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Author |
Title |
Year  |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Cremers, V.; Rampelberg, G.; Baert, K.; Abrahami, S.; Claes, N.; de Oliveira, T.M.; Terryn, H.; Bals, S.; Dendooven, J.; Detavernier, C. |
Corrosion protection of Cu by atomic layer deposition |
2019 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
37 |
7 |
UA library record; WoS full record; WoS citing articles |
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Heyne, M.H.; de Marneffe, J.-F.; Radu, I.; Neyts, E.C.; De Gendt, S. |
Thermal recrystallization of short-range ordered WS2 films |
2018 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
36 |
2 |
UA library record; WoS full record; WoS citing articles |
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Zhang, Y.-R.; Gao, F.; Li, X.-C.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the bias effect in inductive/capacitive discharges |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
9 |
UA library record; WoS full record; WoS citing articles |
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Liu, Y.-X.; Zhang, Y.-R.; Bogaerts, A.; Wang, Y.-N. |
Electromagnetic effects in high-frequency large-area capacitive discharges : a review |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
10 |
UA library record; WoS full record; WoS citing articles |
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Zhang, Y.-R.; Tinck, S.; De Schepper, P.; Wang, Y.-N.; Bogaerts, A. |
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
3 |
UA library record; WoS full record; WoS citing articles |
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Deng, S.; Verbruggen, S.W.; Lenaerts, S.; Martens, J.A.; Van den Berghe, S.; Devloo-Casier, K.; Devulder, W.; Dendoover, J.; Deduytsche, D.; Detavernier, C. |
Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing |
2014 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
32 |
10 |
UA library record; WoS full record; WoS citing articles |
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Delabie, A.; Sioncke, S.; Rip, J.; Van Elshocht, S.; Pourtois, G.; Mueller, M.; Beckhoff, B.; Pierloot, K. |
Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates |
2012 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
30 |
41 |
UA library record; WoS full record; WoS citing articles |
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Dubourdieu, C.; Rauwel, E.; Roussel, H.; Ducroquet, F.; Hollaender, B.; Rossell, M.; Van Tendeloo, G.; Lhostis, S.; Rushworth, S. |
Addition of yttrium into HfO2 films: microstructure and electrical properties |
2009 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
27 |
29 |
UA library record; WoS full record; WoS citing articles |
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Kolev, I.; Bogaerts, A. |
Numerical study of the sputtering in a dc magnetron |
2009 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
27 |
66 |
UA library record; WoS full record; WoS citing articles |
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Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. |
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering |
2004 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
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Mihailescu, I.N.; Gyorgy, E.; Marin, G.; Popescu, M.; Teodorescu, V.S.; van Landuyt, J.; Grivas, C.; Hatziapostolou, A. |
Crystalline structure of very hard tungsten carbide thin films obtained by reactive pulsed laser deposition |
1999 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
17 |
8 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Naylor, J.; Hatcher, M.; Jones, W.J.; Mason, R. |
Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment |
1998 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
16 |
12 |
UA library record; WoS full record; WoS citing articles |
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