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  Author Title Year Publication Volume Times cited Additional Links Links
Aghaei, M.; Flamigni, L.; Lindner, H.; Günther, D.; Bogaerts, A. Occurrence of gas flow rotational motion inside the ICP torch : a computational and experimental study 2014 Journal of analytical atomic spectrometry 29 21 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A. Plasma diagnostics and numerical simulations: insight into the heart of analytical glow discharges 2007 Journal of analytical atomic spectrometry 22 23 UA library record; WoS full record; WoS citing articles doi
Bleiner, D.; Chen, Z.; Autrique, D.; Bogaerts, A. Role of laser-induced melting and vaporization of metals during ICP-MS and LIBS analysis, investigated with computer simulations and experiments 2006 Journal of analytical atomic spectrometry 21 42 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. Similarities and differences between direct current and radio-frequency glow discharges: a mathematical simulation 2000 Journal of analytical atomic spectrometry 15 25 UA library record; WoS full record; WoS citing articles doi
Gamez, G.; Bogaerts, A.; Hieftje, G.M. Temporal and spatially resolved laser-scattering plasma diagnostics for the characterization of a ms-pulsed glow discharge 2006 Journal of analytical atomic spectrometry 21 17 UA library record; WoS full record; WoS citing articles doi
Simon, P.; Bogaerts, A. Vibrational level population of nitrogen impurities in low-pressure argon glow discharges 2011 Journal of analytical atomic spectrometry 26 6 UA library record; WoS full record; WoS citing articles doi
Aghaei, M.; Bogaerts, A. Particle transport through an inductively coupled plasma torch: elemental droplet evaporation 2016 Journal of analytical atomic spectrometry 31 21 UA library record; WoS full record; WoS citing articles url doi
Bogaerts, A.; Aghaei, M. Inductively coupled plasma-mass spectrometry: insights through computer modeling 2017 Journal of analytical atomic spectrometry 32 14 UA library record; WoS full record; WoS citing articles pdf url doi
Adams, F.; Adriaens, A.; Aerts, A.; de Raedt, I.; Janssens, K.; Schalm, O. Micro and surface analysis in archaeology 1997 Journal of analytical atomic spectrometry 12 UA library record; WoS full record; WoS citing articles doi
Verlinden, B.; Van Hoecke, K.; Aerts, A.; Daems, N.; Dobney, A.; Janssens, K.; Cardinaels, T. Quantification of boron in cells for evaluation of drug agents used in boron neutron capture therapy 2021 Journal Of Analytical Atomic Spectrometry 36 UA library record; WoS full record; WoS citing articles doi
Kolev, S.; Bogaerts, A. A 2D model for a gliding arc discharge 2015 Plasma sources science and technology 24 34 UA library record; WoS full record; WoS citing articles pdf url doi
Bultinck, E.; Bogaerts, A. Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model 2011 Plasma sources science and technology 20 7 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A. Comprehensive modelling network for dc glow discharges in argon 1999 Plasma sources science and technology 8 27 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Bogaerts, A. Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition 2011 Plasma sources science and technology 20 11 UA library record; WoS full record; WoS citing articles doi
Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges 2010 Plasma sources science and technology 19 116 UA library record; WoS full record; WoS citing articles pdf doi
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations 2011 Plasma sources science and technology 20 38 UA library record; WoS full record; WoS citing articles pdf doi
Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis 2015 Plasma sources science and technology 24 11 UA library record; WoS full record; WoS citing articles pdf url doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma 2012 Plasma sources science and technology 21 23 UA library record; WoS full record; WoS citing articles pdf doi
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges 2013 Plasma sources science and technology 22 20 UA library record; WoS full record; WoS citing articles pdf doi
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges 2000 Plasma sources science and technology 9 21 UA library record; WoS full record; WoS citing articles doi
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation 2013 Plasma sources science and technology 22 13 UA library record; WoS full record; WoS citing articles pdf doi
Kozák, T.; Bogaerts, A. Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model 2015 Plasma sources science and technology 24 100 UA library record; WoS full record; WoS citing articles pdf url doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma 2013 Plasma sources science and technology 22 11 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas 2013 Plasma sources science and technology 22 9 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux 2005 Plasma sources science and technology 14 9 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces 2002 Plasma sources science and technology 11 51 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles pdf doi
Georgieva, V.; Bogaerts, A. Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model 2006 Plasma sources science and technology 15 35 UA library record; WoS full record; WoS citing articles doi
Van Gaens, W.; Bogaerts, A. Reaction pathways of biomedically active species in an Ar plasma jet 2014 Plasma sources science and technology 23 34 UA library record; WoS full record; WoS citing articles pdf doi
Kozák, T.; Bogaerts, A. Splitting of CO2 by vibrational excitation in non-equilibrium plasmas : a reaction kinetics model 2014 Plasma sources science and technology 23 170 UA library record; WoS full record; WoS citing articles pdf doi
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