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  Author Title Year Publication Volume Times cited Additional Links Links
Verbeeck, J.; Van Aert, S.; Bertoni, G. Model-based quantification of EELS spectra: including the fine structure 2006 Ultramicroscopy 106 38 UA library record; WoS full record; WoS citing articles pdf doi
Verbeeck, J.; Bertoni, G. Model-based quantification of EELS spectra: treating the effect of correlated noise 2008 Ultramicroscopy 108 16 UA library record; WoS full record; WoS citing articles pdf doi
van den Broek, W.; Van Aert, S.; van Dyck, D. A model based reconstruction technique for depth sectioning with scanning transmission electron microscopy 2010 Ultramicroscopy 110 16 UA library record; WoS full record; WoS citing articles pdf doi
Vandenberghe, W.G.; Verhulst, A.S.; Kao, K.-H.; De Meyer, K.; Sorée, B.; Magnus, W.; Groeseneken, G. A model determining optimal doping concentration and material's band gap of tunnel field-effect transistors 2012 Applied physics letters 100 25 UA library record; WoS full record; WoS citing articles doi
Eckert, M.; Neyts, E.; Bogaerts, A. Modeling adatom surface processes during crystal growth: a new implementation of the Metropolis Monte Carlo algorithm 2009 CrystEngComm 11 15 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Y.-R.; Tinck, S.; De Schepper, P.; Wang, Y.-N.; Bogaerts, A. Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime 2015 Journal of vacuum science and technology: A: vacuum surfaces and films 33 3 UA library record; WoS full record; WoS citing articles url doi
Vandenbroucke, A.M.; Aerts, R.; Van Gaens, W.; De Geyter, N.; Leys, C.; Morent, R.; Bogaerts, A. Modeling and experimental study of trichloroethylene abatement with a negative direct current corona discharge 2015 Plasma chemistry and plasma processing 35 9 UA library record; WoS full record; WoS citing articles pdf url doi
Magnus, W.; Brosens, F.; Sorée, B. Modeling drive currents and leakage currents : a dynamic approach 2009 Journal of computational electronics 8 4 UA library record; WoS full record; WoS citing articles doi
Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model 2002 Journal of applied physics 92 15 UA library record; WoS full record; WoS citing articles doi
Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. Modeling of a dielectric barrier discharge used as a flowing chemical reactor 2008 Journal of physics : conference series 133 6 UA library record; WoS full record; WoS citing articles url doi
Bogaerts, A.; Gijbels, R. Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions 2001 Journal of analytical atomic spectrometry 16 36 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R.; Jackson, G.P. Modeling of a millisecond pulsed glow discharge: investigation of the afterpeak 2003 Journal of analytical atomic spectrometry 18 42 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. Modeling of argon direct current glow discharges and comparison with experiment: how good is the agreement? 1998 Journal of analytical atomic spectrometry 13 24 UA library record; WoS full record; WoS citing articles doi
de Witte, H.; Vandervorst, W.; Gijbels, R. Modeling of bombardment induced oxidation of silicon 2001 Journal of applied physics 89 16 UA library record; WoS full record; WoS citing articles doi
Ariskin, D.A.; Schweigert, I.V.; Alexandrov, A.L.; Bogaerts, A.; Peeters, F.M. Modeling of chemical processes in the low pressure capacitive radio frequency discharges in a mixture of Ar/C2H2 2009 Journal of applied physics 105 21 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; de Bleecker, K.; Kolev, I.; Madani, M. Modeling of gas discharge plasmas: What can we learn from it? 2005 Surface and coatings technology 200 11 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R.; Vlcek, J. Modeling of glow discharge optical emission spectrometry: calculation of the argon atomic optical emission spectrum 1998 Spectrochimica acta: part B : atomic spectroscopy 53 44 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. Modeling of glow discharge sources with flat and pin cathodes and implications for mass spectrometric analysis 1997 Journal of the American Society of Mass Spectrometry 8 15 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge 1999 Journal of applied physics 86 18 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Kolev, I. Modeling of magnetron and glow discharges 2002 Le vide: science, technique et applications 57 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Gijbels, R. Modeling of metastable argon atoms in a direct current glow discharge 1995 Physical review : A : atomic, molecular and optical physics 52 98 UA library record; WoS full record; WoS citing articles url doi
Bogaerts, A.; Aerts, R.; Snoeckx, R.; Somers, W.; Van Gaens, W.; Yusupov, M.; Neyts, E. Modeling of plasma and plasma-surface interactions for medical, environmental and nano applications 2012 Journal of physics : conference series 399 7 UA library record; WoS full record; WoS citing articles url doi
de Bleecker, K.; Bogaerts, A.; Goedheer, W. Modeling of the formation and transport of nanoparticles in silane plasmas 2004 Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 70 31 UA library record; WoS full record; WoS citing articles url doi
Bogaerts, A.; De Bie, C.; Eckert, M.; Georgieva, V.; Martens, T.; Neyts, E.; Tinck, S. Modeling of the plasma chemistry and plasmasurface interactions in reactive plasmas 2010 Pure and applied chemistry 82 13 UA library record; WoS full record; WoS citing articles pdf doi
Lenaerts, J.; Verlinden, G.; Ignatova, V.A.; van Vaeck, L.; Gijbels, R.; Geuens, I. Modeling of the sputtering process of cubic silver halide microcrystals and its relevance in depth profiling by secondary ion-mass spectrometry (SIMS) 2001 Fresenius' journal of analytical chemistry 370 3 UA library record; WoS full record; WoS citing articles doi
de Bleecker, K.; Bogaerts, A. Modeling of the synthesis and subsequent growth of nanoparticles in dusty plasmas 2007 High temperature material processes 11 UA library record; WoS full record doi
Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. Modeling of the target surface modification by reactive ion implantation during magnetron sputtering 2004 Journal of vacuum science and technology: A: vacuum surfaces and films 22 13 UA library record; WoS full record; WoS citing articles doi
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. Modeling PECVD growth of nanostructured carbon materials 2009 High temperature material processes 13 UA library record; WoS full record; WoS citing articles doi
Payette, C.; Partoens, B.; Yu, G.; Gupta, J.A.; Austing, D.G.; Nair, S.V.; Amaha, S.; Tarucha, S. Modeling single-particle energy levels and resonance currents in a coherent electronic quantum dot mixer 2009 Applied physics letters 94 5 UA library record; WoS full record; WoS citing articles doi
Martens, T.; Bogaerts, A.; Brok, W.J.M.; van der Mullen, J.J.A.M. Modeling study on the influence of the pressure on a dielectric barrier discharge microplasma 2007 Journal of analytical atomic spectrometry 22 17 UA library record; WoS full record; WoS citing articles doi
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