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Gel-based morphological design of zirconium metal-organic frameworks”. Bueken B, Van Velthoven N, Willhammar T, Stassin T, Stassen I, Keen DA, Baron GV, Denayer JFM, Ameloot R, Bals S, De Vos D, Bennett TD, Chemical science 8, 3939 (2017). http://doi.org/10.1039/C6SC05602D
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A 2D model for a gliding arc discharge”. Kolev S, Bogaerts A, Plasma sources science and technology 24, 015025 (2015). http://doi.org/10.1088/0963-0252/24/1/015025
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Barrier efficiency of sponge-like La2Zr2O7 buffer layers for YBCO-coated conductors”. Molina L, Tan H, Biermans E, Batenburg KJ, Verbeeck J, Bals S, Van Tendeloo G, Superconductor science and technology 24, 065019 (2011). http://doi.org/10.1088/0953-2048/24/6/065019
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Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model”. Bultinck E, Bogaerts A, Plasma sources science and technology 20, 045013 (2011). http://doi.org/10.1088/0963-0252/20/4/045013
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Chemical solution deposition: a path towards low cost coated conductors”. Obradors X, Puig T, Pomar A, Sandiumenge F, Piñol S, Mestres N, Castaño O, Coll M, Cavallaro A, Palau A, Gázquez J, González JC, Gutiérrez J, Romá, N, Ricart S, Moretó, JM, Rossell MD, Van Tendeloo G, Superconductor science and technology 17, 1055 (2004). http://doi.org/10.1088/0953-2048/17/8/020
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Comprehensive modelling network for dc glow discharges in argon”. Bogaerts A, Plasma sources science and technology 8, 210 (1999). http://doi.org/10.1088/0963-0252/8/2/003
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Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition”. Tinck S, Bogaerts A, Plasma sources science and technology 20, 015008 (2011). http://doi.org/10.1088/0963-0252/20/1/015008
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Control and readout of current-induced magnetic flux quantization in a superconducting transformer”. Kerner C, Hackens B, Golubović, DS, Poli S, Faniel S, Magnus W, Schoenmaker W, Bayot V, Maes H, Superconductor science and technology 22, 025001 (2009). http://doi.org/10.1088/0953-2048/22/2/025001
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Controlling magnetic flux motion by arrays of zigzag-arranged magnetic bars”. Kapra AV, Misko VR, Peeters FM, Superconductor science and technology 26, 025011 (2013). http://doi.org/10.1088/0953-2048/26/2/025011
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Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges”. Paulussen S, Verheyde B, Tu X, De Bie C, Martens T, Petrovic D, Bogaerts A, Sels B, Plasma sources science and technology 19, 034015 (2010). http://doi.org/10.1088/0963-0252/19/3/034015
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Critical assessment of the process of growth of a YBa2Cu3O7-\delta layer on Y2BaCuO5”. Jacques P, Verbist K, Lapin J, Ryelandt L, Van Tendeloo G, Delannay F, Superconductor science and technology 9, 176 (1996). http://doi.org/10.1088/0953-2048/9/3/008
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Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations”. De Bie C, Martens T, van Dijk J, Paulussen S, Verheyde B, Corthals S, Bogaerts A, Plasma sources science and technology 20, 024008 (2011). http://doi.org/10.1088/0963-0252/20/2/024008
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Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis”. Peerenboom K, Parente A, Kozák T, Bogaerts A, Degrez G, Plasma sources science and technology 24, 025004 (2015). http://doi.org/10.1088/0963-0252/24/2/025004
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Effect of pinning on the response of superconducting strips to an external pulsed current”. Berdiyorov G, Harrabi K, Maneval JP, Peeters FM, Superconductor science and technology 28, 025004 (2015). http://doi.org/10.1088/0953-2048/28/2/025004
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The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 21, 025008 (2012). http://doi.org/10.1088/0963-0252/21/2/025008
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Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges”. Liu Y-X, Zhang Q-Z, Liu L, Song Y-H, Bogaerts A, Wang Y-N, Plasma sources science and technology 22, 025012 (2013). http://doi.org/10.1088/0963-0252/22/2/025012
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation”. Van Laer K, Tinck S, Samara V, de Marneffe JF, Bogaerts A, Plasma sources science and technology 22, 025011 (2013). http://doi.org/10.1088/0963-0252/22/2/025011
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Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model”. Kozák T, Bogaerts A, Plasma sources science and technology 24, 015024 (2015). http://doi.org/10.1088/0963-0252/24/1/015024
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Formation of vortex shells in mesoscopic superconducting squares”. Misko VR, Zhao HJ, Peeters FM, Oboznov V, Dubonos SV, Grigorieva IV, Superconductor science and technology 22, 034001 (2009). http://doi.org/10.1088/0953-2048/22/3/034001
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Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 22, 015017 (2013). http://doi.org/10.1088/0963-0252/22/1/015017
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The guidance of vortex-antivortex pairs by in-plane magnetic dipoles in a superconducting finite-size film”. Kapra AV, Misko VR, Vodolazov DY, Peeters FM, Superconductor science and technology 24, 024014 (2011). http://doi.org/10.1088/0953-2048/24/2/024014
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Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas”. Zhang Q-Z, Liu Y-X, Jiang W, Bogaerts A, Wang Y-N, Plasma sources science and technology 22, 025014 (2013). http://doi.org/10.1088/0963-0252/22/2/025014
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Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux”. Bogaerts A, Okhrimovskyy A, Baguer N, Gijbels R, Plasma sources science and technology 14, 191 (2005). http://doi.org/10.1088/0963-0252/14/1/021
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In-phase motion of Josephson vortices in stacked SNS Josephson junctions : effect of ordered pinning”. Berdiyorov GR, Savel'ev SE, Kusmartsev FV, Peeters FM, Superconductor science and technology 26, 125010 (2013). http://doi.org/10.1088/0953-2048/26/12/125010
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Interlayer structure in YBCO-coated conductors prepared by chemical solution deposition”. Molina L, Egoavil R, Turner S, Thersleff T, Verbeeck J, Holzapfel B, Eibl O, Van Tendeloo G, Superconductor science and technology 26, 075016 (2013). http://doi.org/10.1088/0953-2048/26/7/075016
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The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces”. Bogaerts A, Gijbels R, Plasma sources science and technology 11, 27 (2002). http://doi.org/10.1088/0963-0252/11/1/303
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Low- or high-angle Ar ion-beam etching to create ramp-type Josephson junctions”. Verbist K, Lebedev OI, Van Tendeloo G, Verhoeven MAJ, Rijnders AJHM, Blank DHA, Superconductor science and technology 9, 978 (1996). http://doi.org/10.1088/0953-2048/9/11/009
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Microstructure of YBa2Cu3O7-\delta Josephson junctions in relation to their properties”. Verbist K, Lebedev OI, Verhoeven MAJ, Winchern R, Rijnders AJHM, Blank DHA, Tafuri F, Bender H, Van Tendeloo G, Superconductor science and technology 11, 13 (1998). http://doi.org/10.1088/0953-2048/11/1/004
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Microstructure of YBa2Cu3O7-x films on buffered Si for microelectronic applications”. Vasiliev AL, Van Tendeloo G, Boikov Y, Olsson E, Ivanov S, Superconductor science and technology 10, 356 (1997)
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