| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| Tinck, S.; Boullart, W.; Bogaerts, A. |
Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments |
2009 |
Journal of physics: D: applied physics |
42 |
23 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Bultinck, E.; Eckert, M.; Georgieva, V.; Mao, M.; Neyts, E.; Schwaederlé, L. |
Computer modeling of plasmas and plasma-surface interactions |
2009 |
Plasma processes and polymers |
6 |
18 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; De Bie, C.; Eckert, M.; Georgieva, V.; Martens, T.; Neyts, E.; Tinck, S. |
Modeling of the plasma chemistry and plasmasurface interactions in reactive plasmas |
2010 |
Pure and applied chemistry |
82 |
13 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Aerts, R.; Snoeckx, R.; Somers, W.; Van Gaens, W.; Yusupov, M.; Neyts, E. |
Modeling of plasma and plasma-surface interactions for medical, environmental and nano applications |
2012 |
Journal of physics : conference series |
399 |
7 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Bultinck, E.; Kolev, I.; Schwaederlé, L.; van Aeken, K.; Buyle, G.; Depla, D. |
Computer modelling of magnetron discharges |
2009 |
Journal of physics: D: applied physics |
42 |
32 |
UA library record; WoS full record; WoS citing articles |
| Eckert, M.; Mortet, V.; Zhang, L.; Neyts, E.; Verbeeck, J.; Haenen, ken; Bogaerts, A. |
Theoretical investigation of grain size tuning during prolonged bias-enhanced nucleation |
2011 |
Chemistry of materials |
23 |
9 |
UA library record; WoS full record; WoS citing articles |
| Mao, M.; Benedikt, J.; Consoli, A.; Bogaerts, A. |
New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
47 |
UA library record; WoS full record; WoS citing articles |
| Zhao, S.-X.; Gao, F.; Wang, Y.-P.; Wang, Y.-N.; Bogaerts, A. |
Effects of feedstock availability on the negative ion behavior in a C4F8 inductively coupled plasma |
2015 |
Journal of applied physics |
118 |
1 |
UA library record; WoS full record; WoS citing articles |
| Aerts, R.; Martens, T.; Bogaerts, A. |
Influence of vibrational states on CO2 splitting by dielectric barrier discharges |
2012 |
The journal of physical chemistry: C : nanomaterials and interfaces |
116 |
112 |
UA library record; WoS full record; WoS citing articles |
| Vermeylen, S.; De Waele, J.; Vanuytsel, S.; De Backer, J.; Van der Paal, J.; Ramakers, M.; Leyssens, K.; Marcq, E.; Van Audenaerde, J.; L. J. Smits, E.; Dewilde, S.; Bogaerts, A. |
Cold atmospheric plasma treatment of melanoma and glioblastoma cancer cells |
2016 |
Plasma processes and polymers |
13 |
26 |
UA library record; WoS full record; WoS citing articles |
| Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. |
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation |
2013 |
Plasma sources science and technology |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
| Eckert, M.; Neyts, E.; Bogaerts, A. |
Insights into the growth of (ultra)nanocrystalline diamond by combined molecular dynamics and Monte Carlo simulations |
2010 |
Crystal growth & design |
10 |
13 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Eckert, M.; Mao, M.; Neyts, E. |
Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials |
2011 |
Journal of physics: D: applied physics |
44 |
25 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Yusupov, M.; Van der Paal, J.; Verlackt, C.C.W.; Neyts, E.C. |
Reactive molecular dynamics simulations for a better insight in plasma medicine |
2014 |
Plasma processes and polymers |
11 |
22 |
UA library record; WoS full record; WoS citing articles |
| Sun, S.R.; Kolev, S.; Wang, H.X.; Bogaerts, A. |
Investigations of discharge and post-discharge in a gliding arc: a 3D computational study |
2017 |
Plasma sources science and technology |
26 |
11 |
UA library record; WoS full record; WoS citing articles |
| Kolev, S.; Bogaerts, A. |
A 2D model for a gliding arc discharge |
2015 |
Plasma sources science and technology |
24 |
34 |
UA library record; WoS full record; WoS citing articles |
| Shirazi, M.; Bogaerts, A.; Neyts, E.C. |
A DFT study of H-dissolution into the bulk of a crystalline Ni(111) surface: a chemical identifier for the reaction kinetics |
2017 |
Physical chemistry, chemical physics |
19 |
10 |
UA library record; WoS full record; WoS citing articles |
| Wendelen, W.; Autrique, D.; Bogaerts, A. |
Space charge limited electron emission from a Cu surface under ultrashort pulsed laser irradiation |
2010 |
AIP conference proceedings |
1278 |
|
UA library record; WoS full record |
| Wendelen, W.; Autrique, D.; Bogaerts, A. |
Space charge limited electron emission from a Cu surface under ultrashort pulsed laser irradiation |
2010 |
Applied physics letters |
96 |
22 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Aghaei, M. |
Inductively coupled plasma-mass spectrometry: insights through computer modeling |
2017 |
Journal of analytical atomic spectrometry |
32 |
14 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. |
Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas |
2013 |
Plasma sources science and technology |
22 |
9 |
UA library record; WoS full record; WoS citing articles |
| Slaets, J.; Loenders, B.; Bogaerts, A. |
Plasma-based dry reforming of CH4: Plasma effects vs. thermal conversion |
2024 |
Fuel |
360 |
|
UA library record; WoS full record; WoS citing articles |
| Kolev, S.; Bogaerts, A. |
Similarities and differences between gliding glow and gliding arc discharges |
2015 |
Plasma sources science and technology |
24 |
12 |
UA library record; WoS full record; WoS citing articles |
| Kolev, S.; Bogaerts, A. |
Three-dimensional modeling of energy transport in a gliding arc discharge in argon |
2018 |
Plasma Sources Science & Technology |
27 |
|
UA library record; WoS full record; WoS citing articles |
| Mortet, V.; Zhang, L.; Eckert, M.; D'Haen, J.; Soltani, A.; Moreau, M.; Troadec, D.; Neyts, E.; De Jaeger, J.C.; Verbeeck, J.; Bogaerts, A.; Van Tendeloo, G.; Haenen, K.; Wagner, P. |
Grain size tuning of nanocrystalline chemical vapor deposited diamond by continuous electrical bias growth : experimental and theoretical study |
2012 |
Physica status solidi : A : applications and materials science |
209 |
31 |
UA library record; WoS full record; WoS citing articles |
| Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
| Zhang, S.; Van Gaens, W.; van Gessel, B.; Hofmann, S.; van Veldhuizen, E.; Bogaerts, A.; Bruggeman, P. |
Spatially resolved ozone densities and gas temperatures in a time modulated RF driven atmospheric pressure plasma jet : an analysis of the production and destruction mechanisms |
2013 |
Journal of physics: D: applied physics |
46 |
74 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Bogaerts, A. |
Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon |
2016 |
Journal of physics: D: applied physics |
49 |
|
UA library record; WoS full record; WoS citing articles |
