Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Yusupov, M.; Saraiva, M.; Depla, D.; Bogaerts, A. |
Sputter deposition of MgxAlyOz thin films in a dual-magnetron device : a multi-species Monte Carlo model |
2012 |
New journal of physics |
14 |
2 |
UA library record; WoS full record; WoS citing articles |
Teodoru, S.; Kusano, Y.; Bogaerts, A. |
The effect of O2 in a humid O2/N2/NOx gas mixture on NOx and N2O remediation by an atmospheric pressure dielectric barrier discharge |
2012 |
Plasma processes and polymers |
9 |
24 |
UA library record; WoS full record; WoS citing articles |
Wendelen, W.; Mueller, B.Y.; Autrique, D.; Rethfeld, B.; Bogaerts, A. |
Space charge corrected electron emission from an aluminum surface under non-equilibrium conditions |
2012 |
Journal of applied physics |
111 |
30 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) |
2012 |
Plasma processes and polymers |
9 |
5 |
UA library record; WoS full record; WoS citing articles |
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
Aghaei, M.; Lindner, H.; Bogaerts, A. |
Effect of a mass spectrometer interface on inductively coupled plasma characteristics : a computational study |
2012 |
Journal of analytical atomic spectrometry |
27 |
18 |
UA library record; WoS full record; WoS citing articles |
Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. |
Insights in the plasma-assisted growth of carbon nanotubes through atomic scale simulations : effect of electric field |
2012 |
Journal of the American Chemical Society |
134 |
56 |
UA library record; WoS full record; WoS citing articles |
Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 2 : radial uniformity of the plasma characteristics |
2012 |
Journal of physics: D: applied physics |
45 |
15 |
UA library record; WoS full record; WoS citing articles |
Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 1 : transient behaviour of electrodynamics and power deposition |
2012 |
Journal of physics: D: applied physics |
45 |
57 |
UA library record; WoS full record; WoS citing articles |
Lindner, H.; Murtazin, A.; Groh, S.; Niemax, K.; Bogaerts, A. |
Simulation and experimental studies on plasma temperature, flow velocity, and injector diameter effects for an inductively coupled plasma |
2011 |
Analytical chemistry |
83 |
34 |
UA library record; WoS full record; WoS citing articles |
De Bie, C.; Verheyde, B.; Martens, T.; van Dijk, J.; Paulussen, S.; Bogaerts, A. |
Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge |
2011 |
Plasma processes and polymers |
8 |
70 |
UA library record; WoS full record; WoS citing articles |
Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. |
Changing chirality during single-walled carbon nanotube growth : a reactive molecular dynamics/Monte Carlo study |
2011 |
Journal of the American Chemical Society |
133 |
116 |
UA library record; WoS full record; WoS citing articles |
Mao, M.; Wang, Y.N.; Bogaerts, A. |
Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications |
2011 |
Journal of physics: D: applied physics |
44 |
20 |
UA library record; WoS full record; WoS citing articles |
Bultinck, E.; Bogaerts, A. |
Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model |
2011 |
Plasma sources science and technology |
20 |
7 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
Lindner, H.; Bogaerts, A. |
Multi-element model for the simulation of inductively coupled plasmas : effects of helium addition to the central gas stream |
2011 |
Spectrochimica acta: part B : atomic spectroscopy |
66 |
28 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Aghaei, M.; Autrique, D.; Lindner, H.; Chen, Z.; Wendelen, W. |
Computer simulations of laser ablation, plume expansion and plasma formation |
2011 |
|
|
8 |
UA library record; WoS full record; WoS citing articles |
Jehanathan, N.; Georgieva, V.; Saraiva, M.; Depla, D.; Bogaerts, A.; Van Tendeloo, G. |
The influence of Cr and Y on the micro structural evolution of Mg―Cr―O and Mg―Y―O thin films |
2011 |
Thin solid films : an international journal on the science and technology of thin and thick films |
519 |
4 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A.; Shamiryan, D. |
Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma |
2011 |
Plasma processes and polymers |
8 |
5 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Voter, A.F.; Bogaerts, A. |
Understanding the surface diffusion processes during magnetron sputter-deposition of complex oxide Mg-Al-O thin films |
2011 |
Crystal growth & design |
11 |
14 |
UA library record; WoS full record; WoS citing articles |
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. |
Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations |
2011 |
Plasma sources science and technology |
20 |
38 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Eckert, M.; Mao, M.; Neyts, E. |
Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials |
2011 |
Journal of physics: D: applied physics |
44 |
25 |
UA library record; WoS full record; WoS citing articles |
Yusupov, M.; Bultinck, E.; Depla, D.; Bogaerts, A. |
Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system |
2011 |
Applied physics letters |
98 |
4 |
UA library record; WoS full record; WoS citing articles |
Si, X.-J.; Zhao, S.-X.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulations of frequency effects on nonlinear harmonics in inductively coupled plasma |
2011 |
Physics of plasmas |
18 |
7 |
UA library record; WoS full record; WoS citing articles |
Yusupov, M.; Bultinck, E.; Depla, D.; Bogaerts, A. |
Behavior of electrons in a dual-magnetron sputter deposition system : a Monte Carlo model |
2011 |
New journal of physics |
13 |
12 |
UA library record; WoS full record; WoS citing articles |
Simon, P.; Bogaerts, A. |
Vibrational level population of nitrogen impurities in low-pressure argon glow discharges |
2011 |
Journal of analytical atomic spectrometry |
26 |
6 |
UA library record; WoS full record; WoS citing articles |
Eckert, M.; Mortet, V.; Zhang, L.; Neyts, E.; Verbeeck, J.; Haenen, ken; Bogaerts, A. |
Theoretical investigation of grain size tuning during prolonged bias-enhanced nucleation |
2011 |
Chemistry of materials |
23 |
9 |
UA library record; WoS full record; WoS citing articles |
Wendelen, W.; Autrique, D.; Bogaerts, A. |
Space charge limited electron emission from a Cu surface under ultrashort pulsed laser irradiation |
2010 |
AIP conference proceedings |
1278 |
|
UA library record; WoS full record |
Neyts, E.; Maeyens, A.; Pourtois, G.; Bogaerts, A. |
A density-functional theory simulation of the formation of Ni-doped fullerenes by ion implantation |
2011 |
Carbon |
49 |
13 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |