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Author
Title
Year
Publication
Volume
Times cited
Additional Links
Tinck, S.
;
Bogaerts, A.
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition
2011
Plasma sources science and technology
20
11
UA library record
;
WoS full record
;
WoS citing articles
Tinck, S.
;
Bogaerts, A.
Computational study of the CF
4
/CHF
3
/ H
2
/Cl
2
/O
2
/HBr gas phase plasma chemistry
2016
Journal of physics: D: applied physics
49
5
UA library record
;
WoS full record
;
WoS citing articles
Tinck, S.
;
Bogaerts, A.
Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon
2016
Journal of physics: D: applied physics
49
UA library record
;
WoS full record
;
WoS citing articles
Tinck, S.
;
Bogaerts, A.
Modeling SiH
4
/O
2
/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI)
2012
Plasma processes and polymers
9
5
UA library record
;
WoS full record
;
WoS citing articles