| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| Verswyvel, H.; Deben, C.; Wouters, A.; Lardon, F.; Bogaerts, A.; Smits, E.; Lin, A. |
Phototoxicity and cell passage affect intracellular reactive oxygen species levels and sensitivity towards non-thermal plasma treatment in fluorescently-labeled cancer cells |
2023 |
Journal of physics: D: applied physics |
56 |
|
UA library record; WoS full record; WoS citing articles |
| Khalilov, U.; Bogaerts, A.; Hussain, S.; Kovacevic, E.; Brault, P.; Boulmer-Leborgne, C.; Neyts, E.C. |
Nanoscale mechanisms of CNT growth and etching in plasma environment |
2017 |
Journal of physics: D: applied physics |
50 |
6 |
UA library record; WoS full record; WoS citing articles |
| Wang, W.; Berthelot, A.; Zhang, Q.; Bogaerts, A. |
Modelling of plasma-based dry reforming: how do uncertainties in the input data affect the calculation results? |
2018 |
Journal of physics: D: applied physics |
51 |
7 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Bogaerts, A. |
Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry |
2016 |
Journal of physics: D: applied physics |
49 |
5 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Tillocher, T.; Dussart, R.; Neyts, E.C.; Bogaerts, A. |
Elucidating the effects of gas flow rate on an SF6inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation |
2016 |
Journal of physics: D: applied physics |
49 |
1 |
UA library record; WoS full record; WoS citing articles |
| Kumar, N.; Attri, P.; Dewilde, S.; Bogaerts, A. |
Inactivation of human pancreatic ductal adenocarcinoma with atmospheric plasma treated media and water: a comparative study |
2018 |
Journal of physics: D: applied physics |
51 |
6 |
UA library record; WoS full record; WoS citing articles |
