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  Author Title Year Publication Volume Times cited Additional Links Links
Zhang, Y.; Jiang, W.; Zhang, Q.Z.; Bogaerts, A. Computational study of plasma sustainability in radio frequency micro-discharges 2014 Journal of applied physics 115 11 UA library record; WoS full record; WoS citing articles pdf doi
Neyts, E.C.; Ostrikov, K.; Han, Z.J.; Kumar, S.; van Duin, A.C.T.; Bogaerts, A. Defect healing and enhanced nucleation of carbon nanotubes by low-energy ion bombardment 2013 Physical review letters 110 50 UA library record; WoS full record; WoS citing articles url doi
Bogaerts, A.; van Straaten, M.; Gijbels, R. Description of the thermalization process of the sputtered atoms in a glow discharge using a 3-dimensional Monte Carlo method 1995 Journal of applied physics 77 87 UA library record; WoS full record; WoS citing articles doi
Kolev, I.; Bogaerts, A. Detailed numerical investigation of a DC sputter magnetron 2006 IEEE transactions on plasma science 34 28 UA library record; WoS full record; WoS citing articles doi
Martens, T.; Bogaerts, A.; Brok, W.J.M.; van Dijk, J. The dominant role of impurities in the composition of high pressure noble gas plasmas 2008 Applied physics letters 92 115 UA library record; WoS full record; WoS citing articles doi
Chen, Z.; Bleiner, D.; Bogaerts, A. Effect of ambient pressure on laser ablation and plume expansion dynamics: a numerical simulation 2006 Journal of applied physics 99 42 UA library record; WoS full record; WoS citing articles doi
Liu, Y.-X.; Zhang, Q.-Z.; Liu, J.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. Effect of bulk electric field reversal on the bounce resonance heating in dual-frequency capacitively coupled electronegative plasmas 2012 Applied physics letters 101 26 UA library record; WoS full record; WoS citing articles pdf doi
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. Effect of hydrogen on the growth of thin hydrogenated amorphous carbon films from thermal energy radicals 2006 Applied physics letters 88 35 UA library record; WoS full record; WoS citing articles doi
Zhao, S.-X.; Gao, F.; Wang, Y.-P.; Wang, Y.-N.; Bogaerts, A. Effects of feedstock availability on the negative ion behavior in a C4F8 inductively coupled plasma 2015 Journal of applied physics 118 1 UA library record; WoS full record; WoS citing articles pdf url doi
Yusupov, M.; Bultinck, E.; Depla, D.; Bogaerts, A. Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system 2011 Applied physics letters 98 4 UA library record; WoS full record; WoS citing articles doi
Yan, M.; Bogaerts, A.; Gijbels, R. Evolution of charged particle densities after laser-induced photodetachment in a strongly electronegative RF discharge 2002 IEEE transactions on plasma science 30 UA library record; WoS full record doi
Zhang, Q.-Z.; Wang, Y.-N.; Bogaerts, A. Heating mode transition in a hybrid direct current/dual-frequency capacitively coupled CF4 discharge 2014 Journal of applied physics 115 9 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Gijbels, R. Hybrid modeling network for a helium-argon-copper hollow cathode discharge used for laser applications 2002 Journal of applied physics 92 24 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R.; Goedheer, W. Hybrid Monte Carlo-fluid model of a direct current glow discharge 1995 Journal of applied physics 78 117 UA library record; WoS full record; WoS citing articles doi
Bultinck, E.; Kolev, I.; Bogaerts, A.; Depla, D. The importance of an external circuit in a particle-in-cell/Monte Carlo collisions model for a direct current planar magnetron 2008 Journal of applied physics 103 29 UA library record; WoS full record; WoS citing articles doi
Okhrimovskyy, A.; Bogaerts, A.; Gijbels, R. Incorporating the gas flow in a numerical model of rf discharges in methane 2004 Journal of applied physics 96 11 UA library record; WoS full record; WoS citing articles doi
Martens, T.; Bogaerts, A.; Brok, W.J.M.; van Dijk, J. The influence of impurities on the performance of the dielectric barrier discharge 2010 Applied physics letters 96 28 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Naylor, J.; Hatcher, M.; Jones, W.J.; Mason, R. Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment 1998 Journal of vacuum science and technology: A: vacuum surfaces and films 16 12 UA library record; WoS full record; WoS citing articles doi
de Bleecker, K.; Bogaerts, A.; Goedheer, W.; Gijbels, R. Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model 2004 IEEE transactions on plasma science 32 29 UA library record; WoS full record; WoS citing articles doi
Chen, Z.; Bogaerts, A. Laser ablation of Cu and plume expansion into 1 atm ambient gas 2005 Journal of applied physics 97 131 UA library record; WoS full record; WoS citing articles doi
Bleiner, D.; Bogaerts, A.; Belloni, F.; Nassisi, V. Laser-induced plasmas from the ablation of metallic targets: the problem of the onset temperature, and insights on the expansion dynamics 2007 Journal of applied physics 101 31 UA library record; WoS full record; WoS citing articles doi
Zhang, Y.-R.; Tinck, S.; De Schepper, P.; Wang, Y.-N.; Bogaerts, A. Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime 2015 Journal of vacuum science and technology: A: vacuum surfaces and films 33 3 UA library record; WoS full record; WoS citing articles url doi
Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model 2002 Journal of applied physics 92 15 UA library record; WoS full record; WoS citing articles doi
Ariskin, D.A.; Schweigert, I.V.; Alexandrov, A.L.; Bogaerts, A.; Peeters, F.M. Modeling of chemical processes in the low pressure capacitive radio frequency discharges in a mixture of Ar/C2H2 2009 Journal of applied physics 105 21 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge 1999 Journal of applied physics 86 18 UA library record; WoS full record; WoS citing articles doi
Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. Modeling of the target surface modification by reactive ion implantation during magnetron sputtering 2004 Journal of vacuum science and technology: A: vacuum surfaces and films 22 13 UA library record; WoS full record; WoS citing articles doi
Wendelen, W.; Mueller, B.Y.; Autrique, D.; Bogaerts, A.; Rethfeld, B. Modeling ultrashort laser-induced emission from a negatively biased metal 2013 Applied physics letters 103 8 UA library record; WoS full record; WoS citing articles pdf doi
Gou, F.; Neyts, E.; Eckert, M.; Tinck, S.; Bogaerts, A. Molecular dynamics simulations of Cl+ etching on a Si(100) surface 2010 Journal of applied physics 107 15 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge 1999 IEEE transactions on plasma science 27 15 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Bogaerts, A. Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics 2005 Journal of applied physics 98 75 UA library record; WoS full record; WoS citing articles doi
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