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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Bogaerts, A.; van Straaten, M.; Gijbels, R. |
Monte Carlo simulation of an analytical glow discharge: motion of electrons, ions and fast neutrals in the cathode dark space |
1995 |
Spectrochimica acta: part B : atomic spectroscopy |
50 |
95 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
The role of fast argon ions and atoms in the ionization of argon in a direct current glow discharge: a mathematical simulation |
1995 |
Journal of applied physics |
78 |
60 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model |
1996 |
Journal of applied physics |
79 |
81 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description |
1999 |
Journal of applied physics |
86 |
50 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Similarities and differences between direct current and radio-frequency glow discharges: a mathematical simulation |
2000 |
Journal of analytical atomic spectrometry |
15 |
25 |
UA library record; WoS full record; WoS citing articles |
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Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4 |
2000 |
Journal of applied physics |
87 |
14 |
UA library record; WoS full record; WoS citing articles |
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Martin, J.M.L.; El-Yazal, J.; François, J.P.; Gijbels, R. |
Structures and thermochemistry of B3N3 and B4N4 |
1995 |
Chemical physics letters |
232 |
35 |
UA library record; WoS full record; WoS citing articles |
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Verlinden, G.; Gijbels, R.; Geuens, I.; de Keyzer, R. |
Surface analysis of halide distributions in complex AgX microcrystals by imaging time-of-flight SIMS (TOF-SIMS) |
1999 |
Journal of analytical atomic spectrometry |
14 |
10 |
UA library record; WoS full record; WoS citing articles |
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Verlinden, G.; Janssens, G.; Gijbels, R.; van Espen, P.; Geuens, I. |
Three-dimensional chemical characterization of complex silver halide microcrystals by scanning ion microprobe mass analysis |
1997 |
Analytical chemistry |
69 |
6 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Two-dimensional model of a direct current glow discharge : description of the argon metastable atoms, sputtered atoms and ions |
1996 |
Analytical chemistry |
68 |
57 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Two-dimensional model of a direct current glow discharge: description of the electrons, argon ions and fast argon atoms |
1996 |
Analytical chemistry |
68 |
70 |
UA library record; WoS full record; WoS citing articles |
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Conard, T.; de Witte, H.; Loo, R.; Verheyen, P.; Vandervorst, W.; Caymax, M.; Gijbels, R. |
XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers |
1999 |
Thin solid films : an international journal on the science and technology of thin and thick films |
343/344 |
1 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Effect of small amounts of hydrogen added to argon glow discharges: hybrid Monte-Carlo-fluid model |
2002 |
Physical review : E : statistical, nonlinear, and soft matter physics |
65 |
33 |
UA library record; WoS full record; WoS citing articles |
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Okhrimovskyy, A.; Bogaerts, A.; Gijbels, R. |
Electron anisotropic scattering in gases: a formula for Monte Carlo simulations |
2002 |
Physical review : E : statistical, nonlinear, and soft matter physics |
65 |
57 |
UA library record; WoS full record; WoS citing articles |
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Kaganovich, I.; Misina, M.; Berezhnoi, S.; Gijbels, R. |
Electron Boltzmann kinetic equation averaged over fast electron bouncing and pitch-angle scattering for fast modeling of electron cyclotron resonance discharge |
2000 |
Physical review : E : statistical, nonlinear, and soft matter physics |
61 |
31 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Naylor, J.; Hatcher, M.; Jones, W.J.; Mason, R. |
Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment |
1998 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
16 |
12 |
UA library record; WoS full record; WoS citing articles |
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Yan, M.; Bogaerts, A.; Gijbels, R. |
Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge |
2001 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
63 |
4 |
UA library record; WoS full record; WoS citing articles |
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Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Local and fast relaxation phenomena after laser-induced photodetachment in a strongly electronegative rf discharge |
2002 |
Physical review : E : statistical, nonlinear, and soft matter physics |
65 |
2 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Modeling of metastable argon atoms in a direct current glow discharge |
1995 |
Physical review : A : atomic, molecular and optical physics |
52 |
98 |
UA library record; WoS full record; WoS citing articles |
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de Witte, H.; de Gendt, S.; Douglas, M.; Conard, T.; Kenis, K.; Mertens, P.W.; Vandervorst, W.; Gijbels, R. |
Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on wafer surfaces |
2000 |
Journal of the electrochemical society |
147 |
14 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge |
1999 |
IEEE transactions on plasma science |
27 |
15 |
UA library record; WoS full record; WoS citing articles |
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Berezhnoi, S.; Kaganovich, I.; Misina, M.; Bogaerts, A.; Gijbels, R. |
Semianalytical description of nonlocal secondary electrons in a radio-frequency capacitively coupled plasma at intermediate pressures |
1999 |
IEEE transactions plasma science |
27 |
7 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A. |
Comprehensive modelling network for dc glow discharges in argon |
1999 |
Plasma sources science and technology |
8 |
27 |
UA library record; WoS full record; WoS citing articles |
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Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
New developments and applications in GDMS |
1999 |
Fresenius' journal of analytical chemistry |
364 |
17 |
UA library record; WoS full record; WoS citing articles |
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Gijbels, R.; Bogaerts, A. |
Recent trends in solids mass spectrometry: GDMS and other methods |
1997 |
Fresenius' journal of analytical chemistry |
359 |
5 |
UA library record; WoS full record; WoS citing articles |
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de Witte, H.; Conard, T.; Vandervorst, W.; Gijbels, R. |
SIMS analysis of oxynitrides: evidence for nitrogen diffusion induced by oxygen flooding |
2000 |
Surface and interface analysis |
29 |
4 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Three-dimensional modeling of a direct current glow discharge in argon: is it better than one-dimensional modeling? |
1997 |
Fresenius' journal of analytical chemistry |
359 |
9 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Okhrimovskyy, A.; Gijbels, R. |
Calculation of the gas flow and its effect on the plasma characteristics for a modified Grimm-type glow discharge cell |
2002 |
Journal of analytical atomic spectrometry |
17 |
39 |
UA library record; WoS full record; WoS citing articles |
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