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Toward defining plasma treatment dose : the role of plasma treatment energy of pulsed‐dielectric barrier discharge in dictating in vitro biological responses”. Lin A, Biscop E, Gorbanev Y, Smits E, Bogaerts A, Plasma Processes And Polymers 19, e2100151 (2022). http://doi.org/10.1002/PPAP.202100151
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Low-Temperature Plasma for Biology, Hygiene, and Medicine: Perspective and Roadmap”. Laroussi M, Bekeschus S, Keidar M, Bogaerts A, Fridman A, Lu X, Ostrikov K, Hori M, Stapelmann K, Miller V, Reuter S, Laux C, Mesbah A, Walsh J, Jiang C, Thagard SM, Tanaka H, Liu D, Yan D, Yusupov M, IEEE transactions on radiation and plasma medical sciences 6, 127 (2022). http://doi.org/10.1109/TRPMS.2021.3135118
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Fluid simulation of the superimposed dual-frequency source effect in inductively coupled discharges”. Xiaoyan S, Zhang Y-R, Wang Y-N, He J-X, Physics Of Plasmas 28, 113504 (2021). http://doi.org/10.1063/5.0065438
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Dry reforming of methane in a nanosecond repetitively pulsed discharge: chemical kinetics modeling”. Zhang L, Heijkers S, Wang W, Martini LM, Tosi P, Yang D, Fang Z, Bogaerts A, Plasma Sources Science &, Technology 31, 055014 (2022). http://doi.org/10.1088/1361-6595/ac6bbc
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Foundations of plasma catalysis for environmental applications”. Bogaerts A, Neyts EC, Guaitella O, Murphy AB, Plasma Sources Science &, Technology (2022). http://doi.org/10.1088/1361-6595/ac5f8e
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Insights into the limitations to vibrational excitation of CO2: validation of a kinetic model with pulsed glow discharge experiments”. Biondo O, Fromentin C, Silva T, Guerra V, van Rooij G, Bogaerts A, Plasma Sources Science &, Technology 31, 074003 (2022). http://doi.org/10.1088/1361-6595/ac8019
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Molecular understanding of the possible mechanisms of oligosaccharide oxidation by cold plasma”. Yusupov M, Dewaele D, Attri P, Khalilov U, Sobott F, Bogaerts A, Plasma processes and polymers (2022). http://doi.org/10.1002/ppap.202200137
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The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions”. Tennyson J, Mohr S, Hanicinec M, Dzarasova A, Smith C, Waddington S, Liu B, Alves LL, Bartschat K, Bogaerts A, Engelmann SU, Gans T, Gibson AR, Hamaguchi S, Hamilton KR, Hill C, O’Connell D, Rauf S, van ’t Veer K, Zatsarinny O, Plasma Sources Science &, Technology 31, 095020 (2022). http://doi.org/10.1088/1361-6595/ac907e
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Plasma‐treated liquids in medicine: Let's get chemical”. Tampieri F, Gorbanev Y, Sardella E, Plasma Processes and Polymers 20, e2300077 (2023). http://doi.org/10.1002/ppap.202300077
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Assessing neutral transport mechanisms in aspect ratio dependent etching by means of experiments and multiscale plasma modeling”. Vanraes P, Parayil Venugopalan S, Besemer M, Bogaerts A, Plasma Sources Science and Technology 32, 064004 (2023). http://doi.org/10.1088/1361-6595/acdc4f
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Characterization of Non-Thermal Dielectric Barrier Discharges for Plasma Medicine: From Plastic Well Plates to Skin Surfaces”. Lin A, Gromov M, Nikiforov A, Smits E, Bogaerts A, Plasma Chemistry and Plasma Processing 43, 1587 (2023). http://doi.org/10.1007/s11090-023-10389-w
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Plasmonic effects in the neutralization of slow ions at a metallic surface”. Bercx M, Mayda S, Depla D, Partoens B, Lamoen D, Contributions to Plasma Physics (2023). http://doi.org/10.1002/ctpp.202300054
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Modelling the dynamics of hydrogen synthesis from methane in nanosecond‐pulsed plasmas”. Morais E, Bogaerts A, Plasma processes and polymers 21 (2024). http://doi.org/10.1002/ppap.202300149
