|
Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
|
Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. |
Modeling of a dielectric barrier discharge used as a flowing chemical reactor |
2008 |
Journal of physics : conference series |
133 |
6 |
UA library record; WoS full record; WoS citing articles |
|
Bogaerts, A.; Gijbels, R. |
Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions |
2001 |
Journal of analytical atomic spectrometry |
16 |
36 |
UA library record; WoS full record; WoS citing articles |
|
Bogaerts, A.; Gijbels, R.; Jackson, G.P. |
Modeling of a millisecond pulsed glow discharge: investigation of the afterpeak |
2003 |
Journal of analytical atomic spectrometry |
18 |
42 |
UA library record; WoS full record; WoS citing articles |
|
Bogaerts, A.; Gijbels, R. |
Modeling of argon direct current glow discharges and comparison with experiment: how good is the agreement? |
1998 |
Journal of analytical atomic spectrometry |
13 |
24 |
UA library record; WoS full record; WoS citing articles |
|
de Witte, H.; Vandervorst, W.; Gijbels, R. |
Modeling of bombardment induced oxidation of silicon |
2001 |
Journal of applied physics |
89 |
16 |
UA library record; WoS full record; WoS citing articles |
|
de Witte, H.; Vandervorst, W.; Gijbels, R. |
Modeling of bombardment induced oxidation of silicon with and without oxygen flooding |
1998 |
|
|
|
UA library record |
|
Bogaerts, A.; de Bleecker, K.; Kolev, I.; Madani, M. |
Modeling of gas discharge plasmas: What can we learn from it? |
2005 |
Surface and coatings technology |
200 |
11 |
UA library record; WoS full record; WoS citing articles |
|
Gijbels, R.; Bogaerts, A. |
Modeling of glow discharge ion sources for mass spectrometry: potentials and limitations |
1997 |
Spectroscopy |
9 |
|
UA library record |
|
Bogaerts, A.; Gijbels, R.; Vlcek, J. |
Modeling of glow discharge optical emission spectrometry: calculation of the argon atomic optical emission spectrum |
1998 |
Spectrochimica acta: part B : atomic spectroscopy |
53 |
44 |
UA library record; WoS full record; WoS citing articles |
|
Bogaerts, A.; Gijbels, R. |
Modeling of glow discharge sources with flat and pin cathodes and implications for mass spectrometric analysis |
1997 |
Journal of the American Society of Mass Spectrometry |
8 |
15 |
UA library record; WoS full record; WoS citing articles |
|
Bogaerts, A.; Gijbels, R. |
Modeling of glow discharges: what can we learn from it? |
1997 |
Analytical chemistry A-pages |
69 |
|
UA library record |
|
Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
|
Bogaerts, A.; Kolev, I. |
Modeling of magnetron and glow discharges |
2002 |
Le vide: science, technique et applications |
57 |
|
UA library record; WoS full record; WoS citing articles |
|
Bogaerts, A.; Gijbels, R. |
Modeling of metastable argon atoms in a direct current glow discharge |
1995 |
Physical review : A : atomic, molecular and optical physics |
52 |
98 |
UA library record; WoS full record; WoS citing articles |
|
Bogaerts, A.; Aerts, R.; Snoeckx, R.; Somers, W.; Van Gaens, W.; Yusupov, M.; Neyts, E. |
Modeling of plasma and plasma-surface interactions for medical, environmental and nano applications |
2012 |
Journal of physics : conference series |
399 |
7 |
UA library record; WoS full record; WoS citing articles |
|
Bogaerts, A.; Gijbels, R. |
Modeling of radio-frequency and direct current glow discharges in argon |
2000 |
Journal of technical physics |
41 |
|
UA library record |
|
de Bleecker, K.; Bogaerts, A.; Goedheer, W. |
Modeling of the formation and transport of nanoparticles in silane plasmas |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
70 |
31 |
UA library record; WoS full record; WoS citing articles |
|
Bogaerts, A.; Kolev, I.; Buyle, G. |
Modeling of the magnetron discharge |
2008 |
|
|
|
UA library record |
|
Bogaerts, A.; De Bie, C.; Eckert, M.; Georgieva, V.; Martens, T.; Neyts, E.; Tinck, S. |
Modeling of the plasma chemistry and plasmasurface interactions in reactive plasmas |
2010 |
Pure and applied chemistry |
82 |
13 |
UA library record; WoS full record; WoS citing articles |
|
Lenaerts, J.; Verlinden, G.; Ignatova, V.A.; van Vaeck, L.; Gijbels, R.; Geuens, I. |
Modeling of the sputtering process of cubic silver halide microcrystals and its relevance in depth profiling by secondary ion-mass spectrometry (SIMS) |
2001 |
Fresenius' journal of analytical chemistry |
370 |
3 |
UA library record; WoS full record; WoS citing articles |
|
de Bleecker, K.; Bogaerts, A. |
Modeling of the synthesis and subsequent growth of nanoparticles in dusty plasmas |
2007 |
High temperature material processes |
11 |
|
UA library record; WoS full record |
|
Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. |
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering |
2004 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
|
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. |
Modeling PECVD growth of nanostructured carbon materials |
2009 |
High temperature material processes |
13 |
|
UA library record; WoS full record; WoS citing articles |
|
Martens, T.; Bogaerts, A.; Brok, W.J.M.; van der Mullen, J.J.A.M. |
Modeling study on the influence of the pressure on a dielectric barrier discharge microplasma |
2007 |
Journal of analytical atomic spectrometry |
22 |
17 |
UA library record; WoS full record; WoS citing articles |
|
Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
|
Tinck, S.; Bogaerts, A. |
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) |
2012 |
Plasma processes and polymers |
9 |
5 |
UA library record; WoS full record; WoS citing articles |
|
O'Regan, T.P.; Hurley, P.K.; Sorée, B.; Fischetti, M.V. |
Modeling the capacitance-voltage response of In0.53Ga0.47As metal-oxide-semiconductor structures : charge quantization and nonparabolic corrections |
2010 |
Applied Physics Letters |
96 |
26 |
UA library record; WoS full record; WoS citing articles |
|
Neyts, E.C.; Bogaerts, A. |
Modeling the growth of SWNTs and graphene on the atomic scale |
2012 |
ECS transactions |
45 |
2 |
UA library record; WoS full record; WoS citing articles |
|
Kao, K.-H.; Verhulst, A.S.; Vandenberghe, W.G.; Sorée, B.; Groeseneken, G.; De Meyer, K. |
Modeling the impact of junction angles in tunnel field-effect transistors |
2012 |
Solid state electronics |
69 |
9 |
UA library record; WoS full record; WoS citing articles |
|
Verhulst, A.; Sorée, B.; Leonelli, D.; Vandenberghe, W.G.; Groeseneken, G. |
Modeling the single-gate, double-gate, and gate-all-around tunnel field-effect transistor |
2010 |
Journal Of Applied Physics |
107 |
150 |
UA library record; WoS full record; WoS citing articles |