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Author Title Year Publication Volume Times cited Additional Links
Scalise, E.; Houssa, M.; Pourtois, G.; Afanas'ev, V.V.; Stesmans, A. Inelastic electron tunneling spectroscopy of HfO2 gate stacks : a study based on first-principles modeling 2011 Applied physics letters 99 1 UA library record; WoS full record; WoS citing articles
Saraiva, M.; Chen, H.; Leroy, W.P.; Mahieu, S.; Jehanathan, N.; Lebedev, O.; Georgieva, V.; Persoons, R.; Depla, D. Influence of Al content on the properties of MgO grown by reactive magnetron sputtering 2009 Plasma processes and polymers 6 13 UA library record; WoS full record; WoS citing articles
van Straaten, M.; Gijbels, R.; Vertes, A. Influence of axial and radial diffusion processes on the analytical performance of a glow discharge cell 1992 Analytical chemistry 64 43 UA library record; WoS full record; WoS citing articles
Jehanathan, N.; Georgieva, V.; Saraiva, M.; Depla, D.; Bogaerts, A.; Van Tendeloo, G. The influence of Cr and Y on the micro structural evolution of Mg―Cr―O and Mg―Y―O thin films 2011 Thin solid films : an international journal on the science and technology of thin and thick films 519 4 UA library record; WoS full record; WoS citing articles
Kolev, I.; Bogaerts, A.; Gijbels, R. Influence of electron recapture by the cathode upon the discharge characteristics in dc planar magnetrons 2005 Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 72 29 UA library record; WoS full record; WoS citing articles
Martens, T.; Bogaerts, A.; Brok, W.J.M.; van Dijk, J. The influence of impurities on the performance of the dielectric barrier discharge 2010 Applied physics letters 96 28 UA library record; WoS full record; WoS citing articles
Neyts, E.; Bogaerts, A. Influence of internal energy and impact angle on the sticking behaviour of reactive radicals in thin a-C:H film growth: a molecular dynamics study 2006 Physical chemistry, chemical physics 8 7 UA library record; WoS full record; WoS citing articles
Lindner, H.; Loper, K.H.; Hahn, D.W.; Niemax, K. The influence of laser-particle interaction in laser induced breakdown spectroscopy and laser ablation inductively coupled plasma spectrometry 2011 Spectrochimica acta: part B : atomic spectroscopy 66 12 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Naylor, J.; Hatcher, M.; Jones, W.J.; Mason, R. Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment 1998 Journal of vacuum science and technology: A: vacuum surfaces and films 16 12 UA library record; WoS full record; WoS citing articles
Snoeckx, R.; Setareh, M.; Aerts, R.; Simon, P.; Maghari, A.; Bogaerts, A. Influence of N2 concentration in a CH4/N2 dielectric barrier discharge used for CH4 conversion into H2 2013 International journal of hydrogen energy 38 40 UA library record; WoS full record; WoS citing articles
Aerts, R.; Martens, T.; Bogaerts, A. Influence of vibrational states on CO2 splitting by dielectric barrier discharges 2012 The journal of physical chemistry: C : nanomaterials and interfaces 116 112 UA library record; WoS full record; WoS citing articles
Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. Insights in the plasma-assisted growth of carbon nanotubes through atomic scale simulations : effect of electric field 2012 Journal of the American Chemical Society 134 56 UA library record; WoS full record; WoS citing articles
Chen, Y.Y.; Pourtois, G.; Adelmann, C.; Goux, L.; Govoreanu, B.; Degreave, R.; Jurczak, M.; Kittl, J.A.; Groeseneken, G.; Wouters, D.J. Insights into Ni-filament formation in unipolar-switching Ni/HfO2/TiN resistive random access memory device 2012 Applied physics letters 100 29 UA library record; WoS full record; WoS citing articles
Eckert, M.; Neyts, E.; Bogaerts, A. Insights into the growth of (ultra)nanocrystalline diamond by combined molecular dynamics and Monte Carlo simulations 2010 Crystal growth & design 10 13 UA library record; WoS full record; WoS citing articles
