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| Author | Belov, I.; Paulussen, S.; Bogaerts, A. | ||||
| Title | Pressure as an additional control handle for non-thermal atmospheric plasma processes | Type | A1 Journal article | ||
| Year | 2017 | Publication | Plasma processes and polymers | Abbreviated Journal  |
Plasma Process Polym |
| Volume | 14 | Issue | 11 | Pages | 1700046 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | above atmospheric) pressure regimes (1–3.5 bar). It was demonstrated that these operational conditions significantly influence both the discharge dynamics and the process efficiencies of O2 and CO2 discharges. For the case of the O2 DBD, the pressure rise results in the amplification of the discharge current, the appearance of emission lines of the metal electrode material (Fe, Cr, Ni) in the optical emission spectrum and the formation of a granular film of the erosion products (10–300 nm iron oxide nanoparticles) on the reactor walls. Somewhat similar behavior was observed also for the CO2 DBD. The discharge current, the relative intensity of the CO Angstrom band measured by Optical Emission Spectroscopy (OES) and the CO2 conversion rates could be stimulated to some extent by the rise in pressure. The optimal conditions for the O2 DBD (P = 2 bar) and the CO2 DBD (P = 1.5 bar) are demonstrated. It can be argued that the dynamics of the microdischarges (MD) define the underlying process of this behavior. It could be demonstrated that the pressure increase stimulates the formation of more intensive but fewer MDs. In this way, the operating pressure can represent an additional tool to manipulate the properties of the MDs in a DBD, and as a result also the discharge performance. |
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| Publisher | Place of Publication | Editor | |||
| Language | Wos | 000415339700011 | Publication Date | 2017-06-07 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 1612-8850 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 2.846 | Times cited | 1 | Open Access | Not_Open_Access |
| Notes | Seventh Framework Programme, Grant Agreement № 606889 (RAPID – Reactive Atmospheric Plasma processIng – Education Network) ; | Approved | Most recent IF: 2.846 | ||
| Call Number | PLASMANT @ plasmant @c:irua:147024 | Serial | 4763 | ||
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| Author | Razzokov, J.; Yusupov, M.; Vanuytsel, S.; Neyts, E.C.; Bogaerts, A. | ||||
| Title | Phosphatidylserine flip-flop induced by oxidation of the plasma membrane: a better insight by atomic scale modeling | Type | A1 Journal article | ||
| Year | 2017 | Publication | Plasma processes and polymers | Abbreviated Journal |
Plasma Process Polym |
| Volume | 14 | Issue | 10 | Pages | 1700013 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | We perform molecular dynamics simulations to study the flip-flop motion of phosphatidylserine (PS) across the plasma membrane upon increasing oxidation degree of the membrane. Our computational results show that an increase of the oxidation degree in the lipids leads to a decrease of the free energy barrier for translocation of PS through the membrane. In other words, oxidation of the lipids facilitates PS flip-flop motion across the membrane, because in native phospholipid bilayers this is only a “rare event” due to the high energy barriers for the translocation of PS. The present study provides an atomic-scale insight into the mechanisms of the PS flip-flop upon oxidation of lipids, as produced for example by cold atmospheric plasma, in living cells. | ||||
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| Language | Wos | 000413045800010 | Publication Date | 2017-04-05 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 1612-8850 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 2.846 | Times cited | 9 | Open Access | Not_Open_Access |
| Notes | Fonds Wetenschappelijk Onderzoek, 1200216N ; | Approved | Most recent IF: 2.846 | ||
| Call Number | PLASMANT @ plasmant @c:irua:149567 | Serial | 4910 | ||
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| Author | Rezaei, F.; Gorbanev, Y.; Chys, M.; Nikiforov, A.; Van Hulle, S.W.H.; Cos, P.; Bogaerts, A.; De Geyter, N. | ||||
| Title | Investigation of plasma-induced chemistry in organic solutions for enhanced electrospun PLA nanofibers | Type | A1 Journal article | ||
| Year | 2018 | Publication | Plasma processes and polymers | Abbreviated Journal |
Plasma Process Polym |
| Volume | 15 | Issue | 6 | Pages | 1700226 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | Electrospinning is a versatile technique for the fabrication of polymer-based nano/microfibers. Both physical and chemical characteristics of pre-electrospinning polymer solutions affect the morphology and chemistry of electrospun nanofibers. An atmospheric-pressure plasma jet has previously been shown to induce physical modifications in polylactic acid (PLA) solutions. This work aims at investigating the plasma-induced chemistry in organic solutions of PLA, and their effects on the resultant PLA nanofibers. Therefore, very broad range of gas, liquid, and solid (nanofiber) analyzing techniques has been applied. Plasma alters the acidity of the solutions. SEM studies illustrated that complete fiber morphology enhancement only occurred when both PLA and solvent molecules were exposed to preelectrospinning plasma treatment. Additionally, the surface chemistry of the PLA nanofibers was mostly preserved. |
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| Publisher | Place of Publication | Editor | |||
| Language | Wos | 000436407300005 | Publication Date | 2018-03-24 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 1612-8850 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 2.846 | Times cited | 12 | Open Access | Not_Open_Access |
| Notes | Fonds Wetenschappelijk Onderzoek, G.0379.15N ; FP7 Ideas: European Research Council, 335929 (PLASMATS) ; European Marie Sklodowska-Curie Individual Fellowship “LTPAM”, 657304 ; | Approved | Most recent IF: 2.846 | ||
| Call Number | PLASMANT @ plasmant @c:irua:152173 | Serial | 4992 | ||
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| Author | Yusupov, M.; Lackmann, J.-W.; Razzokov, J.; Kumar, S.; Stapelmann, K.; Bogaerts, A. | ||||
| Title | Impact of plasma oxidation on structural features of human epidermal growth factor | Type | A1 Journal article | ||
| Year | 2018 | Publication | Plasma processes and polymers | Abbreviated Journal |
Plasma Process Polym |
