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  Author Title Year Publication Volume Times cited Additional Links Links
Bueken, B.; Van Velthoven, N.; Willhammar, T.; Stassin, T.; Stassen, I.; Keen, D.A.; Baron, G.V.; Denayer, J.F.M.; Ameloot, R.; Bals, S.; De Vos, D.; Bennett, T.D. Gel-based morphological design of zirconium metal-organic frameworks 2017 Chemical science 8 168 UA library record; WoS full record; WoS citing articles pdf url doi
Kolev, S.; Bogaerts, A. A 2D model for a gliding arc discharge 2015 Plasma sources science and technology 24 34 UA library record; WoS full record; WoS citing articles pdf url doi
Molina, L.; Tan, H.; Biermans, E.; Batenburg, K.J.; Verbeeck, J.; Bals, S.; Van Tendeloo, G. Barrier efficiency of sponge-like La2Zr2O7 buffer layers for YBCO-coated conductors 2011 Superconductor science and technology 24 31 UA library record; WoS full record; WoS citing articles pdf doi
Bultinck, E.; Bogaerts, A. Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model 2011 Plasma sources science and technology 20 7 UA library record; WoS full record; WoS citing articles pdf doi
Obradors, X.; Puig, T.; Pomar, A.; Sandiumenge, F.; Piñol, S.; Mestres, N.; Castaño, O.; Coll, M.; Cavallaro, A.; Palau, A.; Gázquez, J.; González, J.C.; Gutiérrez, J.; Romá, N.; Ricart, S.; Moretó, J.M.; Rossell, M.D.; Van Tendeloo, G. Chemical solution deposition: a path towards low cost coated conductors 2004 Superconductor science and technology 17 107 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A. Comprehensive modelling network for dc glow discharges in argon 1999 Plasma sources science and technology 8 27 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Bogaerts, A. Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition 2011 Plasma sources science and technology 20 11 UA library record; WoS full record; WoS citing articles doi
Kerner, C.; Hackens, B.; Golubović, D.S.; Poli, S.; Faniel, S.; Magnus, W.; Schoenmaker, W.; Bayot, V.; Maes, H. Control and readout of current-induced magnetic flux quantization in a superconducting transformer 2009 Superconductor science and technology 22 2 UA library record; WoS full record; WoS citing articles doi
Kapra, A.V.; Misko, V.R.; Peeters, F.M. Controlling magnetic flux motion by arrays of zigzag-arranged magnetic bars 2013 Superconductor science and technology 26 5 UA library record; WoS full record; WoS citing articles pdf doi
Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges 2010 Plasma sources science and technology 19 116 UA library record; WoS full record; WoS citing articles pdf doi
Jacques, P.; Verbist, K.; Lapin, J.; Ryelandt, L.; Van Tendeloo, G.; Delannay, F. Critical assessment of the process of growth of a YBa2Cu3O7-\delta layer on Y2BaCuO5 1996 Superconductor science and technology 9 1 UA library record; WoS full record; WoS citing articles pdf doi
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations 2011 Plasma sources science and technology 20 38 UA library record; WoS full record; WoS citing articles pdf doi
Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis 2015 Plasma sources science and technology 24 11 UA library record; WoS full record; WoS citing articles pdf url doi
Berdiyorov, G.; Harrabi, K.; Maneval, J.P.; Peeters, F.M. Effect of pinning on the response of superconducting strips to an external pulsed current 2015 Superconductor science and technology 28 19 UA library record; WoS full record; WoS citing articles url doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma 2012 Plasma sources science and technology 21 23 UA library record; WoS full record; WoS citing articles pdf doi
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges 2013 Plasma sources science and technology 22 20 UA library record; WoS full record; WoS citing articles pdf doi
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges 2000 Plasma sources science and technology 9 21 UA library record; WoS full record; WoS citing articles doi
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation 2013 Plasma sources science and technology 22 13 UA library record; WoS full record; WoS citing articles pdf doi
Kozák, T.; Bogaerts, A. Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model 2015 Plasma sources science and technology 24 100 UA library record; WoS full record; WoS citing articles pdf url doi
Misko, V.R.; Zhao, H.J.; Peeters, F.M.; Oboznov, V.; Dubonos, S.V.; Grigorieva, I.V. Formation of vortex shells in mesoscopic superconducting squares 2009 Superconductor science and technology 22 14 UA library record; WoS full record; WoS citing articles doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma 2013 Plasma sources science and technology 22 11 UA library record; WoS full record; WoS citing articles pdf doi
Kapra, A.V.; Misko, V.R.; Vodolazov, D.Y.; Peeters, F.M. The guidance of vortex-antivortex pairs by in-plane magnetic dipoles in a superconducting finite-size film 2011 Superconductor science and technology 24 28 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas 2013 Plasma sources science and technology 22 9 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux 2005 Plasma sources science and technology 14 9 UA library record; WoS full record; WoS citing articles doi
Berdiyorov, G.R.; Savel'ev, S.E.; Kusmartsev, F.V.; Peeters, F.M. In-phase motion of Josephson vortices in stacked SNS Josephson junctions : effect of ordered pinning 2013 Superconductor science and technology 26 5 UA library record; WoS full record; WoS citing articles pdf doi
Molina, L.; Egoavil, R.; Turner, S.; Thersleff, T.; Verbeeck, J.; Holzapfel, B.; Eibl, O.; Van Tendeloo, G. Interlayer structure in YBCO-coated conductors prepared by chemical solution deposition 2013 Superconductor science and technology 26 11 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Gijbels, R. The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces 2002 Plasma sources science and technology 11 51 UA library record; WoS full record; WoS citing articles doi
Verbist, K.; Lebedev, O.I.; Van Tendeloo, G.; Verhoeven, M.A.J.; Rijnders, A.J.H.M.; Blank, D.H.A. Low- or high-angle Ar ion-beam etching to create ramp-type Josephson junctions 1996 Superconductor science and technology 9 10 UA library record; WoS full record; WoS citing articles pdf doi
Verbist, K.; Lebedev, O.I.; Verhoeven, M.A.J.; Winchern, R.; Rijnders, A.J.H.M.; Blank, D.H.A.; Tafuri, F.; Bender, H.; Van Tendeloo, G. Microstructure of YBa2Cu3O7-\delta Josephson junctions in relation to their properties 1998 Superconductor science and technology 11 UA library record; WoS full record; WoS citing articles pdf doi
Vasiliev, A.L.; Van Tendeloo, G.; Boikov, Y.; Olsson, E.; Ivanov, S. Microstructure of YBa2Cu3O7-x films on buffered Si for microelectronic applications 1997 Superconductor science and technology 10 2 UA library record; WoS full record; WoS citing articles
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