| Author |
Title |
Year |
Publication |
Volume |
Times cited  |
Additional Links |
| Nistor, L.C.; Richard, O.; Zhao, C.; Bender, H.; Van Tendeloo, G. |
Thermal stability of atomic layer deposited Zr:Al mixed oxide thin films: an in situ transmission electron microscopy study |
2005 |
Journal of materials research |
20 |
|
UA library record; WoS full record |
| Heyne, M.H.; Chiappe, D.; Meersschaut, J.; Nuytten, T.; Conard, T.; Bender, H.; Huyghebaert, C.; Radu, I.P.; Caymax, M.; de Marneffe, J.F.; Neyts, E.C.; De Gendt, S.; |
Multilayer MoS2 growth by metal and metal oxide sulfurization |
2016 |
Journal of materials chemistry C : materials for optical and electronic devices |
4 |
|
UA library record; WoS full record; WoS citing articles |
| Shimizu, K.; Habazaki, H.; Bender, H.; Gijbels, R. |
The dawn of surface analysis that stands by the side users: ultra-thin film analysis by rf-GDOES |
2004 |
Engineering materials |
52 |
|
UA library record |
| Vereecke, G.; De Coster, H.; Van Alphen, S.; Carolan, P.; Bender, H.; Willems, K.; Ragnarsson, L.-A.; Van Dorpe, P.; Horiguchi, N.; Holsteyns, F. |
Wet etching of TiN in 1-D and 2-D confined nano-spaces of FinFET transistors |
2018 |
Microelectronic engineering |
200 |
|
UA library record; WoS full record; WoS citing articles |