| Volume | 15 | Issue | 8 | Pages | 1800022 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | We perform computer simulations supported by experiments to investigate the oxidation of an important signaling protein, that is, human epidermal growth factor (hEGF), caused by cold atmospheric plasma (CAP) treatment. Specifically, we study the conformational changes of hEGF with different degrees of oxidation, to mimic short and long CAP treatment times. Our results indicate that the oxidized structures become more flexible, due to their conformational changes and breakage of the disulfide bonds, especially at higher oxidation degrees. MM/GBSA calculations reveal that an increasing oxidation level leads to a lower binding free energy of hEGF with its receptor. These results help to understand the fundamentals of the use of CAP for wound healing versus cancer treatment at short and longer treatment times. | ||||
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| Language | Wos | 000441895700004 | Publication Date | 2018-05-07 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 1612-8850 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 2.846 | Times cited | 7 | Open Access | Not_Open_Access |
| Notes | Fonds Wetenschappelijk Onderzoek, 1200216N ; Bundesministerium für Bildung und Forschung, 03Z22DN12 ; | Approved | Most recent IF: 2.846 | ||
| Call Number | PLASMANT @ plasmant @c:irua:152815 | Serial | 5008 | ||
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| Author | Brandenburg, R.; Bogaerts, A.; Bongers, W.; Fridman, A.; Fridman, G.; Locke, B.R.; Miller, V.; Reuter, S.; Schiorlin, M.; Verreycken, T.; Ostrikov, K.K. | ||||
| Title | White paper on the future of plasma science in environment, for gas conversion and agriculture | Type | A1 Journal article | ||
| Year | 2019 | Publication | Plasma processes and polymers | Abbreviated Journal |
Plasma Process Polym |
| Volume | 16 | Issue | 1 | Pages | 1700238 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | Climate change, environmental pollution control, and resource utilization efficiency, as well as food security, sustainable agriculture, and water supply are among the main challenges facing society today. Expertise across different academic fields, technologies,anddisciplinesisneededtogeneratenewideastomeetthesechallenges. This “white paper” aims to provide a written summary by describing the main aspects and possibilities of the technology. It shows that plasma science and technology can make significant contributions to address the mentioned issues. The paper also addresses to people in the scientific community (inside and outside plasma science) to give inspiration for further work in these fields. | ||||
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| Language | Wos | 000455413600004 | Publication Date | 2018-07-05 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
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| ISSN | 1612-8850 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 2.846 | Times cited | 19 | Open Access | Not_Open_Access |
| Notes | This paper is a result of the PlasmaShape project, supported by funding from the European Union Seventh Framework Programme (FP7/2007-2013) under grant agreement no. 316216. During this project, young scientists and renowned and outstanding scientists collaborated in the development of a political-scientific consensus paper as well as six scientific, strategic white papers. In an unique format core themes such as energy, optics and glass, medicine and hygiene, aerospace and automotive, plastics and textiles, environment and agriculture and their future development were discussed regarding scientific relevance and economic impact. We would like to thank our colleagues from 18 nations from all over the world (Australia, Belgium, Czech Republic, PR China, France, Germany, Great Britain, Italy, Japan, The Netherlands, Poland, Romania, Russia, Slovakia, Slovenia, Sweden, Switzerland, USA) who have participated both workshops of Future in Plasma Science I and II in Greifswald in 2015/2016. The valuable contribution of all participants during the workshops, the intensive cooperation between the project partners, and the comprehensive input of all working groups of Future in Plasma Science was the base for the present paper. Kindly acknowledged is the support of graphical work by C. Desjardins and K. Drescher. | Approved | Most recent IF: 2.846 | ||
| Call Number | PLASMANT @ plasmant @UA @ admin @ c:irua:156389 | Serial | 5146 | ||
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| Author | Van der Paal, J.; Fridman, G.; Bogaerts, A. | ||||
| Title | Ceramide cross-linking leads to pore formation: Potential mechanism behind CAP enhancement of transdermal drug delivery | Type | A1 Journal article | ||
| Year | 2019 | Publication | Plasma processes and polymers | Abbreviated Journal |
Plasma Process Polym |
| Volume | 16 | Issue | 16 | Pages | 1900122 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | In recent years, cold atmospheric plasma (CAP) has been proposed as a novel method to enhance transdermal drug delivery, while avoiding tissue damage. However, the underlying mechanism for the increasing skin permeability upon CAP treatment is still undefined. We propose a mechanism in which CAP-generated reactive species induce cross-linking of skin lipids, leading to the generation of nanopores, thereby facilitating the permeation of drug molecules. Molecular dynamics simulations support this proposed mechanism. Furthermore, our results indicate that to achieve maximum enhancement of the permeability, the optimal treatment will depend on the exact lipid composition of the skin, as well as on the CAP source used. | ||||
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| Language | Wos | 000479747500001 | Publication Date | 2019-07-30 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 1612-8850 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 2.846 | Times cited | Open Access | ||
| Notes | Approved | Most recent IF: 2.846 | |||
| Call Number | UA @ admin @ c:irua:161874 | Serial | 6287 | ||
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| Author | Duan, J.; Ma, M.; Yusupov, M.; Cordeiro, R.M.; Lu, X.; Bogaerts, A. | ||||
| Title | The penetration of reactive oxygen and nitrogen species across the stratum corneum | Type | A1 Journal article | ||
| Year | 2020 | Publication | Plasma Processes And Polymers | Abbreviated Journal |
Plasma Process Polym |
| Volume | Issue | Pages | |||
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | The penetration of reactive oxygen and nitrogen species (RONS) across the stratum corneum (SC) is a necessary and crucial process in many skin‐related plasma medical applications. To gain more insights into this penetration behavior, we combined experimental measurements of the permeability of dry and moist SC layers with computer simulations of model lipid membranes. We measured the permeation of relatively stable molecules, which are typically generated by plasma, namely H2O2, NO3−, and NO2−. Furthermore, we calculated the permeation free energy profiles of the major plasma‐generated RONS and their derivatives (i.e., H2O2, OH, HO2, O2, O3, NO, NO2, N2O4, HNO2, HNO3, NO2−, and NO3−) across native and oxidized SC lipid bilayers, to understand the mechanisms of RONS permeation across the SC. Our results indicate that hydrophobic RONS (i.e., NO, NO2, O2, O3, and N2O4) can translocate more easily across the SC lipid bilayer than hydrophilic RONS (i.e., H2O2, OH, HO2, HNO2, and HNO3) and ions (i.e., NO2− and NO3−) that experience much higher permeation barriers. The permeability of RONS through the SC skin lipids is enhanced when the skin is moist and the lipids are oxidized. These findings may help to understand the underlying mechanisms of plasma interaction with a biomaterial and to optimize the environmental parameters in practice in plasma medical applications. | ||||
