| Author |
Title  |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| Ariskin, D.A.; Schweigert, I.V.; Alexandrov, A.L.; Bogaerts, A.; Peeters, F.M. |
Modeling of chemical processes in the low pressure capacitive radio frequency discharges in a mixture of Ar/C2H2 |
2009 |
Journal of applied physics |
105 |
21 |
UA library record; WoS full record; WoS citing articles |
| de Witte, H.; Vandervorst, W.; Gijbels, R. |
Modeling of bombardment induced oxidation of silicon with and without oxygen flooding |
1998 |
|
|
|
UA library record |
| de Witte, H.; Vandervorst, W.; Gijbels, R. |
Modeling of bombardment induced oxidation of silicon |
2001 |
Journal of applied physics |
89 |
16 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Modeling of argon direct current glow discharges and comparison with experiment: how good is the agreement? |
1998 |
Journal of analytical atomic spectrometry |
13 |
24 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R.; Jackson, G.P. |
Modeling of a millisecond pulsed glow discharge: investigation of the afterpeak |
2003 |
Journal of analytical atomic spectrometry |
18 |
42 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions |
2001 |
Journal of analytical atomic spectrometry |
16 |
36 |
UA library record; WoS full record; WoS citing articles |
| Petrovic, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. |
Modeling of a dielectric barrier discharge used as a flowing chemical reactor |
2008 |
|
|
|
UA library record; WoS full record; |
| Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. |
Modeling of a dielectric barrier discharge used as a flowing chemical reactor |
2008 |
Journal of physics : conference series |
133 |
6 |
UA library record; WoS full record; WoS citing articles |
| Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. |
Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model |
2002 |
Journal of applied physics |
92 |
15 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Modeling network for argon glow discharges: the output cannot be better than the input |
2000 |
|
|
1 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Modeling network for argon glow discharge plasmas with copper cathode |
2002 |
|
|
|
UA library record |
| Gielis, J.; Ricci, P.E.; Tavkhelidze, I. |
Modeling in mathematics : proceedings of the second Tbilisi-Salerno workshop on modeling in mathematics |
2017 |
|
|
|
UA library record |
| Bogaerts, A.; Snoeckx, R.; Trenchev, G.; Wang, W. |
Modeling for a Better Understanding of Plasma-Based CO2 Conversion |
2018 |
Plasma Chemistry and Gas Conversion |
|
|
UA library record |
| Nikolova, I. |
Modeling emission, formation and dispersion of ultrafine particles in an urban environment |
2012 |
|
|
|
UA library record |
| Liu, Y.; Ngo, H.H.; Guo, W.; Peng, L.; Chen, X.; Wang, D.; Pan, Y.; Ni, B.-J. |
Modeling electron competition among nitrogen oxides reduction and N2Oaccumulation in hydrogenotrophic denitrification |
2018 |
Biotechnology and bioengineering |
115 |
|
UA library record; WoS full record; WoS citing articles |
| Magnus, W.; Brosens, F.; Sorée, B. |
Modeling drive currents and leakage currents : a dynamic approach |
2009 |
Journal of computational electronics |
8 |
4 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
| Neyts, E.; Mao, M.; Eckert, M.; Bogaerts, A. |
Modeling aspects of plasma-enhanced chemical vapor deposition of carbon-based materials |
2012 |
|
|
|
UA library record |
| Moors, K.; Sorée, B.; Magnus, W. |
Modeling and tackling resistivity scaling in metal nanowires |
2015 |
International Conference on Simulation of Semiconductor Processes and Devices : [proceedings]
T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 09-11, 2015, Washington, DC |
|
|
UA library record; WoS full record |
| Vandenbroucke, A.M.; Aerts, R.; Van Gaens, W.; De Geyter, N.; Leys, C.; Morent, R.; Bogaerts, A. |
Modeling and experimental study of trichloroethylene abatement with a negative direct current corona discharge |
2015 |
Plasma chemistry and plasma processing |
35 |
9 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Y.-R.; Tinck, S.; De Schepper, P.; Wang, Y.-N.; Bogaerts, A. |
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
3 |
UA library record; WoS full record; WoS citing articles |
| Eckert, M.; Neyts, E.; Bogaerts, A. |
Modeling adatom surface processes during crystal growth: a new implementation of the Metropolis Monte Carlo algorithm |
2009 |
CrystEngComm |
11 |
15 |
UA library record; WoS full record; WoS citing articles |
| Trenchev, G.; Kolev, S.; Kiss’ovski, Z. |
Modeling a Langmuir probe in atmospheric pressure plasma at different EEDFs |
2017 |
Plasma sources science and technology |
26 |
4 |
UA library record; WoS full record; WoS citing articles |
| Joris, I.; Bronders, J.; van der Grift, B.; Seuntjens, P. |
Model-based scenario analysis of the impact of remediation measures on metal leaching from soils contaminated by historic smelter emissions |
2014 |
Journal of environmental quality |
43 |
|
UA library record; WoS full record; WoS citing articles |
| De wael, A. |
Model-based quantitative scanning transmission electron microscopy for measuring dynamic structural changes at the atomic scale |
2021 |
|
|
|
UA library record |
| Verbeeck, J.; Bertoni, G. |
Model-based quantification of EELS: is standardless quantification possible? |
2008 |
Microchimica acta |
161 |
5 |
UA library record; WoS full record; WoS citing articles |
| Verbeeck, J.; Bertoni, G. |
Model-based quantification of EELS spectra: treating the effect of correlated noise |
2008 |
Ultramicroscopy |
108 |
16 |
UA library record; WoS full record; WoS citing articles |
| Verbeeck, J.; Van Aert, S.; Bertoni, G. |
Model-based quantification of EELS spectra: including the fine structure |
2006 |
Ultramicroscopy |
106 |
38 |
UA library record; WoS full record; WoS citing articles |
| Van Aert, S.; van den Broek, W.; Goos, P.; van Dyck, D. |
Model-based electron microscopy : from images toward precise numbers for unknown structure parameters |
2012 |
Micron |
43 |
7 |
UA library record; WoS full record; WoS citing articles |
| Zhang, L.; Turner, S.; Brosens, F.; Verbeeck, J. |
Model-based determination of dielectric function by STEM low-loss EELS |
2010 |
Physical review : B : condensed matter and materials physics |
81 |
9 |
UA library record; WoS full record; WoS citing articles |
