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Author
Title
Year
Publication
Volume
Times cited
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Nistor, L.C.
;
Richard, O.
;
Zhao, O.
;
Bender, H.
;
Stesmans, A.
;
Van Tendeloo, G.
A microstructural study of the thermal stability of atomic layer deposited Al
2
O
3
thin films
2003
Institute of physics conference series T2 – Microscopy of semiconducting materials
UA library record
;
WoS full record
;