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Author | Georgieva, V.; Todorov, I.T.; Bogaerts, A. | ||||
Title | Molecular dynamics simulation of oxide thin film growth: importance of the inter-atomic interaction potential | Type | A1 Journal article | ||
Year | 2010 | Publication | Chemical physics letters | Abbreviated Journal | Chem Phys Lett |
Volume | 485 | Issue | 4/6 | Pages | 315-319 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | A molecular dynamics (MD) study of MgxAlyOz thin films grown by magnetron sputtering is presented using an ionic model and comparing two potential sets with formal and partial charges. The applicability of the model and the reliability of the potential sets for the simulation of thin film growth are discussed. The formal charge potential set was found to reproduce the thin film structure in close agreement with the structure of the experimentally grown thin films. Graphical abstract A molecular dynamics study of growth of MgxAlyOz thin films is presented using an ionic model and comparing two potential sets with formal and partial charges. The simulation results with the formal charge potential set showed a transition in the film from a crystalline to an amorphous structure, when the Mg metal content decreases below 50% in very close agreement with the structure of the experimentally deposited films. | ||||
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Corporate Author | Thesis | ||||
Publisher | Place of Publication | Amsterdam | Editor | ||
Language | Wos | 000273782600010 | Publication Date | 2010-01-05 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0009-2614; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.815 | Times cited | 16 | Open Access | |
Notes | Approved | Most recent IF: 1.815; 2010 IF: 2.282 | |||
Call Number | UA @ lucian @ c:irua:80023 | Serial | 2170 | ||
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Author | Kremer, S.P.B.; Kirschhock, C.E.A.; Aerts, A.; Aerts, C.A.; Houthoofd, K.J.; Grobet, P.J.; Jacobs, P.A.; Lebedev, O.I.; Van Tendeloo, G.; Martens, J.A. | ||||
Title | Zeotile-2: a microporous analogue of MCM-48 | Type | A1 Journal article | ||
Year | 2005 | Publication | Solid state sciences | Abbreviated Journal | Solid State Sci |
Volume | 7 | Issue | 7 | Pages | 861-867 |
Keywords | A1 Journal article; Electron microscopy for materials research (EMAT) | ||||
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Corporate Author | Thesis | ||||
Publisher | Place of Publication | Amsterdam | Editor | ||
Language | Wos | 000230259500006 | Publication Date | 2005-04-20 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 1293-2558; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.811 | Times cited | 10 | Open Access | |
Notes | Approved | Most recent IF: 1.811; 2005 IF: 1.708 | |||
Call Number | UA @ lucian @ c:irua:54702 | Serial | 3931 | ||
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Author | Cenian, A.; Chernukho, A.; Bogaerts, A.; Gijbels, R. | ||||
Title | Comment on 'Integral cross sections for electron impact excitation of electronic states of N2' | Type | Editorial | ||
Year | 2002 | Publication | Journal of physics: B : atomic and molecular physics | Abbreviated Journal | J Phys B-At Mol Opt |
Volume | 35 | Issue | 24 | Pages | 5163-5166 |
Keywords | Editorial; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | Based on the existing experimental data and their statistical errors, it is not possible to make a sound recommendation of the cross-section set of Campbell et al (J. Phys. B: At. Mol. Opt. Phys. 34 (2001) 1185). We comment on this paper. | ||||
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Publisher | Iop publishing ltd | Place of Publication | Bristol | Editor | |
Language | Wos | 000180629500021 | Publication Date | 2002-12-05 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0953-4075; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.792 | Times cited | 2 | Open Access | |
Notes | Approved | Most recent IF: 1.792; 2002 IF: 1.969 | |||
Call Number | UA @ lucian @ c:irua:40193 | Serial | 409 | ||
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Author | Mortet, V.; Zhang, L.; Eckert, M.; D'Haen, J.; Soltani, A.; Moreau, M.; Troadec, D.; Neyts, E.; De Jaeger, J.C.; Verbeeck, J.; Bogaerts, A.; Van Tendeloo, G.; Haenen, K.; Wagner, P. | ||||
Title | Grain size tuning of nanocrystalline chemical vapor deposited diamond by continuous electrical bias growth : experimental and theoretical study | Type | A1 Journal article | ||
Year | 2012 | Publication | Physica status solidi : A : applications and materials science | Abbreviated Journal | Phys Status Solidi A |
Volume | 209 | Issue | 9 | Pages | 1675-1682 |
Keywords | A1 Journal article; Electron microscopy for materials research (EMAT); Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | In this work, a detailed structural and spectroscopic study of nanocrystalline diamond (NCD) thin films grown by a continuous bias assisted CVD growth technique is reported. This technique allows the tuning of grain size and phase purity in the deposited material. The crystalline properties of the films are characterized by SEM, TEM, EELS, and Raman spectroscopy. A clear improvement of the crystalline structure of the nanograined diamond film is observed for low negative bias voltages, while high bias voltages lead to thin films consisting of diamond grains of only ∼10 nm nanometer in size, showing remarkable similarities with so-called ultrananocrystalline diamond. These layers arecharacterized by an increasing amount of sp2-bonded carbon content of the matrix in which the diamond grains are embedded. Classical molecular dynamics simulations support the observed experimental data, giving insight in the underlying mechanism for the observed increase in deposition rate with bias voltage. Furthermore, a high atomic concentration of hydrogen has been determined in these films. Finally, Raman scattering analyses confirm that the Raman line observed at ∼1150 cm−1 cannot be attributed to trans-poly-acetylene, which continues to be reported in literature, reassigning it to a deformation mode of CHx bonds in NCD. | ||||
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Publisher | Place of Publication | Editor | |||
Language | Wos | 000308942100009 | Publication Date | 2012-09-04 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 1862-6300; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.775 | Times cited | 31 | Open Access | |
Notes | M.E. and E.N. acknowledge financial support from, respectively, the Institute for Promotion of Innovation through Science and Technology in Flanders (IWT), and the Research Foundation-Flanders (FWO). J.V. gratefully acknowledges financial support from the GOA project “XANES meets ELNES” of the research fund of the University of Antwerp. Calculation support was provided by the University of Antwerp through the core facility CALCUA. G.V.T. acknowledges the ERC grant COUNTATOMS. The work was also financially supported by the joint UAUHasseltMethusalem “NANO” network, the Research Programs G.0068.07 and G.0555.10N of the Research Foundation-Flanders (FWO), the IAP-P6/42 project “Quantum Effects in Clusters and Nanowires”, and by the EU FP7 through the Integrated Infrastructure Initiative “ESMI” (No. 262348), the Marie Curie ITN “MATCON” (PITN-GA-2009-238201), and the Collaborative Project “DINAMO” (No. 245122). | Approved | Most recent IF: 1.775; 2012 IF: 1.469 | ||
Call Number | UA @ lucian @ c:irua:101516UA @ admin @ c:irua:101516 | Serial | 1364 | ||
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Author | Baguer, N.; Georgieva, V.; Calderin, L.; Todorov, I.T.; van Gils, S.; Bogaerts, A. | ||||
Title | Study of the nucleation and growth of TiO2 and ZnO thin films by means of molecular dynamics simulations | Type | A1 Journal article | ||
Year | 2009 | Publication | Journal of crystal growth | Abbreviated Journal | J Cryst Growth |
Volume | 311 | Issue | 16 | Pages | 4034-4043 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | The nucleation and growth of titanium dioxide (TiO2) and zinc oxide (ZnO) thin films on Fe2O3 (hematite), Al2O3 (á-alumina) and SiO2 (á-quartz) are studied by molecular dynamics simulations. The results show the formation of a strong interface region between the substrate and the film in the six systems studied here. A combination of polycrystalline and amorphous phases are observed in the TiO2 films grown on the three substrates. ZnO deposition on the Fe2O3 and Al2O3 crystals yields a monocrystalline film growth. The ZnO film deposited on the SiO2 crystal exhibits less crystallinity. The simulation results are compared with experimental results available in the literature. | ||||
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Publisher | Place of Publication | Amsterdam | Editor | ||
Language | Wos | 000269580100012 | Publication Date | 2009-06-24 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0022-0248; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.751 | Times cited | 23 | Open Access | |
Notes | Approved | Most recent IF: 1.751; 2009 IF: 1.534 | |||
Call Number | UA @ lucian @ c:irua:77453 | Serial | 3338 | ||
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Author | Bogaerts, A.; Yusupov, M.; Razzokov, J.; Van der Paal, J. | ||||
Title | Plasma for cancer treatment: How can RONS penetrate through the cell membrane? Answers from computer modeling | Type | A1 Journal article | ||
Year | 2019 | Publication | Frontiers of Chemical Science and Engineering | Abbreviated Journal | Front Chem Sci Eng |
Volume | Issue | Pages | |||
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | Plasma is gaining increasing interest for cancer treatment, but the underlying mechanisms are not yet fully understood. Using computer simulations at the molecular level, we try to gain better insight in how plasma-generated reactive oxygen and nitrogen species (RONS) can penetrate through the cell membrane. Specifically, we compare the permeability of various (hydrophilic and hydrophobic) RONS across both oxidized and nonoxidized cell membranes. We also study pore formation, and how it is hampered by higher concentrations of cholesterol in the cell membrane, and we illustrate the much higher permeability of H2O2 through aquaporin channels. Both mechanisms may explain the selective cytotoxic effect of plasma towards cancer cells. Finally, we also discuss the synergistic effect of plasma-induced oxidation and electric fields towards pore formation. Keywords plasma medicine, cancer treatment, computer modelling, cell membrane, reactive oxygen and nitrogen species |
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Publisher | Place of Publication | Editor | |||
Language | Wos | 000468848400004 | Publication Date | 2019-03-22 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 2095-0179 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.712 | Times cited | 5 | Open Access | Not_Open_Access: Available from 23.05.2020 |
Notes | We acknowledge financial support from the Research Foundation–Flanders (FWO; Grant Nos. 1200216N and 11U5416N). The computational work was carried out using the Turing HPC infrastructure at the CalcUA core facility of the Universiteit Antwerpen (UA), a division of the Flemish Supercomputer Center VSC, funded by the Hercules Foundation, the Flemish Government (department EWI) and the UA. We are also very thankful to R. Cordeiro for the very interesting discussions. | Approved | Most recent IF: 1.712 | ||
