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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Petrovic, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. |
Modeling of a dielectric barrier discharge used as a flowing chemical reactor |
2008 |
|
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UA library record; WoS full record; |
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Mihailova, D.; Grozeva, M.; Bogaerts, A.; Gijbels, R.; Sabotinov, N. |
Longitudinal hollow cathode copper ion laser: optimization of excitation and geometry |
2003 |
|
|
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Grozeva, M. |
Axial non-uniformity of longitudinal hollow cathode discharges for laser applications: numerical modeling and comparison with experiments |
2002 |
Applied physics: B: photo-physics and laser chemistry |
75 |
8 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Martens, T.; Bogaerts, A.; Brok, W.; van Dijk, J. |
Computer simulations of a dielectric barrier discharge used for analytical spectrometry |
2007 |
Analytical and bioanalytical chemistry |
388 |
28 |
UA library record; WoS full record; WoS citing articles |
|
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|
Bogaerts, A.; Grozeva, M. |
Effect of helium/argon gas ratio in a He-Ar-Cu+ IR hollow-cathode discharge laser : modeling study and comparison with experiments |
2003 |
Applied physics B : lasers and optics |
76 |
6 |
UA library record; WoS full record; WoS citing articles |
|
|
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Bogaerts, A.; Gijbels, R. |
Mathematical description of a direct current glow discharge in argon |
1996 |
Fresenius' journal of analytical chemistry |
355 |
12 |
UA library record; WoS full record; WoS citing articles |
|
|
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Bogaerts, A.; Kolev, I.; Buyle, G. |
Modeling of the magnetron discharge |
2008 |
|
|
|
UA library record |
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Bogaerts, A.; Gijbels, R. |
New developments and applications in GDMS |
1999 |
Fresenius' journal of analytical chemistry |
364 |
17 |
UA library record; WoS full record; WoS citing articles |
|
|
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Kolev, I.; Bogaerts, A. |
Numerical models of the planar magnetron glow discharges |
2004 |
Contributions to plasma physics |
44 |
22 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Gijbels, R.; Bogaerts, A. |
Recent trends in solids mass spectrometry: GDMS and other methods |
1997 |
Fresenius' journal of analytical chemistry |
359 |
5 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Three-dimensional modeling of a direct current glow discharge in argon: is it better than one-dimensional modeling? |
1997 |
Fresenius' journal of analytical chemistry |
359 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Neyts, E.; Mao, M.; Eckert, M.; Bogaerts, A. |
Modeling aspects of plasma-enhanced chemical vapor deposition of carbon-based materials |
2012 |
|
|
|
UA library record |
|
|
|
Kolev, S.; Bogaerts, A. |
A 2D model for a gliding arc discharge |
2015 |
Plasma sources science and technology |
24 |
34 |
UA library record; WoS full record; WoS citing articles |
|
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Yusupov, M.; Neyts, E.C.; Khalilov, U.; Snoeckx, R.; van Duin, A.C.T.; Bogaerts, A. |
Atomic-scale simulations of reactive oxygen plasma species interacting with bacterial cell walls |
2012 |
New journal of physics |
14 |
47 |
UA library record; WoS full record; WoS citing articles |
|
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Yusupov, M.; Bultinck, E.; Depla, D.; Bogaerts, A. |
Behavior of electrons in a dual-magnetron sputter deposition system : a Monte Carlo model |
2011 |
New journal of physics |
13 |
12 |
UA library record; WoS full record; WoS citing articles |
|
|
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Bultinck, E.; Bogaerts, A. |
Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model |
2011 |
Plasma sources science and technology |
20 |
7 |
UA library record; WoS full record; WoS citing articles |
|
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Cenian, A.; Chernukho, A.; Bogaerts, A.; Gijbels, R. |
Comment on 'Integral cross sections for electron impact excitation of electronic states of N2' |
2002 |
Journal of physics: B : atomic and molecular physics |
35 |
2 |
UA library record; WoS full record; WoS citing articles |
|
|
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Bogaerts, A. |
Comprehensive modelling network for dc glow discharges in argon |
1999 |
Plasma sources science and technology |
8 |
27 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
|
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Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. |
Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges |
2010 |
Plasma sources science and technology |
19 |
116 |
UA library record; WoS full record; WoS citing articles |
|
|
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De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. |
Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations |
2011 |
Plasma sources science and technology |
20 |
38 |
UA library record; WoS full record; WoS citing articles |
|
|
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Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. |
Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis |
2015 |
Plasma sources science and technology |
24 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
|
|
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Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. |
Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges |
2013 |
Plasma sources science and technology |
22 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
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Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
|
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Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. |
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation |
2013 |
Plasma sources science and technology |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Kozák, T.; Bogaerts, A. |
Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model |
2015 |
Plasma sources science and technology |
24 |
100 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
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Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. |
Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas |
2013 |
Plasma sources science and technology |
22 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
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Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. |
Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux |
2005 |
Plasma sources science and technology |
14 |
9 |
UA library record; WoS full record; WoS citing articles |
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