Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Bogaerts, A.; Neyts, E.C. |
Plasma Technology: An Emerging Technology for Energy Storage |
2018 |
ACS energy letters |
3 |
56 |
UA library record; WoS full record; WoS citing articles |
Bal, K.M.; Bogaerts, A.; Neyts, E.C. |
Ensemble-Based Molecular Simulation of Chemical Reactions under Vibrational Nonequilibrium |
2020 |
Journal Of Physical Chemistry Letters |
11 |
|
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Tillocher, T.; Dussart, R.; Neyts, E.C.; Bogaerts, A. |
Elucidating the effects of gas flow rate on an SF6inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation |
2016 |
Journal of physics: D: applied physics |
49 |
1 |
UA library record; WoS full record; WoS citing articles |