Call Number | PLASMANT @ plasmant @UA @ admin @ c:irua:159977 | Serial | 5172 | ||
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Author | Bogaerts, A.; Grozeva, M. | ||||
Title | Axial non-uniformity of longitudinal hollow cathode discharges for laser applications: numerical modeling and comparison with experiments | Type | A1 Journal article | ||
Year | 2002 | Publication | Applied physics: B: photo-physics and laser chemistry | Abbreviated Journal | Appl Phys B-Lasers O |
Volume | 75 | Issue | Pages | 731-738 | |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
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Publisher | Place of Publication | Berlin | Editor | ||
Language | Wos | 000180587100019 | Publication Date | 2004-03-19 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0946-2171;1432-0649; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.696 | Times cited | 8 | Open Access | |
Notes | Approved | Most recent IF: 1.696; 2002 IF: 2.080 | |||
Call Number | UA @ lucian @ c:irua:44007 | Serial | 211 | ||
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Author | Bogaerts, A.; Grozeva, M. | ||||
Title | Effect of helium/argon gas ratio in a He-Ar-Cu+ IR hollow-cathode discharge laser : modeling study and comparison with experiments | Type | A1 Journal article | ||
Year | 2003 | Publication | Applied physics B : lasers and optics | Abbreviated Journal | Appl Phys B-Lasers O |
Volume | 76 | Issue | 3 | Pages | 299-306 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | The He-Ar-Cu+ IR laser operates in a hollow-cathode discharge, typically in a mixture of helium with a few-% Ar. The population inversion of the Cu+ ion levels, responsible for laser action, is attributed to asymmetric charge transfer between He+ ions and sputtered Cu atoms. The Ar gas is added to promote sputtering of the Cu cathode. In this paper, a hybrid modeling network consisting of several different models for the various plasma species present in a He-Ar-Cu hollow-cathode discharge is applied to investigate the effect of Ar concentration in the gas mixture on the discharge behavior, and to find the optimum He/Ar gas ratio for laser operation. It is found that the densities of electrons, Ar+ ions, Ar-m* metastable atoms, sputtered Cu atoms and Cu+ ions increase upon the addition of more Ar gas, whereas the densities of He+ ions, He-2(+) ions and He-m* metastable atoms drop considerably. The product of the calculated Cu atom and He+ ion densities, which determines the production rate of the upper laser levels, and hence probably also the laser output power, is found to reach a maximum around 1-5% Ar addition. This calculation result is compared to experimental measurements, and reasonable agreement has been reached. | ||||
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Publisher | Place of Publication | Berlin | Editor | ||
Language | Wos | 000182758000017 | Publication Date | 2004-03-19 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0946-2171;1432-0649; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.696 | Times cited | 6 | Open Access | |
Notes | Approved | Most recent IF: 1.696; 2003 IF: 2.012 | |||
Call Number | UA @ lucian @ c:irua:104125 | Serial | 812 | ||
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Author | Bogaerts, A.; Gijbels, R. | ||||
Title | Numerical modelling of gas discharge plasmas for various applications | Type | A1 Journal article | ||
Year | 2003 | Publication | Vacuum: surface engineering, surface instrumentation & vacuum technology | Abbreviated Journal | Vacuum |
Volume | 69 | Issue | Pages | 37-52 | |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | Gas discharge plasmas are used for a wide range of applications. To improve our understanding about gas discharges, which is necessary to obtain good results in the various application fields, we perform numerical modelling of gas discharge plasmas. Various kinds of modelling approaches, for various types of gas discharges, are being used in our group. In this paper, some examples of this modelling work are outlined. (C) 2002 Elsevier Science Ltd. All rights reserved. | ||||
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Publisher | Place of Publication | Oxford | Editor | ||
Language | Wos | 000180739000006 | Publication Date | 2002-12-30 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0042-207X; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.53 | Times cited | 16 | Open Access | |
Notes | Approved | Most recent IF: 1.53; 2003 IF: 0.612 | |||
Call Number | UA @ lucian @ c:irua:40194 | Serial | 2401 | ||
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Author | Kolev, I.; Bogaerts, A. | ||||
Title | Numerical models of the planar magnetron glow discharges | Type | A1 Journal article | ||
Year | 2004 | Publication | Contributions to plasma physics | Abbreviated Journal | Contrib Plasm Phys |
Volume | 44 | Issue | 7/8 | Pages | 582-588 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
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Publisher | Place of Publication | Berlin | Editor | ||
Language | Wos | 000225541000003 | Publication Date | 2004-11-12 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0863-1042;1521-3986; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.44 | Times cited | 22 | Open Access | |
Notes | Approved | Most recent IF: 1.44; 2004 IF: 0.701 | |||
Call Number | UA @ lucian @ c:irua:49069 | Serial | 2402 | ||