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Special Issue on “Dielectric Barrier Discharges and their Applications&rdquo, in Commemoration of the 20th Anniversary of Dr. Ulrich Kogelschatz’s Work”. Bogaerts A, Plasma Chemistry and Plasma Processing 43, 1281 (2023). http://doi.org/10.1007/s11090-023-10431-x
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Coupling the COST reference plasma jet to a microfluidic device: a computational study”. Bissonnette-Dulude J, Heirman P, Coulombe S, Bogaerts A, Gervais T, Reuter S, Plasma sources science and technology 33, 015001 (2024). http://doi.org/10.1088/1361-6595/ad1421
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Investigation of O atom kinetics in O2plasma and its afterglow”. Albrechts M, Tsonev I, Bogaerts A, Plasma Sources Science and Technology 33, 045017 (2024). http://doi.org/10.1088/1361-6595/ad3f4a
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Comprehensive modelling network for dc glow discharges in argon”. Bogaerts A, Plasma sources science and technology 8, 210 (1999). http://doi.org/10.1088/0963-0252/8/2/003
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Semianalytical description of nonlocal secondary electrons in a radio-frequency capacitively coupled plasma at intermediate pressures”. Berezhnoi S, Kaganovich I, Misina M, Bogaerts A, Gijbels R, IEEE transactions plasma science 27, 1339 (1999). http://doi.org/10.1109/27.799810
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Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge”. Bogaerts A, Gijbels R, IEEE transactions on plasma science 27, 1406 (1999). http://doi.org/10.1109/27.799819
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces”. Bogaerts A, Gijbels R, Plasma sources science and technology 11, 27 (2002). http://doi.org/10.1088/0963-0252/11/1/303
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Evolution of charged particle densities after laser-induced photodetachment in a strongly electronegative RF discharge”. Yan M, Bogaerts A, Gijbels R, IEEE transactions on plasma science 30, 132 (2002). http://doi.org/10.1109/TPS.2002.1003959
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A one-dimensional fluid model for an acetylene rf discharge: a study of the plasma chemistry”. Herrebout D, Bogaerts A, Gijbels R, Goedheer WJ, Vanhulsel A, IEEE transactions on plasma science 31, 659 (2003). http://doi.org/10.1109/TPS.2003.815249
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Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model”. de Bleecker K, Bogaerts A, Goedheer W, Gijbels R, IEEE transactions on plasma science 32, 691 (2004). http://doi.org/10.1109/TPS.2004.826095
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Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux”. Bogaerts A, Okhrimovskyy A, Baguer N, Gijbels R, Plasma sources science and technology 14, 191 (2005). http://doi.org/10.1088/0963-0252/14/1/021
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Perturbation of collisional plasma flow around a charged dust particle: kinetic analysis”. Schweigert IV, Schweigert VA, Peeters FM, Physics of plasmas 12, 113501 (2005). http://doi.org/10.1063/1.2076527
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Computer simulations for processing plasmas”. Bogaerts A, de Bleecker K, Georgieva V, Kolev I, Madani M, Neyts E, Plasma processes and polymers 3, 110 (2006). http://doi.org/10.1002/ppap.200500065
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PIC –, MCC numerical simulation of a DC planar magnetron”. Kolev I, Bogaerts A, Plasma processes and polymers 3, 127 (2006). http://doi.org/10.1002/ppap.200500118
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Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model”. Georgieva V, Bogaerts A, Plasma sources science and technology 15, 368 (2006). http://doi.org/10.1088/0963-0252/15/3/010
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Simulation of disk- and band-like voids in dusty plasma systems”. Liu YH, Chen ZY, Huang F, Yu MY, Wang L, Bogaerts A, Physics of plasmas 13, 052110 (2006). http://doi.org/10.1063/1.2201058
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