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| Language | Wos | 000536892900001 | Publication Date | 2020-06-02 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
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| ISSN | 1612-8850 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.5 | Times cited | Open Access | ||
| Notes | National Natural Science Foundation of China, 51625701 51977096 ; Fonds Wetenschappelijk Onderzoek, 1200219N ; China Scholarship Council, 201806160128 ; M. Y. acknowledges the Research Foundation Flanders (FWO) for financial support (Grant No. 1200219N). This study was partially supported by the National Natural Science Foundation of China (Grant No: 51625701 and 51977096) and the China Scholarship Council (Grant No: 201806160128). All computational work was performed using the Turing HPC infrastructure at the CalcUA Core Facility of the University of Antwerp (UA), a division of the Flemish Supercomputer Center VSC, funded by the Hercules Foundation, the Flemish Government (department EWI), and the UA. | Approved | Most recent IF: 3.5; 2020 IF: 2.846 | ||
| Call Number | PLASMANT @ plasmant @c:irua:169709 | Serial | 6372 | ||
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| Author | Zhang, Q.‐Z.; Zhang, L.; Yang, D.‐Z.; Schulze, J.; Wang, Y.‐N.; Bogaerts, A. | ||||
| Title | Positive and negative streamer propagation in volume dielectric barrier discharges with planar and porous electrodes | Type | A1 Journal article | ||
| Year | 2021 | Publication | Plasma Processes And Polymers | Abbreviated Journal |
Plasma Process Polym |
| Volume | 18 | Issue | 4 | Pages | 2000234 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | The spatiotemporal dynamics of volume and surface positive and negative streamers in a pintoplate volume dielectric barrier discharge is investigated in this study. The discharge characteristics are found to be completely different for positive and negative streamers. First, the spatial propagation of a positive streamer is found to rely on electron avalanches caused by photo-electrons in front of the streamer head, whereas this is not the case for negative streamers. Second, our simulations reveal an interesting phenomenon of floating positive surface discharges, which develop when a positive streamer reaches a dielectric wall and which explain the experimentally observed branching characteristics. Third, we report for the first time, the interactions between a positive streamer and dielectric pores, in which both the pore diameter and depth affect the evolution of a positive streamer. | ||||
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| Language | Wos | 000617876700001 | Publication Date | 2021-02-17 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 1612-8850 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 2.846 | Times cited | Open Access | OpenAccess | |
| Notes | Dalian University of Technology, DUT19RC(3)045 ; National Natural Science Foundation of China, 12020101005 ; Deutsche Forschungsgemeinschaft, SFB 1316 project A5 ; Universiteit Antwerpen, TOP‐BOF ; The authors acknowledge financial support from the TOP-BOF project of the University of Antwerp. This study was carried out in part using the Turing HPC infrastructure at the CalcUA core facility of the Universiteit Antwerpen, a division of the Flemish Supercomputer Center VSC, funded by the Hercules Foundation, the Flemish Government (Department EWI), and the University of Antwerp. Funding by the German Research Foundation (DFG) in the frame of the Collaborative Research Center SFB 1316, project A5, National Natural Science Foundation of China (No. 12020101005), and the Scientific Research Foundation from Dalian University of Technology (DUT19RC(3)045) is also acknowledged. | Approved | Most recent IF: 2.846 | ||
| Call Number | PLASMANT @ plasmant @c:irua:176565 | Serial | 6744 | ||
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| Author | Yusupov, M.; Dewaele, D.; Attri, P.; Khalilov, U.; Sobott, F.; Bogaerts, A. | ||||
| Title | Molecular understanding of the possible mechanisms of oligosaccharide oxidation by cold plasma | Type | A1 Journal article | ||
| Year | 2022 | Publication | Plasma processes and polymers | Abbreviated Journal |
Plasma Process Polym |
| Volume | Issue | Pages | |||
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | Cold atmospheric plasma (CAP) is a promising technology for several medical applications, including the removal of biofilms from surfaces. However, the molecular mechanisms of CAP treatment are still poorly understood. Here we unravel the possible mechanisms of CAP‐induced oxidation of oligosaccharides, employing reactive molecular dynamics simulations based on the density functional‐tight binding potential. Specifically, we find that the interaction of oxygen atoms (used as CAP‐generated reactive species) with cellotriose (a model system for the oligosaccharides) can break structurally important glycosidic bonds, which subsequently leads to the disruption of the oligosaccharide molecule. The overall results help to shed light on our experimental evidence for cellotriose CAP. This oxidation by study provides atomic‐level insight into the onset of plasma‐induced removal of biofilms, as oligosaccharides are one of the main components of biofilm. | ||||
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| Language | Wos | 000865844800001 | Publication Date | 2022-10-11 | |
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| ISSN | 1612-8850 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.5 | Times cited | Open Access | OpenAccess | |
| Notes | Fonds Wetenschappelijk Onderzoek, 1200219N ; They also acknowledge the Turing HPC infrastructure at the CalcUA core facility of the University of Antwerp (UA), a division of the Flemish Supercomputer Center VSC, funded by the Hercules Foundation, the Flemish Government (department EWI), and the UA, where all computational work was performed. This study was financially supported by the Research Foundation–Flanders (FWO) (grant number 1200219N). | Approved | Most recent IF: 3.5 | ||
| Call Number | PLASMANT @ plasmant @c:irua:191404 | Serial | 7113 | ||
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| Author | Lin, A.; Biscop, E.; Gorbanev, Y.; Smits, E.; Bogaerts, A. | ||||
| Title | Toward defining plasma treatment dose : the role of plasma treatment energy of pulsed‐dielectric barrier discharge in dictating in vitro biological responses | Type | A1 Journal article | ||
