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Fluid simulation of the bias effect in inductive/capacitive discharges”. Zhang Y-R, Gao F, Li X-C, Bogaerts A, Wang Y-N, Journal of vacuum science and technology: A: vacuum surfaces and films 33, 061303 (2015). http://doi.org/10.1116/1.4928033
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Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment”. Bogaerts A, Naylor J, Hatcher M, Jones WJ, Mason R, Journal of vacuum science and technology: A: vacuum surfaces and films 16, 2400 (1998). http://doi.org/10.1116/1.581359
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Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime”. Zhang Y-R, Tinck S, De Schepper P, Wang Y-N, Bogaerts A, Journal of vacuum science and technology: A: vacuum surfaces and films 33, 021310 (2015). http://doi.org/10.1116/1.4906819
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Modeling of the target surface modification by reactive ion implantation during magnetron sputtering”. Depla D, Chen ZY, Bogaerts A, Ignatova V, de Gryse R, Gijbels R, Journal of vacuum science and technology: A: vacuum surfaces and films 22, 1524 (2004). http://doi.org/10.1116/1.1705641
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Molecular dynamics simulations of the growth of thin a-C:H films under additional ion bombardment: influence of the growth species and the Ar+ ion kinetic energy”. Neyts E, Eckert M, Bogaerts A, Chemical vapor deposition 13, 312 (2007). http://doi.org/10.1002/cvde.200606551
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Molecular dynamics simulations of the sticking and etch behavior of various growth species of (ultra)nanocrystalline diamond films”. Eckert M, Neyts E, Bogaerts A, Chemical vapor deposition 14, 213 (2008). http://doi.org/10.1002/cvde.200706657
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Study of atmospheric MOCVD of TiO2 thin films by means of computational fluid dynamics simulations”. Baguer N, Neyts E, van Gils S, Bogaerts A, Chemical vapor deposition 14, 339 (2008). http://doi.org/10.1002/cvde.200806708
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Automated segmentation of μ-XRF image sets”. Vekemans B, Janssens K, Vincze L, Aerts A, Adams F, Hertogen J, X-ray spectrometry 26, 333 (1997)
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Use of microscopic XRF for non-destructive analysis in art an archaeometry”. Janssens K, Vittiglio G, Deraedt I, Aerts A, Vekemans B, Vincze L, Wei F, de Ryck I, Schalm O, Adams F, Rindby A, Knöchel A, Simionovici AS, Snigirev A, X-ray spectrometry 29, 73 (2000). http://doi.org/10.1002/(SICI)1097-4539(200001/02)29:1<73::AID-XRS416>3.3.CO;2-D
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Advances in non-equilibrium $$\hbox {CO}_2$$ plasma kinetics: a theoretical and experimental review”. Pietanza LD, Guaitella O, Aquilanti V, Armenise I, Bogaerts A, Capitelli M, Colonna G, Guerra V, Engeln R, Kustova E, Lombardi A, Palazzetti F, Silva T, European Physical Journal D 75, 237 (2021). http://doi.org/10.1140/epjd/s10053-021-00226-0
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Investigation of laser output power saturation in the He-Cu+ IR hollow cathode discharge laser by experiments and numerical modeling”. Bogaerts A, Gijbels R, Grozeva M, Sabotinov N, Physica scripta T105, 90 (2003). http://doi.org/10.1238/Physica.Topical.105a00090
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Glow discharge modelling: from basic understanding towards applications”. Bogaerts A, Chen Z, Gijbels R, Surface and interface analysis 35, 593 (2003). http://doi.org/10.1002/sia.1578
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Dynamic Monte Carlo simulation for reactive sputtering of aluminium”. Chen ZY, Bogaerts A, Depla D, Ignatova V, Nuclear instruments and methods in physics research: B 207, 415 (2003). http://doi.org/10.1016/S0168-583X(03)01120-0
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Molecular dynamics simulation of the impact behaviour of various hydrocarbon species on DLC”. Neyts E, Bogaerts A, Gijbels R, Benedikt J, van de Sanden MCM, Nuclear instruments and methods in physics research: B: beam interactions with materials and atoms 228, 315 (2005). http://doi.org/10.1016/j.nimb.2004.10.063
