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Record |
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Author |
Béché, A.; Rouvière, J.L.; Barnes, J.P.; Cooper, D. |
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Title |
Dark field electron holography for strain measurement |
Type |
A1 Journal article |
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Year  |
2011 |
Publication |
Ultramicroscopy |
Abbreviated Journal |
Ultramicroscopy |
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Volume |
111 |
Issue |
3 |
Pages |
227-238 |
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Keywords |
A1 Journal article; Electron microscopy for materials research (EMAT) |
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Abstract |
Dark field electron holography is a new TEM-based technique for measuring strain with nanometer scale resolution. Here we present the procedure to align a transmission electron microscope and obtain dark field holograms as well as the theoretical background necessary to reconstruct strain maps from holograms. A series of experimental parameters such as biprism voltage, sample thickness, exposure time, tilt angle and choice of diffracted beam are then investigated on a silicon-germanium layer epitaxially embedded in a silicon matrix in order to obtain optimal dark field holograms over a large field of view with good spatial resolution and strain sensitivity. |
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Publisher |
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Place of Publication |
Amsterdam |
Editor |
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Wos |
000288638200007 |
Publication Date |
2010-12-01 |
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Abbreviated Series Title |
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Series Volume |
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Edition |
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ISSN |
0304-3991 |
ISBN |
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Additional Links |
UA library record; WoS full record; WoS citing articles |
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Impact Factor |
2.843 |
Times cited |
31 |
Open Access |
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Notes |
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Approved |
Most recent IF: 2.843; 2011 IF: 2.471 |
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Call Number |
UA @ lucian @ c:irua:136368 |
Serial |
4496 |
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| Permanent link to this record |