| Year | 2022 | Publication | Plasma Processes And Polymers | Abbreviated Journal |
Plasma Process Polym |
| Volume | 19 | Issue | 3 | Pages | e2100151 |
| Keywords | A1 Journal article; Pharmacology. Therapy; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | The energy dependence of a pulsed-dielectric barrier discharge (DBD) plasma treatment on chemical species production and biological responses was investigated. We hypothesized that the total plasma energy delivered during treatment encompasses the influence of major application parameters. A microsecond-pulsed DBD system was used to treat three different cancer cell lines and cell viability was analyzed. The energy per pulse was measured and the total plasma treatment energy was controlled by adjusting the pulse frequency, treatment time, and application distance. Our data suggest that the delivered plasma energy plays a predominant role in stimulating a biological response in vitro. This study aids in developing steps toward defining a plasma treatment unit and treatment dose for biomedical and clinical research. | ||||
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| Language | Wos | 000711907800001 | Publication Date | 2021-10-28 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 1612-8850 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.5 | Times cited | Open Access | OpenAccess | |
| Notes | Approved | Most recent IF: 3.5 | |||
| Call Number | UA @ admin @ c:irua:182916 | Serial | 7219 | ||
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| Author | Morais, E.; Bogaerts, A. | ||||
| Title | Modelling the dynamics of hydrogen synthesis from methane in nanosecond‐pulsed plasmas | Type | A1 Journal Article | ||
| Year | 2024 | Publication | Plasma processes and polymers | Abbreviated Journal |
Plasma Processes & Polymers |
| Volume | 21 | Issue | 1 | Pages | |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | A chemical kinetics model was developed to characterise the gas‐phase dynamics of H<sub>2</sub>production in nanosecond‐pulsed CH<sub>4</sub>plasmas. Pulsed behaviour was observed in the calculated electric field, electron temperature and species densities at all pressures. The model agrees reasonably with experimental results, showing CH<sub>4</sub>conversion at 30% and C<sub>2</sub>H<sub>2</sub>and H<sub>2</sub>as major products. The underlying mechanisms in CH<sub>4</sub>dissociation and H<sub>2</sub>formation were analysed, highlighting the large contribution of vibrationally excited CH<sub>4</sub>and H<sub>2</sub>to coupling energy from the plasma into gas‐phase heating, and revealing that H<sub>2</sub>synthesis is not affected by applied pressure, with selectivity remaining unchanged at ~42% in the 1–5 bar range. | ||||
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| Language | Wos | 001091258700001 | Publication Date | 2023-10-27 | |
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| ISSN | 1612-8850 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.5 | Times cited | Open Access | Not_Open_Access | |
| Notes | We gratefully acknowledge financial support by the Flemish Government through the Moonshot cSBO project “Power‐to‐Olefins” (P2O; HBC.2020.2620) and funding from the Independent Research Fund Denmark (project nr. 0217‐00231B). | Approved | Most recent IF: 3.5; 2024 IF: 2.846 | ||
| Call Number | PLASMANT @ plasmant @c:irua:201192 | Serial | 8983 | ||
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| Author | Kolev, S.; Bogaerts, A. | ||||
| Title | A 2D model for a gliding arc discharge | Type | A1 Journal article | ||
| Year | 2015 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 24 | Issue | 24 | Pages | 015025 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | In this study we report on a 2D fluid model of a gliding arc discharge in argon. Despite the 3D nature of the discharge, 2D models are found to be capable of providing very useful information about the operation of the discharge. We employ two modelsan axisymmetric and a Cartesian one. We show that for the considered experiment and the conditions of a low current arc (around 30 mA) in argon, there is no significant heating of the cathode surface and the discharge is sustained by field electron emission from the cathode accompanied by the formation of a cathode spot. The obtained discharge power and voltage are relatively sensitive to the surface properties and particularly to the surface roughness, causing effectively an amplification of the normal electric field. The arc body and anode region are not influenced by this and depend mainly on the current value. The gliding of the arc is modelled by means of a 2D Cartesian model. The arcelectrode contact points are analysed and the gliding mechanism along the electrode surface is discussed. Following experimental observations, the cathode spot is simulated as jumping from one point to another. A complete arc cycle is modelled from initial ignition to arc decay. The results show that there is no interaction between the successive gliding arcs. | ||||
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| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000348298200026 | Publication Date | 2014-12-23 | |
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| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 34 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2015 IF: 3.591 | |||
| Call Number | c:irua:122538 c:irua:122538 c:irua:122538 c:irua:122538 | Serial | 3 | ||
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| Author | Bultinck, E.; Bogaerts, A. | ||||
| Title | Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model | Type | A1 Journal article | ||
| Year | 2011 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 20 | Issue | 4 | Pages | 045013-045013,12 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | A combined Monte Carlo (MC)/analytical surface model is developed to study the plasma processes occurring during the reactive sputter deposition of TiOx thin films. This model describes the important plasma species with a MC approach (i.e. electrons, Ar+ ions, {\rm O}_2 | ||||
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| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000295829800015 | Publication Date | 2011-06-14 | |
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| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 7 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2011 IF: 2.521 | |||
| Call Number | UA @ lucian @ c:irua:89732 | Serial | 316 | ||
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| Author | Bogaerts, A. | ||||
| Title | Comprehensive modelling network for dc glow discharges in argon | Type | A1 Journal article | ||
| Year | 1999 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 8 | Issue | Pages | 210-229 | |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
