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Insights in the plasma-assisted growth of carbon nanotubes through atomic scale simulations : effect of electric field”. Neyts EC, van Duin ACT, Bogaerts A, Journal of the American Chemical Society 134, 1256 (2012). http://doi.org/10.1021/ja2096317
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An investigation into the dominant reactions for ethylene destruction in non-thermal atmospheric plasmas”. Aerts R, Tu X, De Bie C, Whitehead JC, Bogaerts A, Plasma processes and polymers 9, 994 (2012). http://doi.org/10.1002/ppap.201100168
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Modeling aspects of plasma-enhanced chemical vapor deposition of carbon-based materials”. Neyts E, Mao M, Eckert M, Bogaerts A CRC Press, Boca Raton, Fla, page 245 (2012).
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Modeling of plasma and plasma-surface interactions for medical, environmental and nano applications”. Bogaerts A, Aerts R, Snoeckx R, Somers W, Van Gaens W, Yusupov M, Neyts E, Journal of physics : conference series 399, 012011 (2012). http://doi.org/10.1088/1742-6596/399/1/012011
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Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI)”. Tinck S, Bogaerts A, Plasma processes and polymers 9, 522 (2012). http://doi.org/10.1002/ppap.201100093
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Modeling the growth of SWNTs and graphene on the atomic scale”. Neyts EC, Bogaerts A, ECS transactions 45, 73 (2012). http://doi.org/10.1149/1.3700454
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Optimization of operating parameters for inductively coupled plasma mass spectrometry : a computational study”. Aghaei M, Lindner H, Bogaerts A, Spectrochimica acta: part B : atomic spectroscopy 76, 56 (2012). http://doi.org/10.1016/j.sab.2012.06.006
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Plasma species interacting with nickel surfaces : toward an atomic scale understanding of plasma-catalysis”. Somers W, Bogaerts A, van Duin ACT, Neyts EC, The journal of physical chemistry: C : nanomaterials and interfaces 116, 20958 (2012). http://doi.org/10.1021/jp307380w
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Space charge corrected electron emission from an aluminum surface under non-equilibrium conditions”. Wendelen W, Mueller BY, Autrique D, Rethfeld B, Bogaerts A, Journal of applied physics 111, 113110 (2012). http://doi.org/10.1063/1.4729071
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Sputter deposition of MgxAlyOz thin films in a dual-magnetron device : a multi-species Monte Carlo model”. Yusupov M, Saraiva M, Depla D, Bogaerts A, New journal of physics 14, 073043 (2012). http://doi.org/10.1088/1367-2630/14/7/073043
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Behavior of electrons in a dual-magnetron sputter deposition system : a Monte Carlo model”. Yusupov M, Bultinck E, Depla D, Bogaerts A, New journal of physics 13, 033018 (2011). http://doi.org/10.1088/1367-2630/13/3/033018
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Catalytic and molecular separation properties of Zeogrids and Zeotiles”. Martens JA, Thybaut JW, Denayer JFM, Sree SP, Aerts A, Reyniers M-F, van Speybroeck V, Waroquier M, Buekenhoudt A, Vankelecom I, Buijs W, Persoons J, Baron GV, Bals S, Van Tendeloo G, Marin GB, Jacobs PA, Kirschhock CEA, Catalysis today 168, 17 (2011). http://doi.org/10.1016/j.cattod.2011.01.036
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Changing chirality during single-walled carbon nanotube growth : a reactive molecular dynamics/Monte Carlo study”. Neyts EC, van Duin ACT, Bogaerts A, Journal of the American Chemical Society 133, 17225 (2011). http://doi.org/10.1021/ja204023c
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Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model”. Bultinck E, Bogaerts A, Plasma sources science and technology 20, 045013 (2011). http://doi.org/10.1088/0963-0252/20/4/045013
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Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials”. Bogaerts A, Eckert M, Mao M, Neyts E, Journal of physics: D: applied physics 44, 174030 (2011). http://doi.org/10.1088/0022-3727/44/17/174030
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Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition”. Tinck S, Bogaerts A, Plasma sources science and technology 20, 015008 (2011). http://doi.org/10.1088/0963-0252/20/1/015008
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Computer simulations of laser ablation, plume expansion and plasma formation”. Bogaerts A, Aghaei M, Autrique D, Lindner H, Chen Z, Wendelen W Trans Tech, Aedermannsdorf, page 1 (2011).