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Author | Bogaerts, A.; Gijbels, R.; Goedheer, W. | ||||
Title | Hybrid modeling of a capacitively coupled radio frequency glow discharge in argon: combined Monte Carlo and fluid model | Type | A1 Journal article | ||
Year | 1999 | Publication | Japanese journal of applied physics | Abbreviated Journal | Jpn J Appl Phys |
Volume | 38 | Issue | Pages | 4404-4415 | |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
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Publisher | Place of Publication | Kyoto | Editor | ||
Language | Wos | 000082871400032 | Publication Date | 2002-10-01 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0021-4922;1347-4065; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.384 | Times cited | 45 | Open Access | |
Notes | Approved | Most recent IF: 1.384; 1999 IF: 1.411 | |||
Call Number | UA @ lucian @ c:irua:24922 | Serial | 1523 | ||
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Author | Liu, Y.-X.; Zhang, Y.-R.; Bogaerts, A.; Wang, Y.-N. | ||||
Title | Electromagnetic effects in high-frequency large-area capacitive discharges : a review | Type | A1 Journal article | ||
Year | 2015 | Publication | Journal of vacuum science and technology: A: vacuum surfaces and films | Abbreviated Journal | J Vac Sci Technol A |
Volume | 33 | Issue | 33 | Pages | 020801 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | In traditional capacitively coupled plasmas, the discharge can be described by an electrostatic model, in which the Poisson equation is employed to determine the electrostatic electric field. However, current plasma reactors are much larger and driven at a much higher frequency. If the excitation wavelength k in the plasma becomes comparable to the electrode radius, and the plasma skin depth d becomes comparable to the electrode spacing, the electromagnetic (EM) effects will become significant and compromise the plasma uniformity. In this regime, capacitive discharges have to be described by an EM model, i.e., the full set of Maxwells equations should be solved to address the EM effects. This paper gives an overview of the theory, simulation and experiments that have recently been carried out to understand these effects, which cause major uniformity problems in plasma processing for microelectronics and flat panel display industries. Furthermore, some methods for improving the plasma uniformity are also described and compared. | ||||
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Publisher | A v s amer inst physics | Place of Publication | Melville | Editor | |
Language | Wos | 000355739500007 | Publication Date | 2015-02-12 | |
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Series Volume | Series Issue | Edition | |||
ISSN | 0734-2101;1520-8559; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.374 | Times cited | 10 | Open Access | |
Notes | Approved | Most recent IF: 1.374; 2015 IF: 2.322 | |||
Call Number | c:irua:123541 | Serial | 903 | ||
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Author | Zhang, Y.-R.; Gao, F.; Li, X.-C.; Bogaerts, A.; Wang, Y.-N. | ||||
Title | Fluid simulation of the bias effect in inductive/capacitive discharges | Type | A1 Journal article | ||
Year | 2015 | Publication | Journal of vacuum science and technology: A: vacuum surfaces and films | Abbreviated Journal | J Vac Sci Technol A |
Volume | 33 | Issue | 33 | Pages | 061303 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | Computer simulations are performed for an argon inductively coupled plasma (ICP) with a capacitive radio-frequency bias power, to investigate the bias effect on the discharge mode transition and on the plasma characteristics at various ICP currents, bias voltages, and bias frequencies. When the bias frequency is fixed at 13.56 MHz and the ICP current is low, e.g., 6A, the spatiotemporal averaged plasma density increases monotonically with bias voltage, and the bias effect is already prominent at a bias voltage of 90 V. The maximum of the ionization rate moves toward the bottom electrode, which indicates clearly the discharge mode transition in inductive/capacitive discharges. At higher ICP currents, i.e., 11 and 13 A, the plasma density decreases first and then increases with bias voltage, due to the competing mechanisms between the ion acceleration power dissipation and the capacitive power deposition. At 11 A, the bias effect is still important, but it is noticeable only at higher bias voltages. At 13 A, the ionization rate is characterized by a maximum at the reactor center near the dielectric window at all selected bias voltages, which indicates that the ICP power, instead of the bias power, plays a dominant role under this condition, and no mode transition is observed. Indeed, the ratio of the bias power to the total power is lower than 0.4 over a wide range of bias voltages, i.e., 0300V. Besides the effect of ICP current, also the effect of various bias frequencies is investigated. It is found that the modulation of the bias power to the spatiotemporal distributions of the ionization rate at 2MHz is strikingly different from the behavior observed at higher bias frequencies. Furthermore, the minimum of the plasma density appears at different bias voltages, i.e., 120V at 2MHz and 90V at 27.12 MHz. | ||||
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Publisher | Place of Publication | Editor | |||
Language | Wos | 000365503800020 | Publication Date | 2015-08-07 | |
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Series Volume | Series Issue | Edition | |||
ISSN | 0734-2101;1520-8559; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.374 | Times cited | 9 | Open Access | |