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| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000080660600004 | Publication Date | 2002-08-25 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 27 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 1999 IF: 2.038 | |||
| Call Number | UA @ lucian @ c:irua:24129 | Serial | 451 | ||
| Permanent link to this record | |||||
| Author | Tinck, S.; Bogaerts, A. | ||||
| Title | Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition | Type | A1 Journal article | ||
| Year | 2011 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 20 | Issue | 1 | Pages | 015008-015008,10 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | In this paper, an O2 inductively coupled plasma used for plasma enhanced atomic layer deposition of Al2O3 thin films is investigated by means of modeling. This work intends to provide more information about basic plasma properties such as species densities and species fluxes to the substrate as a function of power and pressure, which might be hard to measure experimentally. For this purpose, a hybrid model developed by Kushner et al is applied to calculate the plasma characteristics in the reactor volume for different chamber pressures ranging from 1 to 10 mTorr and different coil powers ranging from 50 to 500 W. Density profiles of the various oxygen containing plasma species are reported as well as fluxes to the substrate under various operating conditions. Furthermore, different orientations of the substrate, which can be placed vertically or horizontally in the reactor, are taken into account. In addition, special attention is paid to the recombination process of atomic oxygen on the different reactor walls under the stated operating conditions. From this work it can be concluded that the plasma properties change significantly in different locations of the reactor. The plasma density near the cylindrical coil is high, while it is almost negligible in the neighborhood of the substrate. Ion and excited species fluxes to the substrate are found to be very low and negligible. Finally, the orientation of the substrate has a minor effect on the flux of O2, while it has a significant effect on the flux of O. In the horizontal configuration, the flux of atomic oxygen can be up to one order of magnitude lower than in the vertical configuration. | ||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000286592200009 | Publication Date | 2011-01-08 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 11 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2011 IF: 2.521 | |||
| Call Number | UA @ lucian @ c:irua:85285 | Serial | 467 | ||
| Permanent link to this record | |||||
| Author | Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. | ||||
| Title | Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges | Type | A1 Journal article | ||
| Year | 2010 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 19 | Issue | 3 | Pages | 034015,1-034015,6 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | The aim of this work consists of the evaluation of atmospheric pressure dielectric barrier discharges for the conversion of greenhouse gases into useful compounds. Therefore, pure CO2 feed flows are administered to the discharge zone at varying discharge frequency, power input, gas temperature and feed flow rates, aiming at the formation of CO and O2. The discharge obtained in CO2 is characterized as a filamentary mode with a microdischarge zone in each half cycle of the applied voltage. It is shown that the most important parameter affecting the CO2-conversion levels is the gas flow rate. At low flow rates, both the conversion and the CO-yield are significantly higher. In addition, also an increase in the gas temperature and the power input give rise to higher conversion levels, although the effect on the CO-yield is limited. The optimum discharge frequency depends on the power input level and it cannot be unambiguously stated that higher frequencies give rise to increased conversion levels. A maximum CO2 conversion of 30% is achieved at a flow rate of 0.05 L min−1, a power density of 14.75 W cm−3 and a frequency of 60 kHz. The most energy efficient conversions are achieved at a flow rate of 0.2 L min−1, a power density of 11 W cm−3 and a discharge frequency of 30 kHz. | ||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000277982800016 | Publication Date | 2010-05-22 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 116 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2010 IF: 2.218 | |||
| Call Number | UA @ lucian @ c:irua:82408 | Serial | 512 | ||
| Permanent link to this record | |||||
| Author | De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. | ||||
| Title | Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations | Type | A1 Journal article | ||
| Year | 2011 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 20 | Issue | 2 | Pages | 024008,1-024008,11 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | The conversion of methane to value-added chemicals and fuels is considered to be one of the challenges of the 21st century. In this paper we study, by means of fluid modeling, the conversion of methane to higher hydrocarbons or oxygenates by partial oxidation with CO2 or O2 in a dielectric barrier discharge. Sixty-nine different plasma species (electrons, ions, molecules, radicals) are included in the model, as well as a comprehensive set of chemical reactions. The calculation results presented in this paper include the conversion of the reactants and the yields of the reaction products as a function of residence time in the reactor, for different gas mixing ratios. Syngas (i.e. H2 + CO) and higher hydrocarbons (C2Hx) are typically found to be important reaction products. | ||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000290719900009 | Publication Date | 2011-04-02 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 38 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2011 IF: 2.521 | |||
| Call Number | UA @ lucian @ c:irua:87868 | Serial | 689 | ||
| Permanent link to this record | |||||
| Author | Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. | ||||
| Title | Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis | Type | A1 Journal article | ||
| Year | 2015 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 24 | Issue | 24 | Pages | 025004 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | The chemical complexity of non-equilibrium plasmas poses a challenge for plasma modeling because of the computational load. This paper presents a dimension reduction method for such chemically complex plasmas based on principal component analysis (PCA). PCA is used to identify a low-dimensional manifold in chemical state space that is described by a small number of parameters: the principal components. Reduction is obtained since continuity equations only need to be solved for these principal components and not for all the species. Application of the presented method to a CO2 plasma model including state-to-state vibrational kinetics of CO2 and CO demonstrates the potential of the PCA method for dimension reduction. A manifold described by only two principal components is able to predict the CO2 to CO conversion at varying ionization degrees very accurately. | ||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000356816200008 | Publication Date | 2015-01-27 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 11 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2015 IF: 3.591 | |||
