Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Wang, W.; Berthelot, A.; Kolev, S.; Tu, X.; Bogaerts, A. |
CO2 conversion in a gliding arc plasma: 1D cylindrical discharge model |
2016 |
Plasma sources science and technology |
25 |
3 |
UA library record; WoS full record; WoS citing articles |
Kolev, S.; Bogaerts, A. |
A 2D model for a gliding arc discharge |
2015 |
Plasma sources science and technology |
24 |
34 |
UA library record; WoS full record; WoS citing articles |
Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. |
Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis |
2015 |
Plasma sources science and technology |
24 |
11 |
UA library record; WoS full record; WoS citing articles |
Kozák, T.; Bogaerts, A. |
Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model |
2015 |
Plasma sources science and technology |
24 |
100 |
UA library record; WoS full record; WoS citing articles |
Kolev, S.; Bogaerts, A. |
Similarities and differences between gliding glow and gliding arc discharges |
2015 |
Plasma sources science and technology |
24 |
12 |
UA library record; WoS full record; WoS citing articles |
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. |
Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations |
2011 |
Plasma sources science and technology |
20 |
38 |
UA library record; WoS full record; WoS citing articles |
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. |
Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges |
2013 |
Plasma sources science and technology |
22 |
20 |
UA library record; WoS full record; WoS citing articles |
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. |
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation |
2013 |
Plasma sources science and technology |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. |
Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas |
2013 |
Plasma sources science and technology |
22 |
9 |
UA library record; WoS full record; WoS citing articles |
Alves, L.L.; Bogaerts, A.; Guerra, V.; Turner, M.M. |
Foundations of modelling of nonequilibrium low-temperature plasmas |
2018 |
Plasma sources science and technology |
27 |
17 |
UA library record; WoS full record; WoS citing articles |
Bal, K.M.; Huygh, S.; Bogaerts, A.; Neyts, E.C. |
Effect of plasma-induced surface charging on catalytic processes: application to CO2activation |
2018 |
Plasma sources science and technology |
27 |
19 |
UA library record; WoS full record; WoS citing articles |
Smith, G.J.; Diomede, P.; Gibson, A.R.; Doyle, S.J.; Guerra, V.; Kushner, M.J.; Gans, T.; Dedrick, J.P. |
Low-pressure inductively coupled plasmas in hydrogen : impact of gas heating on the spatial distribution of atomic hydrogen and vibrationally excited states |
2024 |
Plasma sources science and technology |
33 |
|
UA library record; WoS full record |
Ramakers, M.; Medrano, J.A.; Trenchev, G.; Gallucci, F.; Bogaerts, A. |
Revealing the arc dynamics in a gliding arc plasmatron: a better insight to improve CO2conversion |
2017 |
Plasma sources science and technology |
26 |
7 |
UA library record; WoS full record; WoS citing articles |
Berthelot, A.; Bogaerts, A. |
Modeling of CO2plasma: effect of uncertainties in the plasma chemistry |
2017 |
Plasma sources science and technology |
26 |
16 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
Bissonnette-Dulude, J.; Heirman, P.; Coulombe, S.; Bogaerts, A.; Gervais, T.; Reuter, S. |
Coupling the COST reference plasma jet to a microfluidic device: a computational study |
2024 |
Plasma sources science and technology |
33 |
|
UA library record; WoS full record |
Bogaerts, A. |
Comprehensive modelling network for dc glow discharges in argon |
1999 |
Plasma sources science and technology |
8 |
27 |
UA library record; WoS full record; WoS citing articles |
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. |
Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux |
2005 |
Plasma sources science and technology |
14 |
9 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Bogaerts, A. |
Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model |
2006 |
Plasma sources science and technology |
15 |
35 |
UA library record; WoS full record; WoS citing articles |