Notes | Approved | Most recent IF: 1.374; 2015 IF: 2.322 | |||
Call Number | c:irua:126824 | Serial | 1229 | ||
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Author | Bogaerts, A.; Naylor, J.; Hatcher, M.; Jones, W.J.; Mason, R. | ||||
Title | Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment | Type | A1 Journal article | ||
Year | 1998 | Publication | Journal of vacuum science and technology: A: vacuum surfaces and films | Abbreviated Journal | J Vac Sci Technol A |
Volume | 16 | Issue | 4 | Pages | 2400-2410 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
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Corporate Author | Thesis | ||||
Publisher | Place of Publication | New York, N.Y. | Editor | ||
Language | Wos | 000074852700061 | Publication Date | 2002-07-27 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0734-2101; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.374 | Times cited | 12 | Open Access | |
Notes | Approved | Most recent IF: 1.374; 1998 IF: 1.612 | |||
Call Number | UA @ lucian @ c:irua:24124 | Serial | 1634 | ||
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Author | Zhang, Y.-R.; Tinck, S.; De Schepper, P.; Wang, Y.-N.; Bogaerts, A. | ||||
Title | Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime | Type | A1 Journal article | ||
Year | 2015 | Publication | Journal of vacuum science and technology: A: vacuum surfaces and films | Abbreviated Journal | J Vac Sci Technol A |
Volume | 33 | Issue | 33 | Pages | 021310 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | A two-dimensional hybrid Monte Carlofluid model, incorporating a full-wave solution of Maxwell's equations, is employed to describe the behavior of high frequency (HF) and very high frequency capacitively coupled plasmas (CCPs), operating both at single frequency (SF) and dual frequency (DF) in a CF4/O2 gas mixture. First, the authors investigate the plasma composition, and the simulations reveal that besides CF4 and O2, also COF2, CF3, and CO2 are important neutral species, and CF+3 and F− are the most important positive and negative ions. Second, by comparing the results of the model with and without taking into account the electromagnetic effects for a SF CCP, it is clear that the electromagnetic effects are important, both at 27 and 60 MHz, because they affect the absolute values of the calculation results and also (to some extent) the spatial profiles, which accordingly affects the uniformity in plasma processing. In order to improve the plasma radial uniformity, which is important for the etch process, a low frequency (LF) source is added to the discharge. Therefore, in the major part of the paper, the plasma uniformity is investigated for both SF and DF CCPs, operating at a HF of 27 and 60 MHz and a LF of 2 MHz. For this purpose, the authors measure the etch rates as a function of position on the wafer in a wide range of LF powers, and the authors compare them with the calculated fluxes toward the wafer of the plasma species playing a role in the etch process, to explain the trends in the measured etch rate profiles. It is found that at a HF of 60 MHz, the uniformity of the etch rate is effectively improved by adding a LF power of 2 MHz and 300 W, while its absolute value increases by about 50%, thus a high etch rate with a uniform distribution is observed under this condition. | ||||
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Publisher | Place of Publication | New York, N.Y. | Editor | ||
Language | Wos | 000355739500026 | Publication Date | 2015-01-29 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0734-2101;1520-8559; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.374 | Times cited | 3 | Open Access | |
Notes | Approved | Most recent IF: 1.374; 2015 IF: 2.322 | |||
Call Number | c:irua:122650 | Serial | 2107 | ||
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Author | Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. | ||||
Title | Modeling of the target surface modification by reactive ion implantation during magnetron sputtering | Type | A1 Journal article | ||
Year | 2004 | Publication | Journal of vacuum science and technology: A: vacuum surfaces and films | Abbreviated Journal | J Vac Sci Technol A |
Volume | 22 | Issue | 4 | Pages | 1524-1529 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
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Publisher | Place of Publication | New York, N.Y. | Editor | ||
Language | Wos | 000223322000075 | Publication Date | 2004-07-27 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0734-2101; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.374 | Times cited | 13 | Open Access | |
Notes | Approved | Most recent IF: 1.374; 2004 IF: 1.557 | |||
Call Number | UA @ lucian @ c:irua:47331 | Serial | 2137 | ||
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Author | Neyts, E.; Eckert, M.; Bogaerts, A. | ||||
Title | Molecular dynamics simulations of the growth of thin a-C:H films under additional ion bombardment: influence of the growth species and the Ar+ ion kinetic energy | Type | A1 Journal article | ||
Year | 2007 | Publication | Chemical vapor deposition | Abbreviated Journal | Chem Vapor Depos |
Volume | 13 | Issue | 6/7 | Pages | 312-318 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | |||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | Place of Publication | Weinheim | Editor | ||
Language | Wos | 000248381800007 | Publication Date | 2007-07-10 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0948-1907;1521-3862; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.333 | Times cited | 14 | Open Access | |
Notes | Approved | Most recent IF: 1.333; 2007 IF: 1.936 | |||
