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  Author Title Year (down) Publication Volume Times cited Additional Links Links
Tinck, S.; Bogaerts, A. Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry 2016 Journal of physics: D: applied physics 49 5 UA library record; WoS full record; WoS citing articles pdf url doi
Tinck, S.; Bogaerts, A. Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon 2016 Journal of physics: D: applied physics 49 UA library record; WoS full record; WoS citing articles pdf url doi
Tinck, S.; Bogaerts, A. Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) 2012 Plasma processes and polymers 9 5 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Bogaerts, A. Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition 2011 Plasma sources science and technology 20 11 UA library record; WoS full record; WoS citing articles doi
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