| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. |
Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas |
2013 |
Plasma sources science and technology |
22 |
9 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. |
Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux |
2005 |
Plasma sources science and technology |
14 |
9 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
| Georgieva, V.; Bogaerts, A. |
Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model |
2006 |
Plasma sources science and technology |
15 |
35 |
UA library record; WoS full record; WoS citing articles |
| Van Gaens, W.; Bogaerts, A. |
Reaction pathways of biomedically active species in an Ar plasma jet |
2014 |
Plasma sources science and technology |
23 |
34 |
UA library record; WoS full record; WoS citing articles |
| Kozák, T.; Bogaerts, A. |
Splitting of CO2 by vibrational excitation in non-equilibrium plasmas : a reaction kinetics model |
2014 |
Plasma sources science and technology |
23 |
170 |
UA library record; WoS full record; WoS citing articles |
| Kolev, S.; Bogaerts, A. |
Similarities and differences between gliding glow and gliding arc discharges |
2015 |
Plasma sources science and technology |
24 |
12 |
UA library record; WoS full record; WoS citing articles |
| Oleshko, V.P.; van Daele, A.; Gijbels, R.H.; Jacob, W.A. |
Structural and analytical characterization of Ag(Br,I) nanocrystals by cryo-AEM techniques |
1998 |
Journal of nanostructured materials |
10 |
5 |
UA library record; WoS full record; WoS citing articles |
| Oleshko, V.P.; Gijbels, R.H.; Jacob, W.A. |
Analytical electron microscopy of silver halide photographic systems |
2000 |
Micron |
31 |
8 |
UA library record; WoS full record; WoS citing articles |
| Jian-Ping, N.; Xiao-Dan, L.; Cheng-Li, Z.; You-Min, Q.; Ping-Ni, H.; Bogaerts, A.; Fu-Jun, G. |
Molecular dynamics simulation of temperature effects on CF(3)(+) etching of Si surface |
2010 |
Wuli xuebao |
59 |
|
UA library record; WoS full record; WoS citing articles |
| Yue-Feng, Z.; Chao, W.; Wang, W.-Z.; Li, L.; Hao, S.; Tao, S.; Jie, P. |
Numerical simulation on particle density and reaction pathways in methane needle-plane discharge plasma at atmospheric pressure |
2018 |
Wuli xuebao |
67 |
|
UA library record; WoS full record; WoS citing articles |
| Saeed, A.; Khan, A.W.; Shafiq, M.; Jan, F.; Abrar, M.; Zaka-ul-Islam, M.; Zakaullah, M. |
Investigation of 50 Hz pulsed DC nitrogen plasma with active screen cage by trace rare gas optical emission spectroscopy |
2014 |
Plasma science & technology |
16 |
5 |
UA library record; WoS full record; WoS citing articles |
| Lefrancois, P.; Girard-Sahun, F.; Badets, V.; Clement, F.; Arbault, S. |
Electroactivity of superoxide anion in aqueous phosphate buffers analyzed with platinized microelectrodes |
2020 |
Electroanalysis |
|
|
UA library record; WoS full record; WoS citing articles |
| Claereboudt, J.; Claeys, M.; Geise, H.; Gijbels, R.; Vertes, A. |
Laser microprobe mass spectrometry of quaternary phosphonium salts: direct versus matrix-assisted laser desorption |
1993 |
Journal of the American Society for Mass Spectrometry |
4 |
17 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Modeling of glow discharge sources with flat and pin cathodes and implications for mass spectrometric analysis |
1997 |
Journal of the American Society of Mass Spectrometry |
8 |
15 |
UA library record; WoS full record; WoS citing articles |
| Verlinden, G.; Gijbels, R.; Geuens, I. |
Quantitative secondary ion mass spectrometry depth profiling of surface layers of cubic silver halide microcrystals |
1999 |
Journal of the American Society for Mass Spectrometry |
10 |
4 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Modeling of metastable argon atoms in a direct current glow discharge |
1995 |
Physical review : A : atomic, molecular and optical physics |
52 |
98 |
UA library record; WoS full record; WoS citing articles |
| Oleshko, V.P.; Gijbels, R.H.; van Daele, A.J.; Jacob, W.A.; Xu, Y.-E.; Wang, S.-E.; Park, I.-Y.; Kang, T.-S. |
Combined characterization of composite tabular silver halide microcrystals by cryo-EFTEM/EELS and cryo-STEM/EDX techniques |
1998 |
Microscopy research and technique |
42 |
4 |
UA library record; WoS full record; WoS citing articles |
| Oleshko, V.; Gijbels, R.; Jacob, W.; Alfimov, M. |
Characterization of complex silver halide photographic systems by means of analytical electron microscopy |
1995 |
Microbeam analysis |
4 |
9 |
UA library record; WoS full record; WoS citing articles |
| Oleshko, V.; Gijbels, R.; Jacob, W.; Alfimov, M. |
Characterization of complex silver halide photographic systems by means of analytical electron microscopy |
1994 |
Microbeam analysis |
3 |
|
UA library record |
| Geuens, I.; Gijbels, R.; Jacob, W.A.; Verbeeck, A.; de Keyzer, R. |
Analysis of silver halide microcrystals using different modes of a scanning transmission electron microscope and digital image processing |
1992 |
The journal of imaging science and technology |
36 |
10 |
UA library record; WoS full record; WoS citing articles |
| Charlier, E.; van Doorselaer, M.; Gijbels, R.; de Keyzer, R.; Geuens, I. |
Unveiling the composition of sulphur sensitization specks by their interactions with TAI |
2000 |
Journal Of Imaging Science And Technology |
44 |
16 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Effect of small amounts of hydrogen added to argon glow discharges: hybrid Monte-Carlo-fluid model |
2002 |
Physical review : E : statistical, nonlinear, and soft matter physics |
65 |
33 |
UA library record; WoS full record; WoS citing articles |
| Okhrimovskyy, A.; Bogaerts, A.; Gijbels, R. |
Electron anisotropic scattering in gases: a formula for Monte Carlo simulations |
2002 |
Physical review : E : statistical, nonlinear, and soft matter physics |
65 |
57 |
UA library record; WoS full record; WoS citing articles |
| Kaganovich, I.; Misina, M.; Berezhnoi, S.; Gijbels, R. |
Electron Boltzmann kinetic equation averaged over fast electron bouncing and pitch-angle scattering for fast modeling of electron cyclotron resonance discharge |
2000 |
Physical review : E : statistical, nonlinear, and soft matter physics |
61 |
31 |
UA library record; WoS full record; WoS citing articles |
| Yan, M.; Bogaerts, A.; Gijbels, R. |
Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge |
2001 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
63 |
4 |
UA library record; WoS full record; WoS citing articles |
| Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Local and fast relaxation phenomena after laser-induced photodetachment in a strongly electronegative rf discharge |
2002 |
Physical review : E : statistical, nonlinear, and soft matter physics |
65 |
2 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Gijbels, R. |
Comprehensive three-dimensional modeling network for a dc glow discharge plasma |
1998 |
Plasma physics reports |
24 |
8 |
UA library record; WoS full record; WoS citing articles |