Call Number | UA @ lucian @ c:irua:64532 | Serial | 2176 | ||
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Author | Eckert, M.; Neyts, E.; Bogaerts, A. | ||||
Title | Molecular dynamics simulations of the sticking and etch behavior of various growth species of (ultra)nanocrystalline diamond films | Type | A1 Journal article | ||
Year | 2008 | Publication | Chemical vapor deposition | Abbreviated Journal | Chem Vapor Depos |
Volume | 14 | Issue | 7/8 | Pages | 213-223 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | The reaction behavior of species that may affect the growth of ultrananocrystal line and nanocrystalline diamond ((U)NCD) films is investigated by means of molecular dynamics simulations. Impacts of CHx (x = 0 – 4), C2Hx (x=0-6), C3Hx (x=0-2), C4Hx (x = 0 – 2), H, and H-2 on clean and hydrogenated diamond (100)2 x 1 and (111) 1 x 1 surfaces at two different substrate temperatures are simulated. We find that the different bonding structures of the two surfaces cause different temperature effects on the sticking efficiency. These results predict a temperature-dependent ratio of diamond (100) and (111) growth. Furthermore, predictions of which are the most important hydrocarbon species for (U)NCD growth are made. | ||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | Place of Publication | Weinheim | Editor | ||
Language | Wos | 000259302700008 | Publication Date | 2008-08-18 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0948-1907;1521-3862; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.333 | Times cited | 25 | Open Access | |
Notes | Approved | Most recent IF: 1.333; 2008 IF: 1.483 | |||
Call Number | UA @ lucian @ c:irua:70001 | Serial | 2177 | ||
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Author | Baguer, N.; Neyts, E.; van Gils, S.; Bogaerts, A. | ||||
Title | Study of atmospheric MOCVD of TiO2 thin films by means of computational fluid dynamics simulations | Type | A1 Journal article | ||
Year | 2008 | Publication | Chemical vapor deposition | Abbreviated Journal | Chem Vapor Depos |
Volume | 14 | Issue | 11/12 | Pages | 339-346 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | This paper presents the computational study of the metal-organic (MO) CVD of titanium dioxide (TiO2) films grown using titanium tetraisopropoxide (TTIP) as a precursor and nitrogen as a carrier gas. The TiO2 films are deposited under atmospheric pressure. The effects of the precursor concentration, the substrate temperature, and the hydrolysis reaction on the deposition process are investigated. It is found that hydrolysis of the TTIP decreases the onset temperature of the gas-phase thermal decomposition, and that the deposition rate increases with the precursor concentration and with the decrease of substrate temperature. Concerning the mechanism responsible for the film growth, the model shows that at the lowest precursor concentration, the direct adsorption of the precursor is dominant, while at higher precursor concentrations, the monomer deposition becomes more important. | ||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | Place of Publication | Weinheim | Editor | ||
Language | Wos | 000262215800003 | Publication Date | 2008-12-18 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0948-1907;1521-3862; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.333 | Times cited | 14 | Open Access | |
Notes | Approved | Most recent IF: 1.333; 2008 IF: 1.483 | |||
Call Number | UA @ lucian @ c:irua:71905 | Serial | 3325 | ||
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Author | Vekemans, B.; Janssens, K.; Vincze, L.; Aerts, A.; Adams, F.; Hertogen, J. | ||||
Title | Automated segmentation of μ-XRF image sets | Type | A1 Journal article | ||
Year | 1997 | Publication | X-ray spectrometry | Abbreviated Journal | X-Ray Spectrom |
Volume | 26 | Issue | Pages | 333-346 | |
Keywords | A1 Journal article; AXES (Antwerp X-ray Analysis, Electrochemistry and Speciation) | ||||
Abstract | |||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | Place of Publication | Editor | |||
Language | Wos | A1997YG79300005 | Publication Date | ||
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0049-8246 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.298 | Times cited | Open Access | ||
Notes | Approved | Most recent IF: 1.298; 1997 IF: 1.307 | |||
Call Number | UA @ admin @ c:irua:18319 | Serial | 5486 | ||
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Author | Janssens, K.; Vittiglio, G.; Deraedt, I.; Aerts, A.; Vekemans, B.; Vincze, L.; Wei, F.; de Ryck, I.; Schalm, O.; Adams, F.; Rindby, A.; Knöchel, A.; Simionovici, A.S.; Snigirev, A. | ||||
Title | Use of microscopic XRF for non-destructive analysis in art an archaeometry | Type | A1 Journal article | ||
Year | 2000 | Publication | X-ray spectrometry | Abbreviated Journal | X-Ray Spectrom |
Volume | 29 | Issue | Pages | 73-91 | |
Keywords | A1 Journal article; AXES (Antwerp X-ray Analysis, Electrochemistry and Speciation) | ||||
Abstract | |||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | Place of Publication | Editor | |||
Language | Wos | 000085107800010 | Publication Date | 2002-08-25 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0049-8246 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.298 | Times cited | Open Access | ||
Notes | Approved | Most recent IF: 1.298; 2000 IF: 1.478 | |||
Call Number | UA @ admin @ c:irua:27561 | Serial | 5897 | ||
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Author | Pietanza, L.D.; Guaitella, O.; Aquilanti, V.; Armenise, I.; Bogaerts, A.; Capitelli, M.; Colonna, G.; Guerra, V.; Engeln, R.; Kustova, E.; Lombardi, A.; Palazzetti, F.; Silva, T. | ||||
