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  Author Title Year (up) Publication Volume Times cited Additional Links Links
Bultinck, E.; Bogaerts, A. Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model 2011 Plasma sources science and technology 20 7 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Eckert, M.; Mao, M.; Neyts, E. Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials 2011 Journal of physics: D: applied physics 44 25 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Bogaerts, A. Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition 2011 Plasma sources science and technology 20 11 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Aghaei, M.; Autrique, D.; Lindner, H.; Chen, Z.; Wendelen, W. Computer simulations of laser ablation, plume expansion and plasma formation 2011 8 UA library record; WoS full record; WoS citing articles doi
Neyts, E.; Maeyens, A.; Pourtois, G.; Bogaerts, A. A density-functional theory simulation of the formation of Ni-doped fullerenes by ion implantation 2011 Carbon 49 13 UA library record; WoS full record; WoS citing articles doi
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations 2011 Plasma sources science and technology 20 38 UA library record; WoS full record; WoS citing articles pdf doi
Yusupov, M.; Bultinck, E.; Depla, D.; Bogaerts, A. Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system 2011 Applied physics letters 98 4 UA library record; WoS full record; WoS citing articles doi
De Bie, C.; Verheyde, B.; Martens, T.; van Dijk, J.; Paulussen, S.; Bogaerts, A. Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge 2011 Plasma processes and polymers 8 70 UA library record; WoS full record; WoS citing articles pdf doi
Si, X.-J.; Zhao, S.-X.; Xu, X.; Bogaerts, A.; Wang, Y.-N. Fluid simulations of frequency effects on nonlinear harmonics in inductively coupled plasma 2011 Physics of plasmas 18 7 UA library record; WoS full record; WoS citing articles pdf doi
Jehanathan, N.; Georgieva, V.; Saraiva, M.; Depla, D.; Bogaerts, A.; Van Tendeloo, G. The influence of Cr and Y on the micro structural evolution of Mg―Cr―O and Mg―Y―O thin films 2011 Thin solid films : an international journal on the science and technology of thin and thick films 519 4 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles pdf doi
Lindner, H.; Bogaerts, A. Multi-element model for the simulation of inductively coupled plasmas : effects of helium addition to the central gas stream 2011 Spectrochimica acta: part B : atomic spectroscopy 66 28 UA library record; WoS full record; WoS citing articles doi
Mao, M.; Wang, Y.N.; Bogaerts, A. Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications 2011 Journal of physics: D: applied physics 44 20 UA library record; WoS full record; WoS citing articles pdf doi
Mao, M.; Bogaerts, A. Plasma chemistry modeling for an inductively coupled plasma used for the growth of carbon nanotubes 2011 Journal of physics : conference series 275 UA library record url doi
Lindner, H.; Murtazin, A.; Groh, S.; Niemax, K.; Bogaerts, A. Simulation and experimental studies on plasma temperature, flow velocity, and injector diameter effects for an inductively coupled plasma 2011 Analytical chemistry 83 34 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Bogaerts, A.; Shamiryan, D. Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma 2011 Plasma processes and polymers 8 5 UA library record; WoS full record; WoS citing articles doi
Eckert, M.; Mortet, V.; Zhang, L.; Neyts, E.; Verbeeck, J.; Haenen, ken; Bogaerts, A. Theoretical investigation of grain size tuning during prolonged bias-enhanced nucleation 2011 Chemistry of materials 23 9 UA library record; WoS full record; WoS citing articles pdf doi
Georgieva, V.; Voter, A.F.; Bogaerts, A. Understanding the surface diffusion processes during magnetron sputter-deposition of complex oxide Mg-Al-O thin films 2011 Crystal growth & design 11 14 UA library record; WoS full record; WoS citing articles doi
Simon, P.; Bogaerts, A. Vibrational level population of nitrogen impurities in low-pressure argon glow discharges 2011 Journal of analytical atomic spectrometry 26 6 UA library record; WoS full record; WoS citing articles doi
Yusupov, M.; Neyts, E.C.; Khalilov, U.; Snoeckx, R.; van Duin, A.C.T.; Bogaerts, A. Atomic-scale simulations of reactive oxygen plasma species interacting with bacterial cell walls 2012 New journal of physics 14 47 UA library record; WoS full record; WoS citing articles url doi
Aghaei, M.; Lindner, H.; Bogaerts, A. Effect of a mass spectrometer interface on inductively coupled plasma characteristics : a computational study 2012 Journal of analytical atomic spectrometry 27 18 UA library record; WoS full record; WoS citing articles doi
Liu, Y.-X.; Zhang, Q.-Z.; Liu, J.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. Effect of bulk electric field reversal on the bounce resonance heating in dual-frequency capacitively coupled electronegative plasmas 2012 Applied physics letters 101 26 UA library record; WoS full record; WoS citing articles pdf doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma 2012 Plasma sources science and technology 21 23 UA library record; WoS full record; WoS citing articles pdf doi
Teodoru, S.; Kusano, Y.; Bogaerts, A. The effect of O2 in a humid O2/N2/NOx gas mixture on NOx and N2O remediation by an atmospheric pressure dielectric barrier discharge 2012 Plasma processes and polymers 9 24 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 1 : transient behaviour of electrodynamics and power deposition 2012 Journal of physics: D: applied physics 45 57 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 2 : radial uniformity of the plasma characteristics 2012 Journal of physics: D: applied physics 45 15 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Y.-R.; Bogaerts, A.; Wang, Y.-N. Fluid simulation of the phase-shift effect in Ar/CF4 capacitively coupled plasmas 2012 Journal of physics: D: applied physics 45 8 UA library record; WoS full record; WoS citing articles pdf doi
Mortet, V.; Zhang, L.; Eckert, M.; D'Haen, J.; Soltani, A.; Moreau, M.; Troadec, D.; Neyts, E.; De Jaeger, J.C.; Verbeeck, J.; Bogaerts, A.; Van Tendeloo, G.; Haenen, K.; Wagner, P. Grain size tuning of nanocrystalline chemical vapor deposited diamond by continuous electrical bias growth : experimental and theoretical study 2012 Physica status solidi : A : applications and materials science 209 31 UA library record; WoS full record; WoS citing articles pdf doi
Aerts, R.; Martens, T.; Bogaerts, A. Influence of vibrational states on CO2 splitting by dielectric barrier discharges 2012 The journal of physical chemistry: C : nanomaterials and interfaces 116 112 UA library record; WoS full record; WoS citing articles doi
Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. Insights in the plasma-assisted growth of carbon nanotubes through atomic scale simulations : effect of electric field 2012 Journal of the American Chemical Society 134 56 UA library record; WoS full record; WoS citing articles pdf doi
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