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Author |
Title |
Year |
Publication |
Volume  |
Times cited |
Additional Links |
Links |
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Neyts, E.C.; Bal, K.M. |
Effect of electric fields on plasma catalytic hydrocarbon oxidation from atomistic simulations |
2017 |
Plasma processes and polymers |
14 |
2 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Alves, L.L.; Bogaerts, A. |
Special Issue on Numerical Modelling of Low-Temperature Plasmas for Various Applications – Part I: Review and Tutorial Papers on Numerical Modelling Approaches |
2017 |
Plasma processes and polymers |
14 |
3 |
UA library record |
|
|
|
Tinck, S.; Tillocher, T.; Georgieva, V.; Dussart, R.; Neyts, E.; Bogaerts, A. |
Concurrent effects of wafer temperature and oxygen fraction on cryogenic silicon etching with SF6/O2plasmas |
2017 |
Plasma processes and polymers |
14 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Belov, I.; Paulussen, S.; Bogaerts, A. |
Pressure as an additional control handle for non-thermal atmospheric plasma processes |
2017 |
Plasma processes and polymers |
14 |
1 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Razzokov, J.; Yusupov, M.; Vanuytsel, S.; Neyts, E.C.; Bogaerts, A. |
Phosphatidylserine flip-flop induced by oxidation of the plasma membrane: a better insight by atomic scale modeling |
2017 |
Plasma processes and polymers |
14 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. |
Modeling PECVD growth of nanostructured carbon materials |
2009 |
High temperature material processes |
13 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Vermeylen, S.; De Waele, J.; Vanuytsel, S.; De Backer, J.; Van der Paal, J.; Ramakers, M.; Leyssens, K.; Marcq, E.; Van Audenaerde, J.; L. J. Smits, E.; Dewilde, S.; Bogaerts, A. |
Cold atmospheric plasma treatment of melanoma and glioblastoma cancer cells |
2016 |
Plasma processes and polymers |
13 |
26 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Laroussi, M.; Bogaerts, A.; Barekzi, N. |
Plasma processes and polymers third special issue on plasma and cancer |
2016 |
Plasma processes and polymers |
13 |
1 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Ramakers, M.; Michielsen, I.; Aerts, R.; Meynen, V.; Bogaerts, A. |
Effect of argon or helium on the CO2 conversion in a dielectric barrier discharge |
2015 |
Plasma processes and polymers |
12 |
63 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Yusupov, M.; Neyts, E.C.; Verlackt, C.C.; Khalilov, U.; van Duin, A.C.T.; Bogaerts, A. |
Inactivation of the endotoxic biomolecule lipid A by oxygen plasma species : a reactive molecular dynamics study |
2015 |
Plasma processes and polymers |
12 |
18 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. |
Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation |
2014 |
Plasma processes and polymers |
11 |
1 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Aerts, R.; Snoeckx, R.; Bogaerts, A. |
In-situ chemical trapping of oxygen in the splitting of carbon dioxide by plasma |
2014 |
Plasma processes and polymers |
11 |
29 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Somers, W.; Dubreuil, M.F.; Neyts, E.C.; Vangeneugden, D.; Bogaerts, A. |
Incorporation of fluorescent dyes in atmospheric pressure plasma coatings for in-line monitoring of coating homogeneity |
2014 |
Plasma processes and polymers |
11 |
3 |
UA library record; WoS full record; WoS citing articles |
|
|
|
de Bleecker, K.; Bogaerts, A. |
Modeling of the synthesis and subsequent growth of nanoparticles in dusty plasmas |
2007 |
High temperature material processes |
11 |
|
UA library record; WoS full record |
|
|
|
Bogaerts, A.; Yusupov, M.; Van der Paal, J.; Verlackt, C.C.W.; Neyts, E.C. |
Reactive molecular dynamics simulations for a better insight in plasma medicine |
2014 |
Plasma processes and polymers |
11 |
22 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; De Schepper, P.; Bogaerts, A. |
Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas |
2013 |
Plasma processes and polymers |
10 |
3 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Teodoru, S.; Kusano, Y.; Bogaerts, A. |
The effect of O2 in a humid O2/N2/NOx gas mixture on NOx and N2O remediation by an atmospheric pressure dielectric barrier discharge |
2012 |
Plasma processes and polymers |
9 |
24 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Aerts, R.; Tu, X.; De Bie, C.; Whitehead, J.C.; Bogaerts, A. |
An investigation into the dominant reactions for ethylene destruction in non-thermal atmospheric plasmas |
2012 |
Plasma processes and polymers |
9 |
46 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Bogaerts, A. |
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) |
2012 |
Plasma processes and polymers |
9 |
5 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Herrebout, D.; Kolev, I.; Madani, M.; Neyts, E. |
Numerical modeling for a better understanding of gas discharge plasmas |
2005 |
High temperature material processes |
9 |
1 |
UA library record; WoS full record; WoS citing articles |
|
|
|
De Bie, C.; Verheyde, B.; Martens, T.; van Dijk, J.; Paulussen, S.; Bogaerts, A. |
Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge |
2011 |
Plasma processes and polymers |
8 |
70 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Bogaerts, A.; Shamiryan, D. |
Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma |
2011 |
Plasma processes and polymers |
8 |
5 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Balemans, S.; Vlaeminck, S.E.; Torfs, E.; Hartog, L.; Zaharova, L.; Rehman, U.; Nopens, I. |
The impact of local hydrodynamics on high-rate activated sludge flocculation in laboratory and full-scale reactors |
2020 |
Processes |
8 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Hart, B.T.; Douglas, G.B.; Beckett, R.; van Put, A.; Van Grieken, R. |
Characterization of colloidal and particulate matter transported by the Magela Creek system, Northern Australia |
1993 |
Hydrological processes |
7 |
|
UA library record |
|
|
|
Bogaerts, A.; Bultinck, E.; Eckert, M.; Georgieva, V.; Mao, M.; Neyts, E.; Schwaederlé, L. |
Computer modeling of plasmas and plasma-surface interactions |
2009 |
Plasma processes and polymers |
6 |
18 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Saraiva, M.; Chen, H.; Leroy, W.P.; Mahieu, S.; Jehanathan, N.; Lebedev, O.; Georgieva, V.; Persoons, R.; Depla, D. |
Influence of Al content on the properties of MgO grown by reactive magnetron sputtering |
2009 |
Plasma processes and polymers |
6 |
13 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. |
Particle-in-cell/Monte Carlo collisions model for the reactive sputter deposition of nitride layers |
2009 |
Plasma processes and polymers |
6 |
2 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Kolev, I.; Madani, M.; Neyts, E. |
Computer simulations for processing plasmas |
2006 |
Plasma processes and polymers |
3 |
8 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Kolev, I.; Bogaerts, A. |
PIC – MCC numerical simulation of a DC planar magnetron |
2006 |
Plasma processes and polymers |
3 |
27 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Moors, K.; Sorée, B.; Magnus, W. |
Modeling and tackling resistivity scaling in metal nanowires |
2015 |
International Conference on Simulation of Semiconductor Processes and Devices : [proceedings]
T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 09-11, 2015, Washington, DC |
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UA library record; WoS full record |
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