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Ion current rectification, limiting and overlimiting conductances in nanopores”. van Oeffelen L, Van Roy W, Idrissi H, Charlier D, Lagae L, Borghs G, PLoS ONE 10, e0124171 (2015). http://doi.org/10.1371/journal.pone.0124171
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Multifractal properties of a closed contour : a peek beyond the shape analysis”. Duarte-Neto P, Stosic B, Stosic T, Lessa R, Milošević, MV, Stanley HE, PLoS ONE 9, e115262 (2014). http://doi.org/10.1371/journal.pone.0115262
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Structure and function of p53-DNA complexes with inactivation and rescue mutations : a molecular dynamics simulation study”. Kamaraj B, Bogaerts A, PLoS ONE 10, e0134638 (2015). http://doi.org/10.1371/journal.pone.0134638
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Self-assembly and clustering of magnetic peapod-like rods with tunable directional interaction”. Domingos JLC, Peeters FM, Ferreira WP, PLoS ONE 13, e0195552 (2018). http://doi.org/10.1371/JOURNLA.PONE.0195552
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Mannaerts D, Faes E, Cos P, Briedé, JJ, Gyselaers W, Cornette J, Gorbanev Y, Bogaerts A, Spaanderman M, Van Craenenbroeck E, Jacquemyn Y, Torrens C (2018) Oxidative stress in healthy pregnancy and preeclampsia is linked to chronic inflammation, iron status and vascular function. e0202919
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Effect of operating and sampling conditions on the exhaust gas composition of small-scale power generators”. Smits M, Vanpachtenbeke F, Horemans B, De Wael K, Hauchecorne B, Van Langenhove H, Demeestere K, Lenaerts S, PLoS ONE 7, e32825 (2012). http://doi.org/10.1371/JOURNAL.PONE.0032825
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An N-myristoylated globin with a redox-sensing function that regulates the defecation cycle in Caenorhabditis elegans”. Tilleman L, De Henau S, Pauwels M, Nagy N, Pintelon I, Braeckman BP, De Wael K, Van Doorslaer S, Adriaensen D, Timmermans J-P, Moens L, Dewilde S, PLoS ONE 7, e48768 (2012). http://doi.org/10.1371/JOURNAL.PONE.0048768
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Aerobes and phototrophs as microbial organic fertilizers : exploring mineralization, fertilization and plant protection features”. Wambacq E, Alloul A, Grunert O, Carrette J, Vermeir P, Spanoghe J, Sakarika M, Vlaeminck SE, Haesaert G, PLoS ONE 17, e0262497 (2022). http://doi.org/10.1371/JOURNAL.PONE.0262497
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Universal natural shapes : from unifying shape description to simple methods for shape analysis and boundary value problems”. Gielis J, Caratelli D, Fougerolle Y, Ricci PE, Tavkelidze I, Gerats T, PLoS ONE 7, e29324 (2012). http://doi.org/10.1371/JOURNAL.PONE.0029324
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To tax or to ban? A discrete choice experiment to elicit public preferences for phasing out glyphosate use in agriculture”. Bjørnåvold A, David M, Mermet-Bijon V, Beaumais O, Crastes dit Sourd R, Van Passel S, Martinet V, PLoS ONE 18, 1 (2023). http://doi.org/10.1371/JOURNAL.PONE.0283131
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Photothermal heating of Au nanorods and nanospheres : temperature characteristics and strength of convective forces”. Borah R, Kumar A, Samantaray M, Desai A, Tseng F-G, Plasmonics 18, 1449 (2023). http://doi.org/10.1007/S11468-023-01855-4
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A 2D model for a gliding arc discharge”. Kolev S, Bogaerts A, Plasma sources science and technology 24, 015025 (2015). http://doi.org/10.1088/0963-0252/24/1/015025
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Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model”. Bultinck E, Bogaerts A, Plasma sources science and technology 20, 045013 (2011). http://doi.org/10.1088/0963-0252/20/4/045013
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Comprehensive modelling network for dc glow discharges in argon”. Bogaerts A, Plasma sources science and technology 8, 210 (1999). http://doi.org/10.1088/0963-0252/8/2/003
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Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition”. Tinck S, Bogaerts A, Plasma sources science and technology 20, 015008 (2011). http://doi.org/10.1088/0963-0252/20/1/015008
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Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges”. Paulussen S, Verheyde B, Tu X, De Bie C, Martens T, Petrovic D, Bogaerts A, Sels B, Plasma sources science and technology 19, 034015 (2010). http://doi.org/10.1088/0963-0252/19/3/034015
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Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations”. De Bie C, Martens T, van Dijk J, Paulussen S, Verheyde B, Corthals S, Bogaerts A, Plasma sources science and technology 20, 024008 (2011). http://doi.org/10.1088/0963-0252/20/2/024008
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Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis”. Peerenboom K, Parente A, Kozák T, Bogaerts A, Degrez G, Plasma sources science and technology 24, 025004 (2015). http://doi.org/10.1088/0963-0252/24/2/025004
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The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 21, 025008 (2012). http://doi.org/10.1088/0963-0252/21/2/025008
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Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges”. Liu Y-X, Zhang Q-Z, Liu L, Song Y-H, Bogaerts A, Wang Y-N, Plasma sources science and technology 22, 025012 (2013). http://doi.org/10.1088/0963-0252/22/2/025012
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation”. Van Laer K, Tinck S, Samara V, de Marneffe JF, Bogaerts A, Plasma sources science and technology 22, 025011 (2013). http://doi.org/10.1088/0963-0252/22/2/025011
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Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model”. Kozák T, Bogaerts A, Plasma sources science and technology 24, 015024 (2015). http://doi.org/10.1088/0963-0252/24/1/015024
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Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 22, 015017 (2013). http://doi.org/10.1088/0963-0252/22/1/015017
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Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas”. Zhang Q-Z, Liu Y-X, Jiang W, Bogaerts A, Wang Y-N, Plasma sources science and technology 22, 025014 (2013). http://doi.org/10.1088/0963-0252/22/2/025014
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Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux”. Bogaerts A, Okhrimovskyy A, Baguer N, Gijbels R, Plasma sources science and technology 14, 191 (2005). http://doi.org/10.1088/0963-0252/14/1/021
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The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces”. Bogaerts A, Gijbels R, Plasma sources science and technology 11, 27 (2002). http://doi.org/10.1088/0963-0252/11/1/303
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Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating”. Tinck S, Boullart W, Bogaerts A, Plasma sources science and technology 20, 045012 (2011). http://doi.org/10.1088/0963-0252/20/4/045012
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Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model”. Georgieva V, Bogaerts A, Plasma sources science and technology 15, 368 (2006). http://doi.org/10.1088/0963-0252/15/3/010
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Reaction pathways of biomedically active species in an Ar plasma jet”. Van Gaens W, Bogaerts A, Plasma sources science and technology 23, 035015 (2014). http://doi.org/10.1088/0963-0252/23/3/035015
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