| Call Number | c:irua:123534 | Serial | 704 | ||
| Permanent link to this record | |||||
| Author | Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. | ||||
| Title | The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma | Type | A1 Journal article | ||
| Year | 2012 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 21 | Issue | 2 | Pages | 025008-025008,13 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | The electron behaviour in an Ar/CF4 inductively coupled plasma is investigated by a Langmuir probe and a hybrid model. The simulated and measured results include electron density, temperature and electron energy distribution function for different values of Ar/CF4 ratio, coil power and gas pressure. The hybrid plasma equipment model simulations show qualitative agreement with experiment. The effect of F2 electron attachment on the electron behaviour is explored by comparing two sets of data based on different F atom boundary conditions. It is demonstrated that electron attachment at F2 molecules is responsible for the depletion of low-energy electrons, causing a density decrease as well as a temperature increase when CF4 is added to an Ar plasma. | ||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000302779400022 | Publication Date | 2012-03-12 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 23 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2012 IF: 2.515 | |||
| Call Number | UA @ lucian @ c:irua:96549 | Serial | 841 | ||
| Permanent link to this record | |||||
| Author | Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. | ||||
| Title | Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges | Type | A1 Journal article | ||
| Year | 2013 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 22 | Issue | 2 | Pages | 025012-11 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | The electron bounce resonance heating (BRH) in dual-frequency capacitively coupled plasmas operated in oxygen is studied by different experimental methods and a particle-in-cell/Monte Carlo collision (PIC/MCC) simulation, and compared with the electropositive argon discharge. In comparison with argon, the experimental results show that in an oxygen discharge the resonance peaks in positive-ion density and light intensity tend to occur at larger electrode gaps. Moreover, at electrode gaps L > 2.5 cm, the positive-ion (and electron) density and the light emission drop monotonically in the oxygen discharge upon increasing L, whereas they rise (after an initial drop) in the argon case. At resonance gap the electronegativity reaches its maximum due to the BRH. All these experimental observations are explained by PIC/MCC simulations, which show that in the oxygen discharge the bulk electric field becomes quite strong and is out of phase with the sheath field. Therefore, it retards the resonance electrons when traversing the bulk, resulting in a suppressed BRH. Both experiment and simulation results show that this effect becomes more pronounced at lower high-frequency power, when the discharge mode changes from electropositive to electronegative. In a pure oxygen discharge, the BRH is suppressed with increasing pressure and almost diminishes at 12 Pa. Finally, the driving frequency significantly affects the BRH, because it determines the phase relation between bulk electric field and sheath electric field. | ||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000317275400014 | Publication Date | 2013-03-18 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 20 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2013 IF: 3.056 | |||
| Call Number | UA @ lucian @ c:irua:106534 | Serial | 911 | ||
| Permanent link to this record | |||||
| Author | Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. | ||||
| Title | Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges | Type | A1 Journal article | ||
| Year | 2000 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 9 | Issue | Pages | 583-591 | |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | |||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000165341000015 | Publication Date | 2002-08-25 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 21 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2000 IF: 1.963 | |||
| Call Number | UA @ lucian @ c:irua:34071 | Serial | 929 | ||
| Permanent link to this record | |||||
| Author | Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. | ||||
| Title | Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation | Type | A1 Journal article | ||
| Year | 2013 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 22 | Issue | 2 | Pages | 025011-25019 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | In this paper, we investigate the etch process of so-called low-k organic material by means of a N2/H2 capacitively coupled plasma, as applied in the micro-electronics industry for the manufacturing of computer chips. In recent years, such an organic material has emerged as a possible alternative for replacing bulk SiO2 as a dielectric material in the back-end-of-line, because of the smaller parasitic capacity between adjacent conducting lines, and thus a faster propagation of the electrical signals throughout the chip. Numerical simulations with a hybrid plasma model, using an extensive plasma and surface chemistry set, as well as experiments are performed, focusing on the plasma properties as well as the actual etching process, to obtain a better insight into the underlying mechanisms. Furthermore, the effects of gas pressure, applied power and gas composition are investigated to try to optimize the etch process. In general, the plasma density reaches a maximum near the wafer edge due to the so-called 'edge effect'. As a result, the etch rate is not uniform but will also reach its maximum near the wafer edge. The pressure seems not to have a big effect. A higher power increases the etch rate, but the uniformity becomes (slightly) worse. The gas mixing ratio has no significant effect on the etch process, except when a pure H2 or N2 plasma is used, illustrating the synergistic effects of a N2/H2 plasma. In fact, our calculations reveal that the N2/H2 plasma entails an ion-enhanced etch process. The simulation results are in reasonable agreement with the experimental values. The microscopic etch profile shows the desired anisotropic shape under all conditions under study. | ||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000317275400013 | Publication Date | 2013-03-18 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 13 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2013 IF: 3.056 | |||
