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Comparison of As- and P-based metamorphic buffers for high performance InP heterojunction bipolar transistor and high electron mobility transistor applications”. Lubyshev D, Fastenau JM, Fang X-M, Wu Y, Doss C, Snyder A, Liu WK, Lamb MSM, Bals S, Song C, Journal of vacuum science &, technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena 22, 1565 (2004). http://doi.org/10.1116/1.1691412
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Comprehensive modelling network for dc glow discharges in argon”. Bogaerts A, Plasma sources science and technology 8, 210 (1999). http://doi.org/10.1088/0963-0252/8/2/003
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Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition”. Tinck S, Bogaerts A, Plasma sources science and technology 20, 015008 (2011). http://doi.org/10.1088/0963-0252/20/1/015008
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Control and readout of current-induced magnetic flux quantization in a superconducting transformer”. Kerner C, Hackens B, Golubović, DS, Poli S, Faniel S, Magnus W, Schoenmaker W, Bayot V, Maes H, Superconductor science and technology 22, 025001 (2009). http://doi.org/10.1088/0953-2048/22/2/025001
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Controllable synthesis of novel one-dimensional carbon nanomaterials on an alkali-element-modified Cu catalyst”. Tao XY, Zhang XB, Cheng J-P, Liu F, Li Y, Van Tendeloo G, Nanotechnology 17, 224 (2006). http://doi.org/10.1088/0957-4484/17/1/037
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Controlling magnetic flux motion by arrays of zigzag-arranged magnetic bars”. Kapra AV, Misko VR, Peeters FM, Superconductor science and technology 26, 025011 (2013). http://doi.org/10.1088/0953-2048/26/2/025011
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Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges”. Paulussen S, Verheyde B, Tu X, De Bie C, Martens T, Petrovic D, Bogaerts A, Sels B, Plasma sources science and technology 19, 034015 (2010). http://doi.org/10.1088/0963-0252/19/3/034015
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Critical assessment of the process of growth of a YBa2Cu3O7-\delta layer on Y2BaCuO5”. Jacques P, Verbist K, Lapin J, Ryelandt L, Van Tendeloo G, Delannay F, Superconductor science and technology 9, 176 (1996). http://doi.org/10.1088/0953-2048/9/3/008
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Crystalline structure of very hard tungsten carbide thin films obtained by reactive pulsed laser deposition”. Mihailescu IN, Gyorgy E, Marin G, Popescu M, Teodorescu VS, van Landuyt J, Grivas C, Hatziapostolou A, Journal of vacuum science and technology: A: vacuum surfaces and films 17, 249 (1999). http://doi.org/10.1116/1.581579
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Crystallographic aspects related to advanced tribological multilayers of Cr/CrN and Ti/TiN types produced by pulsed laser deposition (PLD)”. Major L, Morgiel J, Major B, Lackner JM, Waldhauser W, Ebner R, Nistor L, Van Tendeloo G, Surface and coatings technology 200, 6190 (2006). http://doi.org/10.1016/j.surfcoat.2005.11.021
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Crystallographic plane tuning of charge and spin transport in semiconductor quantum wires”. Wang M, Chang K, Wang LG, Dai N, Peeters FM, Nanotechnology 20, 365202 (2009). http://doi.org/10.1088/0957-4484/20/36/365202
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Defect controlled room temperature ferromagnetism in Co-doped barium titanate nanocrystals”. Ray S, Kolen'ko YV, Kovnir KA, Lebedev OI, Turner S, Chakraborty T, Erni R, Watanabe T, Van Tendeloo G, Yoshimura M, Itoh M, Nanotechnology 23, 025702 (2012). http://doi.org/10.1088/0957-4484/23/2/025702
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Defects in high-dose oxygen implanted silicon : a TEM study”. Deveirman A, van Landuyt J, Vanhellemont J, Maes HE, Yallup K, Vacuum: the international journal and abstracting service for vacuum science and technology T2 –, 1ST SIOMX WORKSHOP ( SEPARATION BY IMPLANTATION OF OXYGEN ) ( SWI-88 ), NOV 07-08, 1988, UNIV SURREY, GUILDFORD, ENGLAND 42, 367 (1991). http://doi.org/10.1016/0042-207X(91)90055-N
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Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations”. De Bie C, Martens T, van Dijk J, Paulussen S, Verheyde B, Corthals S, Bogaerts A, Plasma sources science and technology 20, 024008 (2011). http://doi.org/10.1088/0963-0252/20/2/024008
