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Author Nistor, L.C.; Richard, O.; Zhao, C.; Bender, H.; Van Tendeloo, G. doi  openurl
  Title Thermal stability of atomic layer deposited Zr:Al mixed oxide thin films: an in situ transmission electron microscopy study Type A1 Journal article
  Year (down) 2005 Publication Journal of materials research Abbreviated Journal J Mater Res  
  Volume 20 Issue 7 Pages 1741-1750  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication New York, N.Y. Editor  
  Language Wos 000230296100012 Publication Date 2005-07-12  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0884-2914;2044-5326; ISBN Additional Links UA library record; WoS full record  
  Impact Factor 1.673 Times cited Open Access  
  Notes Bil 01/73; IAP V-1 Approved Most recent IF: 1.673; 2005 IF: 2.104  
  Call Number UA @ lucian @ c:irua:54884 Serial 3631  
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