Title | Advances in non-equilibrium $$\hbox {CO}_2$$ plasma kinetics: a theoretical and experimental review | Type | A1 Journal Article | ||
Year | 2021 | Publication | European Physical Journal D | Abbreviated Journal | Eur Phys J D |
Volume | 75 | Issue | 9 | Pages | 237 |
Keywords | A1 Journal Article; Plasma, laser ablation and surface modeling Antwerp (PLASMANT) ; | ||||
Abstract | Numerous applications have required the study of CO2 plasmas since the 1960s, from CO2 lasers to spacecraft heat shields. However, in recent years, intense research activities on the subject have restarted because of environmental problems associated with CO2 emissions. The present review provides a synthesis of the current state of knowledge on the physical chemistry of cold CO2 plasmas. In particular, the different modeling approaches implemented to address specific aspects of CO2 plasmas are presented. Throughout the paper, the importance of conducting joint experimental, theoretical and modeling studies to elucidate the complex couplings at play in CO2 plasmas is emphasized. Therefore, the experimental data that are likely to bring relevant constraints to the different modeling approaches are first reviewed. Second, the calculation of some key elementary processes obtained with semi-empirical, classical and quantum methods is presented. In order to describe the electron kinetics, the latest coherent sets of cross section satisfying the constraints of “electron swarm” analyses are introduced, and the need for self-consistent calculations for determining accurate electron energy distribution function (EEDF) is evidenced. The main findings of the latest zero-dimensional (0D) global models about the complex chemistry of CO2 and its dissociation products in different plasma discharges are then given, and full state-to-state (STS) models of only the vibrational-dissociation kinetics developed for studies of spacecraft shields are described. Finally, two important points for all applications using CO2 containing plasma are discussed: the role of surfaces in contact with the plasma, and the need for 2D/3D models to capture the main features of complex reactor geometries including effects induced by fluid dynamics on the plasma properties. In addition to bringing together the latest advances in the description of CO2 non-equilibrium plasmas, the results presented here also highlight the fundamental data that are still missing and the possible routes that still need to be investigated. | ||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | Place of Publication | Editor | |||
Language | Wos | 000692394800001 | Publication Date | 2021-09-01 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 1434-6060 | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.288 | Times cited | Open Access | OpenAccess | |
Notes | Russian Science Foundation, project 19-11-00041 ; Marie Skłodowska-Curie Actions, grant agreement 813393 grant agreement 813393 ; H2020 Marie Skłodowska-Curie Actions, grant agreement 813393 grant agreement 813393 ; Fundação para a Ciência e a Tecnologia, UIDB/50010/2020 and UIDP/50010/2020 UIDB/50010/2020 and UIDP/50010/2020 ; Università degli Studi di Perugia, AMIS project (Dipartimenti di Eccellenza-2018-2022) Dipartimento di Chimica, Biologia e Biotecnologie (Fondo Ricerca di Base 2019 program)) ; agenzia spaziale italiana, ASI N. 2019-3-U.0 ; The work of Kustova is supported by the Russian Science Foundation, project 19-11-00041. The work of Guerra, Bogaerts, Engeln and Guaitella has received funding from the European Union’s Horizon 2020 research and innovation programme under the Marie SklodowskaCurie grant agreement No 813393, Guerra and Silva were partially funded by the Portuguese FCT – Fundação para | Approved | Most recent IF: 1.288 | ||
Call Number | PLASMANT @ plasmant @c:irua:181081 | Serial | 6809 | ||
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Author | Bogaerts, A.; Gijbels, R.; Grozeva, M.; Sabotinov, N. | ||||
Title | Investigation of laser output power saturation in the He-Cu+ IR hollow cathode discharge laser by experiments and numerical modeling | Type | A1 Journal article | ||
Year | 2003 | Publication | Physica scripta | Abbreviated Journal | Phys Scripta |
Volume | T105 | Issue | Pages | 90-97 | |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | |||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | Place of Publication | Stockholm | Editor | ||
Language | Wos | 000184344900014 | Publication Date | 2003-07-31 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0031-8949; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.28 | Times cited | Open Access | ||
Notes | Approved | Most recent IF: 1.28; 2003 IF: 0.688 | |||
Call Number | UA @ lucian @ c:irua:44019 | Serial | 1733 | ||
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Author | Bogaerts, A.; Chen, Z.; Gijbels, R. | ||||
Title | Glow discharge modelling: from basic understanding towards applications | Type | A1 Journal article | ||
Year | 2003 | Publication | Surface and interface analysis | Abbreviated Journal | Surf Interface Anal |
Volume | 35 | Issue | Pages | 593-603 | |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | |||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | Place of Publication | London | Editor | ||
Language | Wos | 000184687500007 | Publication Date | 2003-08-01 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0142-2421;1096-9918; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.132 | Times cited | 14 | Open Access | |
Notes | Approved | Most recent IF: 1.132; 2003 IF: 1.014 | |||
Call Number | UA @ lucian @ c:irua:44020 | Serial | 1350 | ||
