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  Author Title Year Publication Volume Times cited Additional Links Links (down)
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges 2013 Plasma sources science and technology 22 20 UA library record; WoS full record; WoS citing articles pdf doi
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation 2013 Plasma sources science and technology 22 13 UA library record; WoS full record; WoS citing articles pdf doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma 2013 Plasma sources science and technology 22 11 UA library record; WoS full record; WoS citing articles pdf doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma 2012 Plasma sources science and technology 21 23 UA library record; WoS full record; WoS citing articles pdf doi
Bultinck, E.; Bogaerts, A. Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model 2011 Plasma sources science and technology 20 7 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles pdf doi
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations 2011 Plasma sources science and technology 20 38 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Bogaerts, A. Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition 2011 Plasma sources science and technology 20 11 UA library record; WoS full record; WoS citing articles doi
Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges 2010 Plasma sources science and technology 19 116 UA library record; WoS full record; WoS citing articles pdf doi
Georgieva, V.; Bogaerts, A. Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model 2006 Plasma sources science and technology 15 35 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux 2005 Plasma sources science and technology 14 9 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces 2002 Plasma sources science and technology 11 51 UA library record; WoS full record; WoS citing articles doi
Titantah, J.T.; Lamoen, D.; Neyts, E.; Bogaerts, A. The effect of hydrogen on the electronic and bonding properties of amorphous carbon 2006 Journal of physics : condensed matter 18 13 UA library record; WoS full record; WoS citing articles doi
Cenian, A.; Chernukho, A.; Bogaerts, A.; Gijbels, R. Comment on 'Integral cross sections for electron impact excitation of electronic states of N2' 2002 Journal of physics: B : atomic and molecular physics 35 2 UA library record; WoS full record; WoS citing articles doi
Neyts, E.; Eckert, M.; Mao, M.; Bogaerts, A. Numerical simulation of hydrocarbon plasmas for nanoparticle formation and the growth of nanostructured thin films 2009 Plasma physics and controlled fusion 51 2 UA library record; WoS full record; WoS citing articles doi
Setareh, M.; Farnia, M.; Maghari, A.; Bogaerts, A. CF4 decomposition in a low-pressure ICP : influence of applied power and O2 content 2014 Journal of physics: D: applied physics 47 8 UA library record; WoS full record; WoS citing articles pdf doi
Neyts, E.C.; Yusupov, M.; Verlackt, C.C.; Bogaerts, A. Computer simulations of plasmabiomolecule and plasmatissue interactions for a better insight in plasma medicine 2014 Journal of physics: D: applied physics 47 28 UA library record; WoS full record; WoS citing articles pdf doi
Neyts, E.C.; Bogaerts, A. Understanding plasma catalysis through modelling and simulation : a review 2014 Journal of physics: D: applied physics 47 130 UA library record; WoS full record; WoS citing articles pdf doi
Dufour, T.; Minnebo, J.; Abou Rich, S.; Neyts, E.C.; Bogaerts, A.; Reniers, F. Understanding polyethylene surface functionalization by an atmospheric He/O2 plasma through combined experiments and simulations 2014 Journal of physics: D: applied physics 47 13 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Neyts, E.C.; Rousseau, A. Special issue on fundamentals of plasmasurface interactions 2014 Journal of physics: D: applied physics 47 2 UA library record; WoS full record; WoS citing articles doi
Yusupov, M.; Neyts, E.C.; Simon, P.; Berdiyorov, G.; Snoeckx, R.; van Duin, A.C.T.; Bogaerts, A. Reactive molecular dynamics simulations of oxygen species in a liquid water layer of interest for plasma medicine 2014 Journal of physics: D: applied physics 47 51 UA library record; WoS full record; WoS citing articles pdf doi
Van der Paal, J.; Aernouts, S.; van Duin, A.C.T.; Neyts, E.C.; Bogaerts, A. Interaction of O and OH radicals with a simple model system for lipids in the skin barrier : a reactive molecular dynamics investigation for plasma medicine 2013 Journal of physics: D: applied physics 46 36 UA library record; WoS full record; WoS citing articles pdf doi
Van Gaens, W.; Bogaerts, A. Kinetic modelling for an atmospheric pressure argon plasma jet in humid air 2013 Journal of physics: D: applied physics 46 115 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, S.; Van Gaens, W.; van Gessel, B.; Hofmann, S.; van Veldhuizen, E.; Bogaerts, A.; Bruggeman, P. Spatially resolved ozone densities and gas temperatures in a time modulated RF driven atmospheric pressure plasma jet : an analysis of the production and destruction mechanisms 2013 Journal of physics: D: applied physics 46 74 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Y.-R.; Bogaerts, A.; Wang, Y.-N. Fluid simulation of the phase-shift effect in Ar/CF4 capacitively coupled plasmas 2012 Journal of physics: D: applied physics 45 8 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 2 : radial uniformity of the plasma characteristics 2012 Journal of physics: D: applied physics 45 15 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 1 : transient behaviour of electrodynamics and power deposition 2012 Journal of physics: D: applied physics 45 57 UA library record; WoS full record; WoS citing articles pdf doi
Mao, M.; Wang, Y.N.; Bogaerts, A. Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications 2011 Journal of physics: D: applied physics 44 20 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Eckert, M.; Mao, M.; Neyts, E. Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials 2011 Journal of physics: D: applied physics 44 25 UA library record; WoS full record; WoS citing articles doi
Mao, M.; Bogaerts, A. Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma-enhanced CVD system : the effect of processing parameters 2010 Journal of physics: D: applied physics 43 17 UA library record; WoS full record; WoS citing articles doi
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