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Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis”. Peerenboom K, Parente A, Kozák T, Bogaerts A, Degrez G, Plasma sources science and technology 24, 025004 (2015). http://doi.org/10.1088/0963-0252/24/2/025004
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Effect of deposition rate on the microstructure of electron beam evaporated nanocrystalline palladium thin films”. Amin-Ahmadi B, Idrissi H, Galceran M, Colla MS, Raskin JP, Pardoen T, Godet S, Schryvers D, Thin solid films : an international journal on the science and technology of thin and thick films 539, 145 (2013). http://doi.org/10.1016/j.tsf.2013.05.083
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Effect of high-frequency electromagnetic field on Te+-implanted (001) Si</tex>”. Kalitzova M, Vlakhov E, Marinov Y, Gesheva K, Ignatova VA, Lebedev O, Muntele C, Gijbels R, Vacuum: the international journal and abstracting service for vacuum science and technology 76, 325 (2004). http://doi.org/10.1016/j.vacuum.2004.07.055
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Effect of pinning on the response of superconducting strips to an external pulsed current”. Berdiyorov G, Harrabi K, Maneval JP, Peeters FM, Superconductor science and technology 28, 025004 (2015). http://doi.org/10.1088/0953-2048/28/2/025004
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Effect of selenium content of CuInSex alloy nanopowder precursors on recrystallization of printed CuInSe2 absorber layers during selenization heat treatment”. E Zaghi A, Buffière M, Koo J, Brammertz G, Batuk M, Verbist C, Hadermann J, Kim WK, Meuris M, Poortmans J, Vleugels J;, Thin solid films : an international journal on the science and technology of thin and thick films , 1 (2014). http://doi.org/10.1016/j.tsf.2014.10.003
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The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 21, 025008 (2012). http://doi.org/10.1088/0963-0252/21/2/025008
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Effect of the burn-out step on the microstructure of the solution-processed Cu(In,Ga)Se2 solar cells”. Batuk M, Buffiere M, Zaghi AE, Lenaers N, Verbist C, Khelifi S, Vleugels J, Meuris M, Hadermann J, Thin solid films : an international journal on the science and technology of thin and thick films 583, 142 (2015). http://doi.org/10.1016/j.tsf.2015.03.063
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Effects of lateral asymmetry on electronic structure of strained semiconductor nanorings in a magnetic field”. Milošević, MM, Tadić, M, Peeters FM, Nanotechnology 19 (2008). http://doi.org/10.1088/0957-4484/19/45/455401
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Electrical tomography using atomic force microscopy and its application towards carbon nanotube-based interconnects”. Schulze A, Hantschel T, Dathe A, Eyben P, Ke X, Vandervorst W, Nanotechnology 23, 305707 (2012). http://doi.org/10.1088/0957-4484/23/30/305707
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Electromagnetic effects in high-frequency large-area capacitive discharges : a review”. Liu Y-X, Zhang Y-R, Bogaerts A, Wang Y-N, Journal of vacuum science and technology: A: vacuum surfaces and films 33, 020801 (2015). http://doi.org/10.1116/1.4907926
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Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges”. Liu Y-X, Zhang Q-Z, Liu L, Song Y-H, Bogaerts A, Wang Y-N, Plasma sources science and technology 22, 025012 (2013). http://doi.org/10.1088/0963-0252/22/2/025012
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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Electron microscopy and X-ray study of the growth of FeCr2S4 spinel single crystals by chemical vapour transport”. Volkov VV, van Heurck C, van Landuyt J, Amelinckx S, Zhukov EG, Polulyak ES, Novotortsev VM, Crystal research and technology 28, 1051 (1993). http://doi.org/10.1002/crat.2170280804
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Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation”. Van Laer K, Tinck S, Samara V, de Marneffe JF, Bogaerts A, Plasma sources science and technology 22, 025011 (2013). http://doi.org/10.1088/0963-0252/22/2/025011
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Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model”. Kozák T, Bogaerts A, Plasma sources science and technology 24, 015024 (2015). http://doi.org/10.1088/0963-0252/24/1/015024
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Evolution of the phase stability of NiAl under low energy ball milling”. Zelaya E, Esquivel MR, Schryvers D, Advanced powder technology 24, 1063 (2013). http://doi.org/10.1016/j.apt.2013.03.008
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