|
Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
Felten, A.; Ghijsen, J.; Pireaux, J.-J.; Johnson, R.L.; Whelan, C.M.; Liang, D.; Van Tendeloo, G. |
Effect of oxygen rf-plasma on electronic properties of CNTs |
2007 |
Journal of physics: D: applied physics |
40 |
25 |
UA library record; WoS full record; WoS citing articles |
|
|
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. |
Densification of thin a-C: H films grown from low-kinetic energy hydrocarbon radicals under the influence of H and C particle fluxes: a molecular dynamics study |
2006 |
Journal of physics: D: applied physics |
39 |
3 |
UA library record; WoS full record; WoS citing articles |
|
|
de Bleecker, K.; Herrebout, D.; Bogaerts, A.; Gijbels, R.; Descamps, P. |
One-dimensional modelling of a capacitively coupled rf plasma in silane/helium, including small concentrations of O2 and N2 |
2003 |
Journal of physics: D: applied physics |
36 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Ghica, C.; Nistor, L.C.; Bender, H.; Richard, O.; Van Tendeloo, G.; Ulyashin, A. |
TEM characterization of extended defects induced in Si wafers by H-plasma treatment |
2007 |
Journal of physics: D: applied physics |
40 |
10 |
UA library record; WoS full record; WoS citing articles |
|
|
Verlackt, C.C.W.; Neyts, E.C.; Bogaerts, A. |
Atomic scale behavior of oxygen-based radicals in water |
2017 |
Journal of physics: D: applied physics |
50 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
Mao, M.; Benedikt, J.; Consoli, A.; Bogaerts, A. |
New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
47 |
UA library record; WoS full record; WoS citing articles |
|