| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| Moors, K.; Sorée, B.; Magnus, W. |
Modeling and tackling resistivity scaling in metal nanowires |
2015 |
International Conference on Simulation of Semiconductor Processes and Devices : [proceedings]
T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 09-11, 2015, Washington, DC |
|
|
UA library record; WoS full record |
| Verreck, D.; Verhulst, A.S.; Van de Put, M.L.; Sorée, B.; Magnus, W.; Collaert, N.; Mocuta, A.; Groeseneken, G. |
Self-consistent 30-band simulation approach for (non-)uniformly strained confined heterostructure tunnel field-effect transistors |
2017 |
Simulation of Semiconductor Processes and, Devices (SISPAD)AND DEVICES (SISPAD 2017) |
|
|
UA library record; WoS full record |
| Tiwari, S.; Van de Put, M.L.; Sorée, B.; Vandenberghe, W.G. |
Ab initio modeling of few-layer dilute magnetic semiconductors |
2021 |
International Conference on Simulation of Semiconductor Processes and Devices : [proceedings]
T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 27-29, 2021, Dallas, TX |
|
|
UA library record; WoS full record |
| Reyntjens, P.D.; Tiwari, S.; Van de Put, M.L.; Sorée, B.; Vandenberghe, W.G. |
Ab-initio study of magnetically intercalated Tungsten diselenide |
2020 |
International Conference on Simulation of Semiconductor Processes and Devices : [proceedings]
T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 23-OCT 06, 2020 |
|
|
UA library record; WoS full record |
| Tiwari, S.; Van de Put, M.L.; Sorée, B.; Vandenberghe, W.G. |
Carrier transport in a two-dimensional topological insulator nanoribbon in the presence of vacancy defects |
2018 |
International Conference on Simulation of Semiconductor Processes and Devices : [proceedings]
T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 24-26, 2018, Austin, TX |
|
|
UA library record; WoS full record; WoS citing articles |
| Deylgat, E.; Chen, E.; Sorée, B.; Vandenberghe, W.G. |
Quantum transport study of contact resistance of edge- and top-contacted two-dimensional materials |
2023 |
International Conference on Simulation of Semiconductor Processes and Devices : [proceedings]
T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 27-29, 2023, Kobe, Japan |
|
|
UA library record; WoS full record |
| Laroussi, M.; Bogaerts, A.; Barekzi, N. |
Plasma processes and polymers third special issue on plasma and cancer |
2016 |
Plasma processes and polymers |
13 |
1 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Alves, L.L. |
Special issue on numerical modelling of low-temperature plasmas for various applications – part II: Research papers on numerical modelling for various plasma applications |
2017 |
Plasma processes and polymers |
14 |
2 |
UA library record; WoS full record; WoS citing articles |
| Nozaki, T.; Bogaerts, A.; Tu, X.; Sanden, R. |
Special issue: Plasma Conversion |
2017 |
Plasma processes and polymers |
14 |
|
UA library record; WoS full record; WoS citing articles |
| Alves, L.L.; Bogaerts, A. |
Special Issue on Numerical Modelling of Low-Temperature Plasmas for Various Applications – Part I: Review and Tutorial Papers on Numerical Modelling Approaches |
2017 |
Plasma processes and polymers |
14 |
3 |
UA library record |
| Van Tendeloo, G.; Schryvers, D. |
Atomic structure of alloys close to phase transitions |
2000 |
Nucleation and growth processes in materials |
580 |
|
UA library record; WoS full record; |
| Bogaerts, A.; Bultinck, E.; Eckert, M.; Georgieva, V.; Mao, M.; Neyts, E.; Schwaederlé, L. |
Computer modeling of plasmas and plasma-surface interactions |
2009 |
Plasma processes and polymers |
6 |
18 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Kolev, I.; Madani, M.; Neyts, E. |
Computer simulations for processing plasmas |
2006 |
Plasma processes and polymers |
3 |
8 |
UA library record; WoS full record; WoS citing articles |
| Chwiej, T.; Bednarek, S.; Adamowski, J.; Szafran, B.; Peeters, F.M. |
Coulomb-interaction driven anomaly in the Stark effect for an exciton in vertically coupled quantum dots |
2005 |
Journal of luminescence