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Author | Chen, Z.Y.; Bogaerts, A.; Depla, D.; Ignatova, V. | ||||
Title | Dynamic Monte Carlo simulation for reactive sputtering of aluminium | Type | A1 Journal article | ||
Year | 2003 | Publication | Nuclear instruments and methods in physics research: B | Abbreviated Journal | Nucl Instrum Meth B |
Volume | 207 | Issue | Pages | 415-423 | |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | |||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | Place of Publication | Editor | |||
Language | Wos | 000184051300006 | Publication Date | 2003-03-25 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0168-583X; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.109 | Times cited | 20 | Open Access | |
Notes | Approved | Most recent IF: 1.109; 2003 IF: 1.041 | |||
Call Number | UA @ lucian @ c:irua:44016 | Serial | 762 | ||
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Author | Neyts, E.; Bogaerts, A.; Gijbels, R.; Benedikt, J.; van de Sanden, M.C.M. | ||||
Title | Molecular dynamics simulation of the impact behaviour of various hydrocarbon species on DLC | Type | A1 Journal article | ||
Year | 2005 | Publication | Nuclear instruments and methods in physics research: B: beam interactions with materials and atoms | Abbreviated Journal | Nucl Instrum Meth B |
Volume | 228 | Issue | Pages | 315-318 | |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | |||||
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Corporate Author | Thesis | ||||
Publisher | Place of Publication | Amsterdam | Editor | ||
Language | Wos | 000226669800052 | Publication Date | 2004-12-06 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0168-583X; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.109 | Times cited | 19 | Open Access | |
Notes | Approved | Most recent IF: 1.109; 2005 IF: 1.181 | |||
Call Number | UA @ lucian @ c:irua:49873 | Serial | 2172 | ||
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Author | Neyts, E.; Yan, M.; Bogaerts, A.; Gijbels, R. | ||||
Title | PIC-MC simulation of an RF capacitively coupled Ar/H2 discharge | Type | A1 Journal article | ||
Year | 2003 | Publication | Nuclear instruments and methods in physics research: B | Abbreviated Journal | Nucl Instrum Meth B |
Volume | 202 | Issue | Pages | 300-304 | |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | |||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | Place of Publication | Editor | |||
Language | Wos | 000182122500048 | Publication Date | 2003-03-26 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0168-583X; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.109 | Times cited | 8 | Open Access | |
Notes | Approved | Most recent IF: 1.109; 2003 IF: 1.041 | |||
Call Number | UA @ lucian @ c:irua:44015 | Serial | 2620 | ||
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Author | Kolev, I.; Bogaerts, A. | ||||
Title | Detailed numerical investigation of a DC sputter magnetron | Type | A1 Journal article | ||
Year | 2006 | Publication | IEEE transactions on plasma science | Abbreviated Journal | Ieee T Plasma Sci |
Volume | 34 | Issue | 3 | Pages | 886-894 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | |||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | Place of Publication | New York, N.Y. | Editor | ||
Language | Wos | 000238582700019 | Publication Date | 2006-06-21 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0093-3813; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.052 | Times cited | 28 | Open Access | |
Notes | Approved | Most recent IF: 1.052; 2006 IF: 1.144 | |||
Call Number | UA @ lucian @ c:irua:58198 | Serial | 667 | ||
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Author | Yan, M.; Bogaerts, A.; Gijbels, R. | ||||
Title | Evolution of charged particle densities after laser-induced photodetachment in a strongly electronegative RF discharge | Type | A1 Journal article | ||
Year | 2002 | Publication | IEEE transactions on plasma science | Abbreviated Journal | Ieee T Plasma Sci |
Volume | 30 | Issue | 1 | Pages | 132-133 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | |||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | Place of Publication | New York, N.Y. | Editor | ||
Language | Wos | 000175845900065 | Publication Date | 2002-11-07 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0093-3813; | ISBN | Additional Links | UA library record; WoS full record | |
Impact Factor | 1.052 | Times cited | Open Access | ||
Notes | Approved | Most recent IF: 1.052; 2002 IF: 1.170 | |||
Call Number | UA @ lucian @ c:irua:40186 | Serial | 1097 | ||
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Author | de Bleecker, K.; Bogaerts, A.; Goedheer, W.; Gijbels, R. | ||||
Title | Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model | Type | A1 Journal article | ||
Year | 2004 | Publication | IEEE transactions on plasma science | Abbreviated Journal | Ieee T Plasma Sci |
Volume | 32 | Issue | 2 | Pages | 691-698 |
Keywords | A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) | ||||
Abstract | |||||
Address | |||||
Corporate Author | Thesis | ||||
Publisher | Place of Publication | New York, N.Y. | Editor | ||
Language | Wos | 000222278400026 | Publication Date | 2004-06-30 | |
Series Editor | Series Title | Abbreviated Series Title | |||
Series Volume | Series Issue | Edition | |||
ISSN | 0093-3813; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
Impact Factor | 1.052 | Times cited | 29 | Open Access | |
Notes | Approved | Most recent IF: 1.052; 2004 IF: 1.042 | |||
Call Number | UA @ lucian @ c:irua:46379 | Serial | 1732 | ||
Permanent link to this record |