| Call Number | UA @ lucian @ c:irua:106654 | Serial | 1084 | ||
| Permanent link to this record | |||||
| Author | Kozák, T.; Bogaerts, A. | ||||
| Title | Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model | Type | A1 Journal article | ||
| Year | 2015 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 24 | Issue | 24 | Pages | 015024 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | We use a zero-dimensional reaction kinetics model to simulate CO2 conversion in microwave discharges where the excitation of the vibrational levels plays a significant role in the dissociation kinetics. The model includes a description of the CO2 vibrational kinetics, taking into account state-specific VT and VV relaxation reactions and the effect of vibrational excitation on other chemical reactions. The model is used to simulate a general tubular microwave reactor, where a stream of CO2 flows through a plasma column generated by microwave radiation. We study the effects of the internal plasma parameters, namely the reduced electric field, electron density and the total specific energy input, on the CO2 conversion and its energy efficiency. We report the highest energy efficiency (up to 30%) for a specific energy input in the range 0.41.0 eV/molecule and a reduced electric field in the range 50100 Td and for high values of the electron density (an ionization degree greater than 10−5). The energy efficiency is mainly limited by the VT relaxation which contributes dominantly to the vibrational energy losses and also contributes significantly to the heating of the reacting gas. The model analysis provides useful insight into the potential and limitations of CO2 conversion in microwave discharges. | ||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000348298200025 | Publication Date | 2014-12-23 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 100 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2015 IF: 3.591 | |||
| Call Number | c:irua:122243 | Serial | 1087 | ||
| Permanent link to this record | |||||
| Author | Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. | ||||
| Title | Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma | Type | A1 Journal article | ||
| Year | 2013 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 22 | Issue | 1 | Pages | 015017-15018 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | In this work, a hybrid model is used to investigate the effect of different gas ratios on the Si etching and polymer film deposition characteristics in an Ar/CF4 inductively coupled plasma. The influence of the surface processes on the bulk plasma properties is studied, and also the spatial characteristics of important gas phase and etched species. The densities of F and CF2 decrease when the surface module is included in the simulations, due to the species consumption caused by etching and polymer deposition. The influence of the surface processes on the bulk plasma depends on the Ar/CF4 gas ratio. The deposited polymer becomes thicker at high CF4 content because of more abundant CFx radicals. As a result of the competition between the polymer thickness and the F flux, the etch rate first increases and then decreases upon increasing the CF4 content. The electron properties, more specifically the electron density profile, affect the Si etch characteristics substantially by determining the radical density and flux profiles. In fact, the radial profile of the etch rate is more uniform at low CF4 content since the electron density has a smooth distribution. At high CF4 content, the etch rate is less uniform with a minimum halfway along the wafer radius, because the electron density distribution is more localized. Therefore, our calculations predict that it is better to work at relatively high Ar/CF4 gas ratios, in order to obtain high etch rate and good profile uniformity for etch applications. This, in fact, corresponds to the typical experimental etch conditions in Ar/CF4 gas mixtures as found in the literature, where Ar is typically present at a much higher concentration than CF4. | ||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000314966300022 | Publication Date | 2012-12-20 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 11 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2013 IF: 3.056 | |||
| Call Number | UA @ lucian @ c:irua:102583 | Serial | 1320 | ||
| Permanent link to this record | |||||
| Author | Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. | ||||
| Title | Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas | Type | A1 Journal article | ||
| Year | 2013 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 22 | Issue | 2 | Pages | 025014-25018 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | In this work particle-in-cell/Monte Carlo collision simulations are performed to study the heating mechanism and plasma characteristics in direct current (dc) superposed radio-frequency (RF) capacitively coupled plasmas, operated both in single-frequency (SF) and dual-frequency (DF) regimes. An RF (60/2 MHz) source is applied on the bottom electrode to sustain the discharge, and a dc source is fixed on the top electrode. The heating mechanism appears to be very different in dc superposed SF and DF discharges. When only a single source of 60 MHz is applied, the plasma bulk region is reduced by the dc source, thus the ionization rate and hence the electron density decrease with rising dc voltage. However, when a DF source of 60 and 2 MHz is applied, the electron density can increase upon addition of a dc voltage, depending on the gap length and applied dc voltage. This is explained from the spatiotemporal ionization rates in the DF discharge. In fact, a completely different behavior is observed for the ionization rate in the two half-periods of the LF source. In the first LF half-period, the situation resembles the dc superposed SF discharge, and the reduced plasma bulk region due to the negative dc bias results in a very small effective discharge area and a low ionization rate. On the other hand, in the second half-period, the negative dc bias is to some extent counteracted by the LF voltage, and the sheath close to the dc electrode becomes particularly thin. Consequently, the amplitude of the high-frequency sheath oscillations at the top electrode is largely enhanced, while the LF sheath at the bottom electrode is in its expanding phase and can thus well confine the high-energy electrons. Therefore, the ionization rate increases considerably in this second LF half-period. Furthermore, in addition to the comparison between SF and DF discharges and the effect of gap length and dc voltage, the effect of secondary electrons is examined. | ||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000317275400016 | Publication Date | 2013-03-28 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 9 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2013 IF: 3.056 | |||
