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  Author Title Year Publication Volume Times cited Additional Links Links
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges 2000 Plasma sources science and technology 9 21 UA library record; WoS full record; WoS citing articles doi
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation 2013 Plasma sources science and technology 22 13 UA library record; WoS full record; WoS citing articles pdf doi
Kozák, T.; Bogaerts, A. Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model 2015 Plasma sources science and technology 24 100 UA library record; WoS full record; WoS citing articles pdf url doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma 2013 Plasma sources science and technology 22 11 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas 2013 Plasma sources science and technology 22 9 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux 2005 Plasma sources science and technology 14 9 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces 2002 Plasma sources science and technology 11 51 UA library record; WoS full record; WoS citing articles doi
Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. Modeling of a dielectric barrier discharge used as a flowing chemical reactor 2008 Journal of physics : conference series 133 6 UA library record; WoS full record; WoS citing articles url doi
Bogaerts, A.; Aerts, R.; Snoeckx, R.; Somers, W.; Van Gaens, W.; Yusupov, M.; Neyts, E. Modeling of plasma and plasma-surface interactions for medical, environmental and nano applications 2012 Journal of physics : conference series 399 7 UA library record; WoS full record; WoS citing articles url doi
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles pdf doi
de Bleecker, K.; Bogaerts, A.; Goedheer, W. Modelling of nanoparticle coagulation and transport dynamics in dusty silane discharges 2006 New journal of physics 8 20 UA library record; WoS full record; WoS citing articles url doi
Van Gaens, W.; Iseni, S.; Schmidt-Bleker, A.; Weltmann, K.-D.; Reuter, S.; Bogaerts, A. Numerical analysis of the effect of nitrogen and oxygen admixtures on the chemistry of an argon plasma jet operating at atmospheric pressure 2015 New journal of physics 17 29 UA library record; WoS full record; WoS citing articles url doi
Van Gaens, W.; Bruggeman, P.J.; Bogaerts, A. Numerical analysis of the NO and O generation mechanism in a needle-type plasma jet 2014 New journal of physics 16 34 UA library record; WoS full record; WoS citing articles url doi
Jiang, W.; Zhang, Y.; Bogaerts, A. Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors 2014 New journal of physics 16 UA library record; WoS full record; WoS citing articles url doi
Bultinck, E.; Bogaerts, A. Particle-in-cell/Monte Carlo collisions treatment of an Ar/O2 magnetron discharge used for the reactive sputter deposition of TiOx films 2009 New journal of physics 11 24 UA library record; WoS full record; WoS citing articles url doi
Georgieva, V.; Bogaerts, A. Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model 2006 Plasma sources science and technology 15 35 UA library record; WoS full record; WoS citing articles doi
Mao, M.; Bogaerts, A. Plasma chemistry modeling for an inductively coupled plasma used for the growth of carbon nanotubes 2011 Journal of physics : conference series 275 UA library record url doi
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. Reaction mechanisms and thin a-C:H film growth from low energy hydrocarbon radicals 2007 Journal of physics : conference series 86 22 UA library record; WoS full record; WoS citing articles url doi
Van Gaens, W.; Bogaerts, A. Reaction pathways of biomedically active species in an Ar plasma jet 2014 Plasma sources science and technology 23 34 UA library record; WoS full record; WoS citing articles pdf doi
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. Reactive sputter deposition of TiNx films, simulated with a particle-in-cell/Monte Carlo collisions model 2009 New journal of physics 11 23 UA library record; WoS full record; WoS citing articles url doi
Bogaerts, A.; Neyts, E.C.; Rousseau, A. Special issue on fundamentals of plasmasurface interactions 2014 Journal of physics: D: applied physics 47 2 UA library record; WoS full record; WoS citing articles doi
Kozák, T.; Bogaerts, A. Splitting of CO2 by vibrational excitation in non-equilibrium plasmas : a reaction kinetics model 2014 Plasma sources science and technology 23 170 UA library record; WoS full record; WoS citing articles pdf doi
Yusupov, M.; Saraiva, M.; Depla, D.; Bogaerts, A. Sputter deposition of MgxAlyOz thin films in a dual-magnetron device : a multi-species Monte Carlo model 2012 New journal of physics 14 2 UA library record; WoS full record; WoS citing articles url doi
Zhang, Y.; Wang, H.-yu; Jiang, W.; Bogaerts, A. Two-dimensional particle-in cell/Monte Carlo simulations of a packed-bed dielectric barrier discharge in air at atmospheric pressure 2015 New journal of physics 17 22 UA library record; WoS full record; WoS citing articles url doi
Neyts, E.C.; Bogaerts, A. Understanding plasma catalysis through modelling and simulation : a review 2014 Journal of physics: D: applied physics 47 130 UA library record; WoS full record; WoS citing articles pdf doi
Belov, I.; Paulussen, S.; Bogaerts, A. Analysis and comparison of the co2 and co dielectric barrier discharge solid products 2016 Hakone Xv: International Symposium On High Pressure Low Temperature Plasma Chemistry: With Joint Cost Td1208 Workshop: Non-equilibrium Plasmas With Liquids For Water And Surface Treatment UA library record; WoS full record pdf
Bogaerts, A.; Snoeckx, R.; Berthelot, A.; Heijkers, S.; Wang, W.; Sun, S.; Van Laer, K.; Ramakers, M.; Michielsen, I.; Uytdenhouwen, Y.; Meynen, V.; Cool, P. Plasma based co2 conversion: a combined modeling and experimental study 2016 Hakone Xv: International Symposium On High Pressure Low Temperature Plasma Chemistry: With Joint Cost Td1208 Workshop: Non-equilibrium Plasmas With Liquids For Water And Surface Treatment UA library record; WoS full record pdf
Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. Formation of single layer graphene on nickel under far-from-equilibrium high flux conditions 2013 Nanoscale 5 25 UA library record; WoS full record; WoS citing articles pdf doi
Neyts, E.; Bogaerts, A. Influence of internal energy and impact angle on the sticking behaviour of reactive radicals in thin a-C:H film growth: a molecular dynamics study 2006 Physical chemistry, chemical physics 8 7 UA library record; WoS full record; WoS citing articles doi
Khalilov, U.; Bogaerts, A.; Neyts, E.C. Microscopic mechanisms of vertical graphene and carbon nanotube cap nucleation from hydrocarbon growth precursors 2014 Nanoscale 6 21 UA library record; WoS full record; WoS citing articles doi
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