Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Yusupov, M.; Neyts, E.C.; Verlackt, C.C.; Khalilov, U.; van Duin, A.C.T.; Bogaerts, A. |
Inactivation of the endotoxic biomolecule lipid A by oxygen plasma species : a reactive molecular dynamics study |
2015 |
Plasma processes and polymers |
12 |
18 |
UA library record; WoS full record; WoS citing articles |
Somers, W.; Dubreuil, M.F.; Neyts, E.C.; Vangeneugden, D.; Bogaerts, A. |
Incorporation of fluorescent dyes in atmospheric pressure plasma coatings for in-line monitoring of coating homogeneity |
2014 |
Plasma processes and polymers |
11 |
3 |
UA library record; WoS full record; WoS citing articles |
Saraiva, M.; Chen, H.; Leroy, W.P.; Mahieu, S.; Jehanathan, N.; Lebedev, O.; Georgieva, V.; Persoons, R.; Depla, D. |
Influence of Al content on the properties of MgO grown by reactive magnetron sputtering |
2009 |
Plasma processes and polymers |
6 |
13 |
UA library record; WoS full record; WoS citing articles |
Aerts, R.; Tu, X.; De Bie, C.; Whitehead, J.C.; Bogaerts, A. |
An investigation into the dominant reactions for ethylene destruction in non-thermal atmospheric plasmas |
2012 |
Plasma processes and polymers |
9 |
46 |
UA library record; WoS full record; WoS citing articles |
Saeed, A.; Khan, A.W.; Shafiq, M.; Jan, F.; Abrar, M.; Zaka-ul-Islam, M.; Zakaullah, M. |
Investigation of 50 Hz pulsed DC nitrogen plasma with active screen cage by trace rare gas optical emission spectroscopy |
2014 |
Plasma science & technology |
16 |
5 |
UA library record; WoS full record; WoS citing articles |
de Bleecker, K.; Bogaerts, A.; Goedheer, W.; Gijbels, R. |
Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model |
2004 |
IEEE transactions on plasma science |
32 |
29 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
Kong, M.; Ferreira, W.P.; Partoens, B.; Peeters, F.M. |
Magnetic field dependence of the normal mode spectrum of a planar complex plasma cluster |
2004 |
IEEE transactions on plasma science |
32 |
4 |
UA library record; WoS full record; WoS citing articles |
Vandenbroucke, A.M.; Aerts, R.; Van Gaens, W.; De Geyter, N.; Leys, C.; Morent, R.; Bogaerts, A. |
Modeling and experimental study of trichloroethylene abatement with a negative direct current corona discharge |
2015 |
Plasma chemistry and plasma processing |
35 |
9 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) |
2012 |
Plasma processes and polymers |
9 |
5 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge |
1999 |
IEEE transactions on plasma science |
27 |
15 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; De Schepper, P.; Bogaerts, A. |
Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas |
2013 |
Plasma processes and polymers |
10 |
3 |
UA library record; WoS full record; WoS citing articles |
Neyts, E.; Eckert, M.; Mao, M.; Bogaerts, A. |
Numerical simulation of hydrocarbon plasmas for nanoparticle formation and the growth of nanostructured thin films |
2009 |
Plasma physics and controlled fusion |
51 |
2 |
UA library record; WoS full record; WoS citing articles |
Herrebout, D.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J.; Vanhulsel, A. |
A one-dimensional fluid model for an acetylene rf discharge: a study of the plasma chemistry |
2003 |
IEEE transactions on plasma science |
31 |
26 |
UA library record; WoS full record; WoS citing articles |
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. |
Particle-in-cell/Monte Carlo collisions model for the reactive sputter deposition of nitride layers |
2009 |
Plasma processes and polymers |
6 |
2 |
UA library record; WoS full record; WoS citing articles |
Schweigert, I.V.; Schweigert, V.A.; Peeters, F.M. |
Perturbation of collisional plasma flow around a charged dust particle: kinetic analysis |
2005 |
Physics of plasmas |
12 |
15 |
UA library record; WoS full record; WoS citing articles |
Kolev, I.; Bogaerts, A. |
PIC – MCC numerical simulation of a DC planar magnetron |
2006 |
Plasma processes and polymers |
3 |
27 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A. |
Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model |
2006 |
Plasma sources science and technology |
15 |
35 |
UA library record; WoS full record; WoS citing articles |
Van Gaens, W.; Bogaerts, A. |
Reaction pathways of biomedically active species in an Ar plasma jet |
2014 |
Plasma sources science and technology |
23 |
34 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Yusupov, M.; Van der Paal, J.; Verlackt, C.C.W.; Neyts, E.C. |
Reactive molecular dynamics simulations for a better insight in plasma medicine |
2014 |
Plasma processes and polymers |
11 |
22 |
UA library record; WoS full record; WoS citing articles |
Berezhnoi, S.; Kaganovich, I.; Misina, M.; Bogaerts, A.; Gijbels, R. |
Semianalytical description of nonlocal secondary electrons in a radio-frequency capacitively coupled plasma at intermediate pressures |
1999 |
IEEE transactions plasma science |
27 |
7 |
UA library record; WoS full record; WoS citing articles |
Cai, H.-bo; Yu, W.; Zhu, S.-ping; Zheng, C.-yang; Cao, L.-hua; Li, B.; Chen, Z.Y.; Bogaerts, A. |
Short-pulse laser absorption in very steep plasma density gradients |
2006 |
Physics of plasmas |
13 |
17 |
UA library record; WoS full record; WoS citing articles |
Liu, Y.H.; Chen, Z.Y.; Huang, F.; Yu, M.Y.; Wang, L.; Bogaerts, A. |
Simulation of disk- and band-like voids in dusty plasma systems |
2006 |
Physics of plasmas |
13 |
20 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A.; Shamiryan, D. |
Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma |
2011 |
Plasma processes and polymers |
8 |
5 |
UA library record; WoS full record; WoS citing articles |
Kozák, T.; Bogaerts, A. |
Splitting of CO2 by vibrational excitation in non-equilibrium plasmas : a reaction kinetics model |
2014 |
Plasma sources science and technology |
23 |
170 |
UA library record; WoS full record; WoS citing articles |
Kolev, S.; Bogaerts, A. |
Similarities and differences between gliding glow and gliding arc discharges |
2015 |
Plasma sources science and technology |
24 |
12 |
UA library record; WoS full record; WoS citing articles |
Van Laer, K.; Bogaerts, A. |
Fluid modelling of a packed bed dielectric barrier discharge plasma reactor |
2016 |
Plasma sources science and technology |
25 |
50 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; van de Sanden, R. |
Special Issue of Papers by Plenary and Topical Invited Lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 5–10 July 2015, Antwerp, Belgium: Introduction |
2016 |
Plasma chemistry and plasma processing |
36 |
|
UA library record; WoS full record |
Neyts, E.C. |
Plasma-Surface Interactions in Plasma Catalysis |
2016 |
Plasma chemistry and plasma processing |
36 |
66 |
UA library record; WoS full record; WoS citing articles |