Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. |
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering |
2004 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
Wendelen, W.; Mueller, B.Y.; Autrique, D.; Bogaerts, A.; Rethfeld, B. |
Modeling ultrashort laser-induced emission from a negatively biased metal |
2013 |
Applied physics letters |
103 |
8 |
UA library record; WoS full record; WoS citing articles |
Gou, F.; Neyts, E.; Eckert, M.; Tinck, S.; Bogaerts, A. |
Molecular dynamics simulations of Cl+ etching on a Si(100) surface |
2010 |
Journal of applied physics |
107 |
15 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge |
1999 |
IEEE transactions on plasma science |
27 |
15 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A. |
Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics |
2005 |
Journal of applied physics |
98 |
75 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A.; Gijbels, R. |
Numerical study of Ar/CF4/N2 discharges in single and dual frequency capacitively coupled plasma reactors |
2003 |
Journal of applied physics |
94 |
90 |
UA library record; WoS full record; WoS citing articles |
Kolev, I.; Bogaerts, A. |
Numerical study of the sputtering in a dc magnetron |
2009 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
27 |
66 |
UA library record; WoS full record; WoS citing articles |
Herrebout, D.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J.; Vanhulsel, A. |
A one-dimensional fluid model for an acetylene rf discharge: a study of the plasma chemistry |
2003 |
IEEE transactions on plasma science |
31 |
26 |
UA library record; WoS full record; WoS citing articles |
Cenian, A.; Chernukho, A.; Bogaerts, A.; Gijbels, R.; Leys, C. |
Particle-in-cell Monte Carlo modeling of Langmuir probes in an Ar plasma |
2005 |
Journal of applied physics |
97 |
18 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A.; Gijbels, R. |
Particle-in-cell/Monte Carlo simulation of a capacitively coupled radio frequency Ar/Cf4 discharge: effect of gas composition |
2003 |
Journal of applied physics |
93 |
57 |
UA library record; WoS full record; WoS citing articles |
Neyts, E.; Yan, M.; Bogaerts, A.; Gijbels, R. |
Particle-in-cell/Monte Carlo simulations of a low-pressure capacitively coupled radio-frequency discharge: effect of adding H2 to an Ar discharge |
2003 |
Journal of applied physics |
93 |
15 |
UA library record; WoS full record; WoS citing articles |
Chen, Z.; Bogaerts, A.; Vertes, A. |
Phase explosion in atmospheric pressure infrared laser ablation from water-rich targets |
2006 |
Applied physics letters |
89 |
32 |
UA library record; WoS full record; WoS citing articles |
Wen, D.-Q.; Zhang, Q.-Z.; Jiang, W.; Song, U.-H.; Bogaerts, A.; Wang, Y.-N. |
Phase modulation in pulsed dual-frequency capacitively coupled plasmas |
2014 |
Journal of applied physics |
115 |
8 |
UA library record; WoS full record; WoS citing articles |
Martens, T.; Bogaerts, A.; van Dijk, J. |
Pulse shape influence on the atmospheric barrier discharge |
2010 |
Applied physics letters |
96 |
35 |
UA library record; WoS full record; WoS citing articles |
Chen, Z.; Bogaerts, A. |
Response to “Comment on 'Laser ablation of Cu and plume expansion into 1 atm ambient gas'” [J. Appl. Phys. 115, 166101 (2014)] |
2014 |
Journal of applied physics |
115 |
1 |
UA library record; WoS full record; WoS citing articles |
Autrique, D.; Gornushkin, I.; Alexiades, V.; Chen, Z.; Bogaerts, A.; Rethfeld, B. |
Revisiting the interplay between ablation, collisional, and radiative processes during ns-laser ablation |
2013 |
Applied physics letters |
103 |
13 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
The role of fast argon ions and atoms in the ionization of argon in a direct current glow discharge: a mathematical simulation |
1995 |
Journal of applied physics |
78 |
60 |
UA library record; WoS full record; WoS citing articles |
Autrique, D.; Clair, G.; L'Hermite, D.; Alexiades, V.; Bogaerts, A.; Rethfeld, B. |
The role of mass removal mechanisms in the onset of ns-laser induced plasma formation |
2013 |
Journal of applied physics |
114 |
31 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model |
1996 |
Journal of applied physics |
79 |
81 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description |
1999 |
Journal of applied physics |
86 |
50 |
UA library record; WoS full record; WoS citing articles |
Baguer, N.; Bogaerts, A.; Gijbels, R. |
Role of the fast Ar atoms, Ar+ ions and metastable Ar atoms in a hollow cathode glow discharge: study by a hybrid model |
2003 |
Journal of applied physics |
94 |
19 |
UA library record; WoS full record; WoS citing articles |
Depla, D.; Li, X.Y.; Mahieu, S.; van Aeken, K.; Leroy, W.P.; Haemers, J.; de Gryse, R.; Bogaerts, A. |
Rotating cylindrical magnetron sputtering: simulation of the reactive process |
2010 |
Journal of applied physics |
107 |
15 |
UA library record; WoS full record; WoS citing articles |
Wendelen, W.; Mueller, B.Y.; Autrique, D.; Rethfeld, B.; Bogaerts, A. |
Space charge corrected electron emission from an aluminum surface under non-equilibrium conditions |
2012 |
Journal of applied physics |
111 |
30 |
UA library record; WoS full record; WoS citing articles |
Wendelen, W.; Autrique, D.; Bogaerts, A. |
Space charge limited electron emission from a Cu surface under ultrashort pulsed laser irradiation |
2010 |
Applied physics letters |
96 |
22 |
UA library record; WoS full record; WoS citing articles |
Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4 |
2000 |
Journal of applied physics |
87 |
14 |
UA library record; WoS full record; WoS citing articles |
Baguer, N.; Bogaerts, A.; Gijbels, R. |
Study of a hollow cathode glow discharge in He: Monte Carlo-fluid model combined with a transport model for the metastable atoms |
2003 |
Journal of applied physics |
93 |
24 |
UA library record; WoS full record; WoS citing articles |
Baguer, N.; Bogaerts, A.; Donko, Z.; Gijbels, R.; Sadeghi, N. |
Study of the Ar metastable atom population in a hollow cathode discharge by means of a hybrid model and spectrometric measurements |
2005 |
Journal of applied physics |
97 |
40 |
UA library record; WoS full record; WoS citing articles |
Baguer, N.; Bogaerts, A. |
Study of the sputtered Cu atoms and Cu+ ions in a hollow cathode glow discharge using a hybrid model |
2005 |
Journal of applied physics |
98 |
18 |
UA library record; WoS full record; WoS citing articles |
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. |
Unraveling the deposition mechanism in a-C:H thin-film growth: a molecular-dynamics study for the reaction behavior of C3 and C3H radicals with a-C:H surfaces |
2006 |
Journal of applied physics |
99 |
25 |
UA library record; WoS full record; WoS citing articles |