Dumpala, S.; Broderick, S.R.; Khalilov, U.; Neyts, E.C.; van Duin, A.C.T.; Provine, J.; Howe, R.T.; Rajan, K. Integrated atomistic chemical imaging and reactive force field molecular dynamic simulations on silicon oxidation 2015 Applied physics letters 106 19 UA library record; WoS full record; WoS citing articles
Van der Paal, J.; Aernouts, S.; van Duin, A.C.T.; Neyts, E.C.; Bogaerts, A. Interaction of O and OH radicals with a simple model system for lipids in the skin barrier : a reactive molecular dynamics investigation for plasma medicine 2013 Journal of physics: D: applied physics 46 36 UA library record; WoS full record; WoS citing articles
Somers, W.; Bogaerts, A.; van Duin, A.C.T.; Neyts, E.C. Interactions of plasma species on nickel catalysts : a reactive molecular dynamics study on the influence of temperature and surface structure 2014 Applied catalysis : B : environmental 154 23 UA library record; WoS full record; WoS citing articles
van Grieken, R.; Gijbels, R.; Speecke, A.; Hoste, J. Internal standard activation analysis of silicon in steel 1968 Analytica chimica acta 43 14 UA library record; WoS full record; WoS citing articles
Ignatova, V.A.; Möller, W.; Conard, T.; Vandervorst, W.; Gijbels, R. Interpretation of TOF-SIMS depth profiles from ultrashallow high-k dielectric stacks assisted by hybrid collisional computer simulation 2005 Applied physics A : materials science & processing 81 4 UA library record; WoS full record; WoS citing articles
Mao, M.; Bogaerts, A. Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system : the effect of different gas mixtures 2010 Journal of physics: D: applied physics 43 52 UA library record; WoS full record; WoS citing articles
Mao, M.; Bogaerts, A. Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma-enhanced CVD system : the effect of processing parameters 2010 Journal of physics: D: applied physics 43 17 UA library record; WoS full record; WoS citing articles
Aerts, R.; Tu, X.; De Bie, C.; Whitehead, J.C.; Bogaerts, A. An investigation into the dominant reactions for ethylene destruction in non-thermal atmospheric plasmas 2012 Plasma processes and polymers 9 46 UA library record; WoS full record; WoS citing articles
Saeed, A.; Khan, A.W.; Shafiq, M.; Jan, F.; Abrar, M.; Zaka-ul-Islam, M.; Zakaullah, M. Investigation of 50 Hz pulsed DC nitrogen plasma with active screen cage by trace rare gas optical emission spectroscopy 2014 Plasma science & technology 16 5 UA library record; WoS full record; WoS citing articles
Tinck, S.; Boullart, W.; Bogaerts, A. Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments 2009 Journal of physics: D: applied physics 42 23 UA library record; WoS full record; WoS citing articles
de Bleecker, K.; Bogaerts, A.; Goedheer, W.; Gijbels, R. Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model 2004 IEEE transactions on plasma science 32 29 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Gijbels, R.; Grozeva, M.; Sabotinov, N. Investigation of laser output power saturation in the He-Cu+ IR hollow cathode discharge laser by experiments and numerical modeling 2003 Physica scripta T105 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Gijbels, R. The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces 2002 Plasma sources science and technology 11 51 UA library record; WoS full record; WoS citing articles
de Witte, H.; Conard, T.; Vandervorst, W.; Gijbels, R. Ion-bombardment artifact in TOF-SIMS analysis of ZrO2/SiO2/Si stacks 2003 Applied surface science 203 15 UA library record; WoS full record; WoS citing articles
Neyts, E.C.; Bogaerts, A. Ion irradiation for improved graphene network formation in carbon nanotube growth 2014 Carbon 77 7 UA library record; WoS full record; WoS citing articles
Yan, M.; Bogaerts, A.; Gijbels, R. Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge 2001 Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 63 4 UA library record; WoS full record; WoS citing articles