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A density-functional theory simulation of the formation of Ni-doped fullerenes by ion implantation”. Neyts E, Maeyens A, Pourtois G, Bogaerts A, Carbon 49, 1013 (2011). http://doi.org/10.1016/j.carbon.2010.11.009
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Design of Ru-zeolites for hydrogen-free production of conjugated linoleic acid”. Philippaerts A, Goossens S, Vermandel W, Tromp M, Turner S, Geboers J, Van Tendeloo G, Jacobs PA, Sels BF, Chemsuschem 4, 757 (2011). http://doi.org/10.1002/cssc.201100015
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Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations”. De Bie C, Martens T, van Dijk J, Paulussen S, Verheyde B, Corthals S, Bogaerts A, Plasma sources science and technology 20, 024008 (2011). http://doi.org/10.1088/0963-0252/20/2/024008
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Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system”. Yusupov M, Bultinck E, Depla D, Bogaerts A, Applied physics letters 98, 131502 (2011). http://doi.org/10.1063/1.3574365
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Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge”. De Bie C, Verheyde B, Martens T, van Dijk J, Paulussen S, Bogaerts A, Plasma processes and polymers 8, 1033 (2011). http://doi.org/10.1002/ppap.201100027
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Fluid simulations of frequency effects on nonlinear harmonics in inductively coupled plasma”. Si X-J, Zhao S-X, Xu X, Bogaerts A, Wang Y-N, Physics of plasmas 18, 033504 (2011). http://doi.org/10.1063/1.3566007
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The influence of Cr and Y on the micro structural evolution of Mg―Cr―O and Mg―Y―O thin films”. Jehanathan N, Georgieva V, Saraiva M, Depla D, Bogaerts A, Van Tendeloo G, Thin solid films : an international journal on the science and technology of thin and thick films 519, 5388 (2011). http://doi.org/10.1016/j.tsf.2011.02.050
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Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating”. Tinck S, Boullart W, Bogaerts A, Plasma sources science and technology 20, 045012 (2011). http://doi.org/10.1088/0963-0252/20/4/045012
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Modelling of synchrotron SAXS patterns of silicalite-1 zeolite during crystallization”. Aerts A, Follens LRA, Biermans E, Bals S, Van Tendeloo G, Loppinet B, Kirschhock CEA, Martens JA, Physical chemistry, chemical physics 13, 4318 (2011). http://doi.org/10.1039/c0cp01592j
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Multi-element model for the simulation of inductively coupled plasmas : effects of helium addition to the central gas stream”. Lindner H, Bogaerts A, Spectrochimica acta: part B : atomic spectroscopy 66, 421 (2011). http://doi.org/10.1016/j.sab.2011.04.007
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Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications”. Mao M, Wang YN, Bogaerts A, Journal of physics: D: applied physics 44, 435202 (2011). http://doi.org/10.1088/0022-3727/44/43/435202
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Plasma chemistry modeling for an inductively coupled plasma used for the growth of carbon nanotubes”. Mao M, Bogaerts A, Journal of physics : conference series 275, 012021 (2011). http://doi.org/10.1088/1742-6596/275/1/012021
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Simulation and experimental studies on plasma temperature, flow velocity, and injector diameter effects for an inductively coupled plasma”. Lindner H, Murtazin A, Groh S, Niemax K, Bogaerts A, Analytical chemistry 83, 9260 (2011). http://doi.org/10.1021/ac201699q
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