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  Author Title Year Publication Volume Times cited Additional Links Links
Zelaya, E.; Schryvers, D.; Tolley, A.; Fitchner, P.F.P. Cavity nucleation and growth in Cu-Zn-Al irradiated with Cu+ ions at different temperatures 2010 Intermetallics 18 1 UA library record; WoS full record; WoS citing articles pdf doi
Srivastava, A.K.; Schryvers, D.; van Humbeeck, J. Grain growth and precipitation in an annealed cold-rolled Ni50.2Ti49.8 alloy 2007 Intermetallics 15 37 UA library record; WoS full record; WoS citing articles pdf doi
Satto, C.; Ledda, A.; Potapov, P.; Janssens, J.F.; Schryvers, D. Phase transformations and precipitation in amorphous Ti50Ni25Cu25 ribbons 2001 Intermetallics 9 16 UA library record; WoS full record; WoS citing articles doi
Samajdar, I.; Ratchev, P.; Verlinden, B.; Schryvers, D. Recrystallization and grain growth in a B2 iron aluminide alloy 1998 Intermetallics 6 17 UA library record; WoS full record; WoS citing articles doi
Delville, R.; Schryvers, D. Transmission electron microscopy study of combined precipitation of Ti2Ni(Pd) and Ti2Pd(Ni) in a Ti50Ni30Pd20 alloy 2010 Intermetallics 18 9 UA library record; WoS full record; WoS citing articles pdf doi
Santamarta, R.; Schryvers, D. Twinned b.c.c. sherical particles in a partially crystallised Ti50Ni25Cu25 melt-spun ribbon 2004 Intermetallics 12 14 UA library record; WoS full record; WoS citing articles pdf doi
Potgieter-Vermaak, S.; Van Grieken, R.; Potgieter, J.H. Integrated analytical techniques for the characterisation of environmental particles 2010 Spectroscopy Europe 22 UA library record
Yandouzi, M.; Toth, L.; Schryvers, D. High resolution transmission electron microscopy study of nanoscale Ni-rich Ni-Al films evaporated onto NaCl and KCl 1998 Nanostructured materials 10 2 UA library record; WoS full record; WoS citing articles doi
Oleshko, V.P.; van Daele, A.; Gijbels, R.H.; Jacob, W.A. Structural and analytical characterization of Ag(Br,I) nanocrystals by cryo-AEM techniques 1998 Journal of nanostructured materials 10 5 UA library record; WoS full record; WoS citing articles doi
Hosseininia, G.; Rafiaani Khachak, P.; Nooripoor, M.; Van Passel, S.; Azadi, H. Understanding communicational behavior among rangelands' stakeholders : application of social network analysis 2016 Journal Of Environmental Planning And Management 59 1 UA library record; WoS full record; WoS citing articles doi
Motamedi, J.; Azadi, H.; Alijanpour, A.; Shafiei, A.B.; Sheidai-Karkaj, E.; Mofidi-Chelan, M.; Moghaddam, S.M.; Van Passel, S.; Witlox, F. Economic indices of by-products utilization and forage production in semi-arid rangelands 2022 Journal of environmental planning and management UA library record; WoS full record; WoS citing articles pdf doi
Kolev, S.; Bogaerts, A. A 2D model for a gliding arc discharge 2015 Plasma sources science and technology 24 34 UA library record; WoS full record; WoS citing articles pdf url doi
Bultinck, E.; Bogaerts, A. Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model 2011 Plasma sources science and technology 20 7 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A. Comprehensive modelling network for dc glow discharges in argon 1999 Plasma sources science and technology 8 27 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Bogaerts, A. Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition 2011 Plasma sources science and technology 20 11 UA library record; WoS full record; WoS citing articles doi
Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges 2010 Plasma sources science and technology 19 116 UA library record; WoS full record; WoS citing articles pdf doi
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations 2011 Plasma sources science and technology 20 38 UA library record; WoS full record; WoS citing articles pdf doi
Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis 2015 Plasma sources science and technology 24 11 UA library record; WoS full record; WoS citing articles pdf url doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma 2012 Plasma sources science and technology 21 23 UA library record; WoS full record; WoS citing articles pdf doi
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges 2013 Plasma sources science and technology 22 20 UA library record; WoS full record; WoS citing articles pdf doi
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges 2000 Plasma sources science and technology 9 21 UA library record; WoS full record; WoS citing articles doi
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation 2013 Plasma sources science and technology 22 13 UA library record; WoS full record; WoS citing articles pdf doi
Kozák, T.; Bogaerts, A. Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model 2015 Plasma sources science and technology 24 100 UA library record; WoS full record; WoS citing articles pdf url doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma 2013 Plasma sources science and technology 22 11 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas 2013 Plasma sources science and technology 22 9 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux 2005 Plasma sources science and technology 14 9 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces 2002 Plasma sources science and technology 11 51 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles pdf doi
Georgieva, V.; Bogaerts, A. Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model 2006 Plasma sources science and technology 15 35 UA library record; WoS full record; WoS citing articles doi
Van Gaens, W.; Bogaerts, A. Reaction pathways of biomedically active species in an Ar plasma jet 2014 Plasma sources science and technology 23 34 UA library record; WoS full record; WoS citing articles pdf doi
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