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PIC-MC simulation of an RF capacitively coupled Ar/H2 discharge”. Neyts E, Yan M, Bogaerts A, Gijbels R, Nuclear instruments and methods in physics research: B 202, 300 (2003). http://doi.org/10.1016/S0168-583X(02)01873-6
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Detailed numerical investigation of a DC sputter magnetron”. Kolev I, Bogaerts A, IEEE transactions on plasma science 34, 886 (2006). http://doi.org/10.1109/TPS.2006.875843
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Evolution of charged particle densities after laser-induced photodetachment in a strongly electronegative RF discharge”. Yan M, Bogaerts A, Gijbels R, IEEE transactions on plasma science 30, 132 (2002). http://doi.org/10.1109/TPS.2002.1003959
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Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model”. de Bleecker K, Bogaerts A, Goedheer W, Gijbels R, IEEE transactions on plasma science 32, 691 (2004). http://doi.org/10.1109/TPS.2004.826095
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Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge”. Bogaerts A, Gijbels R, IEEE transactions on plasma science 27, 1406 (1999). http://doi.org/10.1109/27.799819
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A one-dimensional fluid model for an acetylene rf discharge: a study of the plasma chemistry”. Herrebout D, Bogaerts A, Gijbels R, Goedheer WJ, Vanhulsel A, IEEE transactions on plasma science 31, 659 (2003). http://doi.org/10.1109/TPS.2003.815249
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Semianalytical description of nonlocal secondary electrons in a radio-frequency capacitively coupled plasma at intermediate pressures”. Berezhnoi S, Kaganovich I, Misina M, Bogaerts A, Gijbels R, IEEE transactions plasma science 27, 1339 (1999). http://doi.org/10.1109/27.799810
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Comprehensive three-dimensional modeling network for a dc glow discharge plasma”. Bogaerts A, Gijbels R, Plasma physics reports 24, 573 (1998)
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Molecular dynamics simulation of temperature effects on CF(3)(+) etching of Si surface”. Jian-Ping N, Xiao-Dan L, Cheng-Li Z, You-Min Q, Ping-Ni H, Bogaerts A, Fu-Jun G, Wuli xuebao 59, 7225 (2010)
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What modeling reveals about the properties of an inductively coupled plasma”. Bogaerts A, Aghaei M, Spectroscopy 31, 52 (2016)
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Analysis of nonconducting materials by dc glow discharge spectrometry”. Bogaerts A, Schelles W, van Grieken R Wiley, Chichester, page 293 (2003).
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Characterization of nano-crystalline diamond films grown under continuous DC bias during plasma enhanced chemical vapor deposition”. Mortet V, Zhang L, Echert M, Soltani A, d' Haen J, Douheret O, Moreau M, Osswald S, Neyts E, Troadec D, Wagner P, Bogaerts A, Van Tendeloo G, Haenen K, Materials Research Society symposium proceedings (2009). http://doi.org/10.1557/PROC-1203-J05-03
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Cluster issue on plasma modelling”. van Dijk J, Kroesen GMW, Bogaerts A London (2009).
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Colloquium Spectroscopicum Internationale 34: a collection of papers presented at the Colloquium Spectroscopicum Internationale, Antwerp, Belgium, 4-9 September 2005”. Janssens K, Bogaerts A, van Grieken R Elsevier, Amsterdam (2006).
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Colloquium Spectroscopicum Internationale 34 (CSI 34), Antwerp, Belgium, 4-9 September 2005”. Bogaerts A, Janssens K, van Grieken R Elsevier, Amsterdam (2006).
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Computer simulations of laser ablation, plume expansion and plasma formation”. Bogaerts A, Aghaei M, Autrique D, Lindner H, Chen Z, Wendelen W Trans Tech, Aedermannsdorf, page 1 (2011).
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