas discharge plasmas: What can we learn from it? 2005 Surface and coatings technology 200 11 UA library record; WoS full record; WoS citing articles
Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. Modeling of the target surface modification by reactive ion implantation during magnetron sputtering 2004 Journal of vacuum science and technology: A: vacuum surfaces and films 22 13 UA library record; WoS full record; WoS citing articles
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles
Trofimova, E.Y.; Kurdyukov, D.A.; Yakovlev, S.A.; Kirilenko, D.A.; Kukushkina, Y.A.; Nashchekin, A.V.; Sitnikova, A.A.; Yagovkina, M.A.; Golubev, V.G. Monodisperse spherical mesoporous silica particles : fast synthesis procedure and fabrication of photonic-crystal films 2013 Nanotechnology 24 49 UA library record; WoS full record; WoS citing articles
de Witte, K.; Cool, P.; de Witte, I.; Ruys, L.; Rao, J.; Van Tendeloo, G.; Vansant, E.F. Multistep loading of titania nanoparticles in the mesopores of SBA-15 for enhanced photocatalytic activity 2007 Journal of nanoscience and nanotechnology 7 13 UA library record; WoS full record; WoS citing articles
Cheng, J.P.; Zhang, X.B.; Ye, Y.; Tao, X.Y.; Liu, F.; Li, Y.; Van Tendeloo, G. Natural mineral-marine manganese nodule as a novel catalyst for the synthesis of carbon nanotubes 2006 Journal of Wuhan University of Technology: materials science edition 21 UA library record; WoS full record; WoS citing articles
Goessens, C.; Schryvers, D.; van Landuyt, J.; de Keyzer, R. New method to determine the parity of the number of twin planes in tabular silver halide microcrystals from top views 1997 The journal of imaging science and technology 41 1 UA library record; WoS full record; WoS citing articles
Kastalsky, A.; Peeters, F.M.; Chan, W.K.; Florez, L.T.; Harbison, J.P. Novel nonlinear transport phenomena in a triangular quantum well 1992 Semiconductor science and technology: B 7 4 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Gijbels, R. Numerical modelling of gas discharge plasmas for various applications 2003 Vacuum: surface engineering, surface instrumentation & vacuum technology 69 16 UA library record; WoS full record; WoS citing articles
Kolev, I.; Bogaerts, A. Numerical study of the sputtering in a dc magnetron 2009 Journal of vacuum science and technology: A: vacuum surfaces and films 27 66 UA library record; WoS full record; WoS citing articles
Huq, M.Z.; Celis, J.P.; Meneve, J.; Stals, L.; Schryvers, D. Oscillating sliding wear of mono- and multilayer ceramic coatings in air 1999 Surface and coatings technology 113 10 UA library record; WoS full record; WoS citing articles
Neyts, E.C. PECVD growth of carbon nanotubes : from experiment to simulation 2012 Journal of vacuum science and technology: B: micro-electronics processing and phenomena 30 42 UA library record; WoS full record; WoS citing articles
Georgieva, V.; Bogaerts, A. Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model 2006 Plasma sources science and technology 15 35 UA library record; WoS full record; WoS citing articles
Vanhellemont, J.; Romano Rodriguez, A.; Fedina, L.; van Landuyt, J.; Aseev, A. Point defect reactions in silicon studied in situ by high flux electron irradiation in high voltage transmission electron microscope 1995 Materials science and technology 11 7 UA library record; WoS full record; WoS citing articles
Vanhellemont, J.; Romano-Rodriguez, A.; Fedina, L.; van Landuyt, J.; Aseev, A. Point defect reactions in silicon studies in situ by high flux electron irradiation in high voltage transmission electron microscope 1995 Materials science and technology 11 7 UA library record; WoS full record; WoS citing articles
van Cleempoel, A.; Gijbels, R.; Zhu, D.; Claeys, M.; Richter, H.; Fonseca, A. Quantitative determination of C60 and C70 in soot extracts by high performance liquid chromatography and mass spectrometric characterization 1996 Fullerene science and technology 4 6 UA library record; WoS full record; WoS citing articles
Delabie, A.; Sioncke, S.; Rip, J.; Van Elshocht, S.; Pourtois, G.; Mueller, M.; Beckhoff, B.; Pierloot, K. Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates 2012 Journal of vacuum science and technology: A: vacuum surfaces and films 30 41 UA library record; WoS full record; WoS citing articles
Van Gaens, W.; Bogaerts, A. Reaction pathways of biomedically active species in an Ar plasma jet 2014 Plasma sources science and technology 23 34 UA library record; WoS full record; WoS citing articles
Zhang, Z.Z.; Wu, Z.H.; Chang, K.; Peeters, F.M. Resonant tunneling through S- and U-shaped graphene nanoribbons 2009 Nanotechnology 20 32 UA library record; WoS full record; WoS citing articles
Liu, S.; Wei, M.; Sui, X.; Cheng, X.; Cool, P.; Van Tendeloo, G. A scanning electron microscopy study on hollow silica microspheres: defects and influences of the synthesis composition 2009 Journal of sol-gel science and technology 49 1 UA library record; WoS full record; WoS citing articles
Amin-Ahmadi, B.; Aashuri, H. Semisolid structure for M2 high speed steel prepared by cooling slope 2010 Journal of materials processing technology 210 12 UA library record; WoS full record; WoS citing articles
Kozák, T.; Bogaerts, A. Splitting of CO2 by vibrational excitation in non-equilibrium plasmas : a reaction kinetics model 2014 Plasma sources science and technology 23 170 UA library record; WoS full record; WoS citing articles
Vandelannoote, R.; Blommaert, W.; Van 't dack, L.; Gijbels, R.; van Grieken, R. Statistical grouping and controlling factors of dissolved trace elements in a surface water system 1983 Environmental technology letters 4 1 UA library record
Ye, M.; Schroeder, J.; Mehbod, M.; Deltour, R.; Naessens, G.; Duvigneaud, P.H.; Verbist, K.; Van Tendeloo, G. Structural properties of Zn-substituted epitaxial YBa2Cu3O7-\delta thin films 1996 Superconductor science and technology 9 7 UA library record; WoS full record; WoS citing articles
Margueritat, J.; Gonzalo, J.; Afonso, C.N.; Hörmann, U.; Van Tendeloo, G.; Mlayah, A.; Murray, D.B.; Saviot, L.; Zhou, Y.; Hong, M.H.; Luk'yanchuk, B.S. Surface enhanced Raman scattering of silver sensitized cobalt nanoparticles in metaldielectric nanocomposites 2008 Nanotechnology 19 11 UA library record; WoS full record; WoS citing articles
Mordvinova, N.; Emelin, P.; Vinokurov, A.; Dorofeev, S.; Abakumov, A.; Kuznetsova, T. Surface processes during purification of InP quantum dots 2014 Beilstein journal of nanotechnology 5 5 UA library record; WoS full record; WoS citing articles
Malesevic, A.; Vitchev, R.; Schouteden, K.; Volodin, A.; Zhang, L.; Van Tendeloo, G.; Vanhulsel, A.; van Haesendonck, C. Synthesis of few-layer graphene via microwave plasma-enhanced chemical vapour deposition 2008 Nanotechnology 19 309 UA library record; WoS full record; WoS citing articles