| Call Number | UA @ lucian @ c:irua:106877 | Serial | 1413 | ||
| Permanent link to this record | |||||
| Author | Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. | ||||
| Title | Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux | Type | A1 Journal article | ||
| Year | 2005 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 14 | Issue | Pages | 191-200 | |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | |||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000227652500021 | Publication Date | 2005-02-05 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 9 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2005 IF: 1.798 | |||
| Call Number | UA @ lucian @ c:irua:50478 | Serial | 1480 | ||
| Permanent link to this record | |||||
| Author | Bogaerts, A.; Gijbels, R. | ||||
| Title | The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces | Type | A1 Journal article | ||
| Year | 2002 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 11 | Issue | Pages | 27-36 | |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | |||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000174336300003 | Publication Date | 2002-08-25 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 51 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2002 IF: 1.816 | |||
| Call Number | UA @ lucian @ c:irua:40184 | Serial | 1739 | ||
| Permanent link to this record | |||||
| Author | Tinck, S.; Boullart, W.; Bogaerts, A. | ||||
| Title | Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating | Type | A1 Journal article | ||
| Year | 2011 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 20 | Issue | 4 | Pages | 045012-045012,19 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | In this paper, simulations are performed to gain a better insight into the properties of a Cl2/Ar plasma, with and without O2, during plasma etching of Si. Both plasma and surface properties are calculated in a self-consistent manner. Special attention is paid to the behavior of etch products coming from the wafer or the walls, and how the chamber walls can affect the plasma and the resulting etch process. Two modeling cases are considered. In the first case, the reactor walls are defined as clean (Al2O3), whereas in the second case a SiO2 coating is introduced on the reactor walls before the etching process, so that oxygen will be sputtered from the walls and introduced into the plasma. For this reason, a detailed reaction set is presented for a Cl2/O2/Ar plasma containing etched species, as well as an extensive reaction set for surface processes, including physical and chemical sputtering, chemical etching and deposition processes. Density and flux profiles of various species are presented for a better understanding of the bulk plasma during the etching process. Detailed information is also given on the composition of the surfaces at various locations of the reactor, on the etch products in the plasma and on the surface loss probabilities of the plasma species at the walls, with different compositions. It is found that in the clean chamber, walls are mostly chlorinated (Al2Cl3), with a thin layer of etch products residing on the wall. In the coated chamber, an oxy-chloride layer is grown on the walls for a few nanometers during the etching process. The Cl atom wall loss probability is found to decrease significantly in the coated chamber, hence increasing the etch rate. SiCl2, SiCl4 and SiCl3 are found to be the main etch products in the plasma, with the fraction of SiCl2 being always slightly higher. The simulation results compare well with experimental data available from the literature. | ||||
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| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000295829800014 | Publication Date | 2011-06-14 | |
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| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 22 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2011 IF: 2.521 | |||
| Call Number | UA @ lucian @ c:irua:91045 | Serial | 2141 | ||
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| Author | Georgieva, V.; Bogaerts, A. | ||||
| Title | Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model | Type | A1 Journal article | ||
| Year | 2006 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 15 | Issue | Pages | 368-377 | |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
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| Corporate Author | Thesis | ||||
| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000240655500010 | Publication Date | 2006-04-28 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 35 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2006 IF: 2.346 | |||
| Call Number | UA @ lucian @ c:irua:57550 | Serial | 2630 | ||
| Permanent link to this record | |||||
| Author | Van Gaens, W.; Bogaerts, A. | ||||
| Title | Reaction pathways of biomedically active species in an Ar plasma jet | Type | A1 Journal article | ||
| Year | 2014 | Publication | Plasma sources science and technology | Abbreviated Journal |
Plasma Sources Sci T |
| Volume | 23 | Issue | 3 | Pages | 035015-35027 |
| Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
| Abstract | In this paper we analyse the gas phase production and loss pathways for several biomedically active species, i.e. N2(A), O, O3, O2(a), N, H, HO2, OH, NO, NO2, N2O5, H2O2, HNO2 and HNO3, in an argon plasma jet flowing into an open humid air atmosphere. For this purpose, we employ a zero-dimensional reaction kinetics model to mimic the typical experimental conditions by fitting several parameters to experimentally measured values. These include ambient air diffusion, the gas temperature profile and power deposition along the jet effluent. We focus in detail on how the pathways of the biomedically active species change as a function of the position in the effluent, i.e. inside the discharge device, active plasma jet effluent and afterglow region far from the nozzle. Moreover, we demonstrate how the reaction kinetics and species production are affected by different ambient air humidities, total deposited power into the plasma and gas temperature along the jet. It is shown that the dominant pathways can drastically change as a function of the distance from the nozzle exit or experimental conditions. | ||||
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| Publisher | Institute of Physics | Place of Publication | Bristol | Editor | |
| Language | Wos | 000337891900017 | Publication Date | 2014-05-22 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0963-0252;1361-6595; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 3.302 | Times cited | 34 | Open Access | |
| Notes | Approved | Most recent IF: 3.302; 2014 IF: 3.591 | |||
| Call Number | UA @ lucian @ c:irua:117075 | Serial | 2820 | ||
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