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Author |
Title |
Year  |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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de Bleecker, K.; Bogaerts, A.; Goedheer, W. |
Modelling of nanoparticle coagulation and transport dynamics in dusty silane discharges |
2006 |
New journal of physics |
8 |
20 |
UA library record; WoS full record; WoS citing articles |
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de Bleecker, K.; Bogaerts, A.; Goedheer, W. |
Aromatic ring generation as a dust precursor in acetylene discharges |
2006 |
Applied physics letters |
88 |
20 |
UA library record; WoS full record; WoS citing articles |
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de Bleecker, K.; Bogaerts, A.; Goedheer, W. |
Detailed modeling of hydrocarbon nanoparticle nucleation in acetylene discharges |
2006 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
73 |
89 |
UA library record; WoS full record; WoS citing articles |
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de Bleecker, K.; Bogaerts, A.; Goedheer, W. |
Role of the thermophoretic force on the transport of nanoparticles in dusty silane plasmas |
2005 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
71 |
25 |
UA library record; WoS full record; WoS citing articles |
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de Bleecker, K.; Bogaerts, A.; Goedheer, W.J. |
Nanoparticle growth and transport mechanisms in capacitively coupled silane discharges: a numerical investigation |
2005 |
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UA library record; WoS full record; |
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de Bleecker, K.; Bogaerts, A.; Goedheer, W. |
Modeling of the formation and transport of nanoparticles in silane plasmas |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
70 |
31 |
UA library record; WoS full record; WoS citing articles |
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de Bleecker, K.; Bogaerts, A.; Goedheer, W.; Gijbels, R. |
Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model |
2004 |
IEEE transactions on plasma science |
32 |
29 |
UA library record; WoS full record; WoS citing articles |
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de Bleecker, K.; Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Numerical investigation of particle formation mechanisms in silane discharges |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
69 |
74 |
UA library record; WoS full record; WoS citing articles |
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de Bleecker, K.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Modelling of formation and transport of nanoparticles in silane discharges |
2004 |
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UA library record |
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Herrebout, D.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J.; Vanhulsel, A. |
A one-dimensional fluid model for an acetylene rf discharge: a study of the plasma chemistry |
2003 |
IEEE transactions on plasma science |
31 |
26 |
UA library record; WoS full record; WoS citing articles |
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Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. |
Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model |
2002 |
Journal of applied physics |
92 |
15 |
UA library record; WoS full record; WoS citing articles |
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Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Local and fast relaxation phenomena after laser-induced photodetachment in a strongly electronegative rf discharge |
2002 |
Physical review : E : statistical, nonlinear, and soft matter physics |
65 |
2 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Improved hybrid Monte Carlo-fluid model for the electrical characteristics in an analytical radiofrequency glow discharge in argon |
2001 |
Journal of analytical atomic spectrometry |
16 |
11 |
UA library record; WoS full record; WoS citing articles |
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Herrebout, D.; Bogaerts, A.; Yan, M.; Goedheer, W.; Dekempeneer, E.; Gijbels, R. |
1D fluid model for an rf methane plasma of interest in deposition of diamond-like carbon layers |
2001 |
Journal of applied physics |
90 |
83 |
UA library record; WoS full record; WoS citing articles |
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Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
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Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4 |
2000 |
Journal of applied physics |
87 |
14 |
UA library record; WoS full record; WoS citing articles |
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Herrebout, D.; Bogaerts, A.; Yan, M.; Goedheer, W.; Dekempeneer, E.; Gijbels, R. |
An extended RF methane plasma 1D fluid model of interest in deposition of diamond-like carbon layers |
2000 |
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UA library record |
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Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Hybrid modeling of a capacitively coupled radio frequency glow discharge in argon: combined Monte Carlo and fluid model |
1999 |
Japanese journal of applied physics |
38 |
45 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Comparison between a radio-frequency and direct current glow discharge in argon by a hybrid Monte Carlo-fluid model for electrons, argon ions and fast argon atoms |
1999 |
Spectrochimica acta: part B : atomic spectroscopy |
54 |
11 |
UA library record; WoS full record; WoS citing articles |
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Herrebout, D.; Bogaerts, A.; Goedheer, W.; Dekempeneer, E.; Gijbels, R. |
Simulation of plasma processes in plasma assisted CVD reactors |
1999 |
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UA library record; WoS full record; |
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Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Two-dimensional model of a direct current glow discharge: description of the electrons, argon ions and fast argon atoms |
1996 |
Analytical chemistry |
68 |
70 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Hybrid Monte Carlo-fluid model of a direct current glow discharge |
1995 |
Journal of applied physics |
78 |
117 |
UA library record; WoS full record; WoS citing articles |
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