T2 – 6th International Conference on Excitonic Processes in Condensed Matter, (EXCON 04), JUL 06-09, 2004, Cracow, POLAND |
112 |
10 |
UA library record; WoS full record; WoS citing articles |
| Ramakers, M.; Michielsen, I.; Aerts, R.; Meynen, V.; Bogaerts, A. |
Effect of argon or helium on the CO2 conversion in a dielectric barrier discharge |
2015 |
Plasma processes and polymers |
12 |
63 |
UA library record; WoS full record; WoS citing articles |
| Teodoru, S.; Kusano, Y.; Bogaerts, A. |
The effect of O2 in a humid O2/N2/NOx gas mixture on NOx and N2O remediation by an atmospheric pressure dielectric barrier discharge |
2012 |
Plasma processes and polymers |
9 |
24 |
UA library record; WoS full record; WoS citing articles |
| De Bie, C.; Verheyde, B.; Martens, T.; van Dijk, J.; Paulussen, S.; Bogaerts, A. |
Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge |
2011 |
Plasma processes and polymers |
8 |
70 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. |
Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation |
2014 |
Plasma processes and polymers |
11 |
1 |
UA library record; WoS full record; WoS citing articles |
| Aerts, R.; Snoeckx, R.; Bogaerts, A. |
In-situ chemical trapping of oxygen in the splitting of carbon dioxide by plasma |
2014 |
Plasma processes and polymers |
11 |
29 |
UA library record; WoS full record; WoS citing articles |
| Yusupov, M.; Neyts, E.C.; Verlackt, C.C.; Khalilov, U.; van Duin, A.C.T.; Bogaerts, A. |
Inactivation of the endotoxic biomolecule lipid A by oxygen plasma species : a reactive molecular dynamics study |
2015 |
Plasma processes and polymers |
12 |
18 |
UA library record; WoS full record; WoS citing articles |
| Somers, W.; Dubreuil, M.F.; Neyts, E.C.; Vangeneugden, D.; Bogaerts, A. |
Incorporation of fluorescent dyes in atmospheric pressure plasma coatings for in-line monitoring of coating homogeneity |
2014 |
Plasma processes and polymers |
11 |
3 |
UA library record; WoS full record; WoS citing articles |
| Saraiva, M.; Chen, H.; Leroy, W.P.; Mahieu, S.; Jehanathan, N.; Lebedev, O.; Georgieva, V.; Persoons, R.; Depla, D. |
Influence of Al content on the properties of MgO grown by reactive magnetron sputtering |
2009 |
Plasma processes and polymers |
6 |
13 |
UA library record; WoS full record; WoS citing articles |
| Aerts, R.; Tu, X.; De Bie, C.; Whitehead, J.C.; Bogaerts, A. |
An investigation into the dominant reactions for ethylene destruction in non-thermal atmospheric plasmas |
2012 |
Plasma processes and polymers |
9 |
46 |
UA library record; WoS full record; WoS citing articles |
| Veljkovic, D.; Tadić, M.; Peeters, F.M. |
Magnetoexcitons in type-II self-assembled quantum dots and quantum-dot superlattices |
2006 |
Recent developments in advanced materials and processes |
518 |
|
UA library record; WoS full record; |
| de Bleecker, K.; Bogaerts, A. |
Modeling of the synthesis and subsequent growth of nanoparticles in dusty plasmas |
2007 |
High temperature material processes |
11 |
|
UA library record; WoS full record |
| Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. |
Modeling PECVD growth of nanostructured carbon materials |
2009 |
High temperature material processes |
13 |
|
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Bogaerts, A. |
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) |
2012 |
Plasma processes and polymers |
9 |
5 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; De Schepper, P.; Bogaerts, A. |
Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas |
2013 |
Plasma processes and polymers |
10 |
3 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Herrebout, D.; Kolev, I.; Madani, M.; Neyts, E. |
Numerical modeling for a better understanding of gas discharge plasmas |
2005 |
High temperature material processes |
9 |
1 |
UA library record; WoS full record; WoS citing articles |
| Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. |
Particle-in-cell/Monte Carlo collisions model for the reactive sputter deposition of nitride layers |
2009 |
Plasma processes and polymers |
6 |
2 |
UA library record; WoS full record; WoS citing articles |
