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Author Title Year Publication Volume Times cited Additional Links
Bellizotti Souza, J.C.; Vizarim, N.P.; Reichhardt, C.J.O.; Reichhardt, C.; Venegas, P.A. Clogging, diode and collective effects of skyrmions in funnel geometries 2022 New journal of physics 24 UA library record; WoS full record; WoS citing articles
Yorulmaz, U.; Šabani, D.; Yagmurcukardes, M.; Sevik, C.; Milošević, M.V. High-throughput analysis of tetragonal transition metal Xenes 2022 Physical chemistry, chemical physics 24 1 UA library record; WoS full record; WoS citing articles
Andelkovic, M.; Rakhimov, K.Y.; Chaves, A.; Berdiyorov, G.R.; Milošević, M.V. Wave-packet propagation in a graphene geometric diode 2023 Physica. E: Low-dimensional systems and nanostructures 147 1 UA library record; WoS full record; WoS citing articles
Bellizotti Souza, J.C.; Vizarim, N.P.; Reichhardt, C.J.O.; Reichhardt, C.; Venegas, P.A. Spontaneous skyrmion conformal lattice and transverse motion during dc and ac compression 2023 New journal of physics 25 UA library record; WoS full record; WoS citing articles
Hassani, N.; Yagmurcukardes, M.; Peeters, F.M.; Neek-Amal, M. Chlorinated phosphorene for energy application 2024 Computational materials science 231 2 UA library record; WoS full record; WoS citing articles
Duran, T.A.; Šabani, D.; Milošević, M.V.; Sahin, H. Experimental and theoretical investigation of synthesis and properties of dodecanethiol-functionalized MoS₂ 2023 Physical chemistry, chemical physics 25 UA library record; WoS full record
Dong, H.M.; Liang, H.P.; Tao, Z.H.; Duan, Y.F.; Milošević, M.V.; Chang, K. Interface thermal conductivities induced by van der Waals interactions 2024 Physical chemistry, chemical physics 26 UA library record; WoS full record
Zhou, S.; Zhang, C.; Xu, W.; Zhang, J.; Xiao, Y.; Ding, L.; Wen, H.; Cheng, X.; Hu, C.; Li, H.; Li, X.; Peeters, F.M. Observation of temperature induced phase transitions in TiO superconducting thin film via infrared measurement 2024 Infrared physics and technology 137 UA library record; WoS full record
Gogoi, A.; Neyts, E.C.; Peeters, F.M. Reduction-enhanced water flux through layered graphene oxide (GO) membranes stabilized with H3O+ and OH- ions 2024 Physical chemistry, chemical physics 26 UA library record; WoS full record
Xiao, H.; Wen, H.; Xu, W.; Cheng, Y.; Zhang, J.; Cheng, X.; Xiao, Y.; Ding, L.; Li, H.; He, B.; Peeters, F.M. Terahertz magneto-optical properties of Nitrogen-doped diamond 2024 Infrared physics and technology 138 UA library record; WoS full record
Hassani, N.; Movafegh-Ghadirli, A.; Mahdavifar, Z.; Peeters, F.M.; Neek-Amal, M. Two new members of the covalent organic frameworks family : crystalline 2D-oxocarbon and 3D-borocarbon structures 2024 Computational materials science 241 UA library record; WoS full record
Kolev, S.; Bogaerts, A. A 2D model for a gliding arc discharge 2015 Plasma sources science and technology 24 34 UA library record; WoS full record; WoS citing articles
Bultinck, E.; Bogaerts, A. Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model 2011 Plasma sources science and technology 20 7 UA library record; WoS full record; WoS citing articles
Bogaerts, A. Comprehensive modelling network for dc glow discharges in argon 1999 Plasma sources science and technology 8 27 UA library record; WoS full record; WoS citing articles
Tinck, S.; Bogaerts, A. Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition 2011 Plasma sources science and technology 20 11 UA library record; WoS full record; WoS citing articles
Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges 2010 Plasma sources science and technology 19 116 UA library record; WoS full record; WoS citing articles
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations 2011 Plasma sources science and technology 20 38 UA library record; WoS full record; WoS citing articles
Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis 2015 Plasma sources science and technology 24 11 UA library record; WoS full record; WoS citing articles
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma 2012 Plasma sources science and technology 21 23 UA library record; WoS full record; WoS citing articles
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges 2013 Plasma sources science and technology 22 20 UA library record; WoS full record; WoS citing articles
Kálna, K.; Mo×ko, M.; Peeters, F.M. Electron capture in GaAs quantum wells via electron-electron and optic phonon scattering 1996 Applied physics letters 68 10 UA library record; WoS full record; WoS citing articles
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges 2000 Plasma sources science and technology 9 21 UA library record; WoS full record; WoS citing articles
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation 2013 Plasma sources science and technology 22 13 UA library record; WoS full record; WoS citing articles
Kozák, T.; Bogaerts, A. Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model 2015 Plasma sources science and technology 24 100 UA library record; WoS full record; WoS citing articles
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma 2013 Plasma sources science and technology 22 11 UA library record; WoS full record; WoS citing articles
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas 2013 Plasma sources science and technology 22 9 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux 2005 Plasma sources science and technology 14 9 UA library record; WoS full record; WoS citing articles
Dobbelaere, W.; de Boeck, J.; Heremans, P.; Mertens, R.; Borghs, G.; Luyten, W.; van Landuyt, J. InAs p-n diodes grown on GaAs and GaAs-coated Si by molecular beam epitaxy 1992 Applied physics letters 60 20 UA library record; WoS full record; WoS citing articles
Dobbelaere, W.; de Boeck, J.; Heremans, P.; Mertens, R.; Borghs, G.; Luyten, W.; van Landuyt, J. InAs0.85Sb0.15 infrared photodiodes grown on GaAs and GaAs-coated Si by molecular beam epitaxy 1992 Applied physics letters 600 32 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Gijbels, R. The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces 2002 Plasma sources science and technology 11 51 UA library record; WoS full record; WoS citing articles