Author |
Title |
Year |
Publication ![sorted by Publication field, descending order (down)](img/sort_desc.gif) |
Volume |
Times cited |
Additional Links |
Zhao, S.-X.; Gao, F.; Wang, Y.-P.; Wang, Y.-N.; Bogaerts, A. |
Effects of feedstock availability on the negative ion behavior in a C4F8 inductively coupled plasma |
2015 |
Journal of applied physics |
118 |
1 |
UA library record; WoS full record; WoS citing articles |
Zhang, Q.-Z.; Wang, Y.-N.; Bogaerts, A. |
Heating mode transition in a hybrid direct current/dual-frequency capacitively coupled CF4 discharge |
2014 |
Journal of applied physics |
115 |
9 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Hybrid modeling network for a helium-argon-copper hollow cathode discharge used for laser applications |
2002 |
Journal of applied physics |
92 |
24 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Hybrid Monte Carlo-fluid model of a direct current glow discharge |
1995 |
Journal of applied physics |
78 |
117 |
UA library record; WoS full record; WoS citing articles |
Bultinck, E.; Kolev, I.; Bogaerts, A.; Depla, D. |
The importance of an external circuit in a particle-in-cell/Monte Carlo collisions model for a direct current planar magnetron |
2008 |
Journal of applied physics |
103 |
29 |
UA library record; WoS full record; WoS citing articles |
Okhrimovskyy, A.; Bogaerts, A.; Gijbels, R. |
Incorporating the gas flow in a numerical model of rf discharges in methane |
2004 |
Journal of applied physics |
96 |
11 |
UA library record; WoS full record; WoS citing articles |
Chen, Z.; Bogaerts, A. |
Laser ablation of Cu and plume expansion into 1 atm ambient gas |
2005 |
Journal of applied physics |
97 |
131 |
UA library record; WoS full record; WoS citing articles |
Bleiner, D.; Bogaerts, A.; Belloni, F.; Nassisi, V. |
Laser-induced plasmas from the ablation of metallic targets: the problem of the onset temperature, and insights on the expansion dynamics |
2007 |
Journal of applied physics |
101 |
31 |
UA library record; WoS full record; WoS citing articles |
Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. |
Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model |
2002 |
Journal of applied physics |
92 |
15 |
UA library record; WoS full record; WoS citing articles |
Ariskin, D.A.; Schweigert, I.V.; Alexandrov, A.L.; Bogaerts, A.; Peeters, F.M. |
Modeling of chemical processes in the low pressure capacitive radio frequency discharges in a mixture of Ar/C2H2 |
2009 |
Journal of applied physics |
105 |
21 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
Gou, F.; Neyts, E.; Eckert, M.; Tinck, S.; Bogaerts, A. |
Molecular dynamics simulations of Cl+ etching on a Si(100) surface |
2010 |
Journal of applied physics |
107 |
15 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A. |
Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics |
2005 |
Journal of applied physics |
98 |
75 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A.; Gijbels, R. |
Numerical study of Ar/CF4/N2 discharges in single and dual frequency capacitively coupled plasma reactors |
2003 |
Journal of applied physics |
94 |
90 |
UA library record; WoS full record; WoS citing articles |
Cenian, A.; Chernukho, A.; Bogaerts, A.; Gijbels, R.; Leys, C. |
Particle-in-cell Monte Carlo modeling of Langmuir probes in an Ar plasma |
2005 |
Journal of applied physics |
97 |
18 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A.; Gijbels, R. |
Particle-in-cell/Monte Carlo simulation of a capacitively coupled radio frequency Ar/Cf4 discharge: effect of gas composition |
2003 |
Journal of applied physics |
93 |
57 |
UA library record; WoS full record; WoS citing articles |
Neyts, E.; Yan, M.; Bogaerts, A.; Gijbels, R. |
Particle-in-cell/Monte Carlo simulations of a low-pressure capacitively coupled radio-frequency discharge: effect of adding H2 to an Ar discharge |
2003 |
Journal of applied physics |
93 |
15 |
UA library record; WoS full record; WoS citing articles |
Wen, D.-Q.; Zhang, Q.-Z.; Jiang, W.; Song, U.-H.; Bogaerts, A.; Wang, Y.-N. |
Phase modulation in pulsed dual-frequency capacitively coupled plasmas |
2014 |
Journal of applied physics |
115 |
8 |
UA library record; WoS full record; WoS citing articles |
Chen, Z.; Bogaerts, A. |
Response to “Comment on 'Laser ablation of Cu and plume expansion into 1 atm ambient gas'” [J. Appl. Phys. 115, 166101 (2014)] |
2014 |
Journal of applied physics |
115 |
1 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
The role of fast argon ions and atoms in the ionization of argon in a direct current glow discharge: a mathematical simulation |
1995 |
Journal of applied physics |
78 |
60 |
UA library record; WoS full record; WoS citing articles |
Autrique, D.; Clair, G.; L'Hermite, D.; Alexiades, V.; Bogaerts, A.; Rethfeld, B. |
The role of mass removal mechanisms in the onset of ns-laser induced plasma formation |
2013 |
Journal of applied physics |
114 |
31 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model |
1996 |
Journal of applied physics |
79 |
81 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description |
1999 |
Journal of applied physics |
86 |
50 |
UA library record; WoS full record; WoS citing articles |
Baguer, N.; Bogaerts, A.; Gijbels, R. |
Role of the fast Ar atoms, Ar+ ions and metastable Ar atoms in a hollow cathode glow discharge: study by a hybrid model |
2003 |
Journal of applied physics |
94 |
19 |
UA library record; WoS full record; WoS citing articles |
Depla, D.; Li, X.Y.; Mahieu, S.; van Aeken, K.; Leroy, W.P.; Haemers, J.; de Gryse, R.; Bogaerts, A. |
Rotating cylindrical magnetron sputtering: simulation of the reactive process |
2010 |
Journal of applied physics |
107 |
15 |
UA library record; WoS full record; WoS citing articles |
Wendelen, W.; Mueller, B.Y.; Autrique, D.; Rethfeld, B.; Bogaerts, A. |
Space charge corrected electron emission from an aluminum surface under non-equilibrium conditions |
2012 |
Journal of applied physics |
111 |
30 |
UA library record; WoS full record; WoS citing articles |
Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4 |
2000 |
Journal of applied physics |
87 |
14 |
UA library record; WoS full record; WoS citing articles |
Baguer, N.; Bogaerts, A.; Gijbels, R. |
Study of a hollow cathode glow discharge in He: Monte Carlo-fluid model combined with a transport model for the metastable atoms |
2003 |
Journal of applied physics |
93 |
24 |
UA library record; WoS full record; WoS citing articles |
Baguer, N.; Bogaerts, A.; Donko, Z.; Gijbels, R.; Sadeghi, N. |
Study of the Ar metastable atom population in a hollow cathode discharge by means of a hybrid model and spectrometric measurements |
2005 |
Journal of applied physics |
97 |
40 |
UA library record; WoS full record; WoS citing articles |
Baguer, N.; Bogaerts, A. |
Study of the sputtered Cu atoms and Cu+ ions in a hollow cathode glow discharge using a hybrid model |
2005 |
Journal of applied physics |
98 |
18 |
UA library record; WoS full record; WoS citing articles |