|
Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
de Bleecker, K.; Bogaerts, A.; Goedheer, W. |
Modelling of nanoparticle coagulation and transport dynamics in dusty silane discharges |
2006 |
New journal of physics |
8 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
Berezhnoi, S.; Kaganovich, I.; Bogaerts, A.; Gijbels, R. |
Modelling of radio frequency capacitively coupled plasma at intermediate pressures |
1999 |
|
|
|
UA library record; WoS full record; |
|
|
de Keyser, A.; Bogaerts, R.; van Bockstal, L.; Herlach, F.; Karavolas, V.C.; Peeters, F.M.; van de Graaf, W.; Borghs, G. |
Modification of the 2D electronic properties in Si-δ-doped InSb due to surface effects |
1997 |
|
|
|
UA library record |
|
|
Georgieva, V.; Todorov, I.T.; Bogaerts, A. |
Molecular dynamics simulation of oxide thin film growth: importance of the inter-atomic interaction potential |
2010 |
Chemical physics letters |
485 |
16 |
UA library record; WoS full record; WoS citing articles |
|
|
Jian-Ping, N.; Xiao-Dan, L.; Cheng-Li, Z.; You-Min, Q.; Ping-Ni, H.; Bogaerts, A.; Fu-Jun, G. |
Molecular dynamics simulation of temperature effects on CF(3)(+) etching of Si surface |
2010 |
Wuli xuebao |
59 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Neyts, E.; Bogaerts, A.; Gijbels, R.; Benedikt, J.; van de Sanden, M.C.M. |
Molecular dynamics simulation of the impact behaviour of various hydrocarbon species on DLC |
2005 |
Nuclear instruments and methods in physics research: B: beam interactions with materials and atoms |
228 |
19 |
UA library record; WoS full record; WoS citing articles |
|
|
Neyts, E.; Bogaerts, A.; Gijbels, R.; Benedikt, J.; van den Sanden, M.C.M. |
Molecular dynamics simulations for the growth of diamond-like carbon films from low kinetic energy species |
2004 |
Diamond and related materials |
13 |
53 |
UA library record; WoS full record; WoS citing articles |
|
|
Gou, F.; Neyts, E.; Eckert, M.; Tinck, S.; Bogaerts, A. |
Molecular dynamics simulations of Cl+ etching on a Si(100) surface |
2010 |
Journal of applied physics |
107 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
Neyts, E.; Eckert, M.; Bogaerts, A. |
Molecular dynamics simulations of the growth of thin a-C:H films under additional ion bombardment: influence of the growth species and the Ar+ ion kinetic energy |
2007 |
Chemical vapor deposition |
13 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Eckert, M.; Neyts, E.; Bogaerts, A. |
Molecular dynamics simulations of the sticking and etch behavior of various growth species of (ultra)nanocrystalline diamond films |
2008 |
Chemical vapor deposition |
14 |
25 |
UA library record; WoS full record; WoS citing articles |
|
|
Martín, A.; Bordel, N.; Pereiro, R.; Bogaerts, A. |
Monte Carlo analysis of the electron thermalization process in the afterglow of a microsecond dc pulsed glow discharge |
2008 |
Spectrochimica acta: part B : atomic spectroscopy |
63 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
Liu, Y.H.; Neyts, E.; Bogaerts, A. |
Monte Carlo method for simulations of adsorbed atom diffusion on a surface |
2006 |
Diamond and related materials |
15 |
5 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Gijbels, R. |
Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge |
1999 |
IEEE transactions on plasma science |
27 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; van Straaten, M.; Gijbels, R. |
Monte Carlo simulation of an analytical glow discharge: motion of electrons, ions and fast neutrals in the cathode dark space |
1995 |
Spectrochimica acta: part B : atomic spectroscopy |
50 |
95 |
UA library record; WoS full record; WoS citing articles |
|
|
Lindner, H.; Bogaerts, A. |
Multi-element model for the simulation of inductively coupled plasmas : effects of helium addition to the central gas stream |
2011 |
Spectrochimica acta: part B : atomic spectroscopy |
66 |
28 |
UA library record; WoS full record; WoS citing articles |
|
|
Liu, Y.H.; Chen, Z.Y.; Yu, M.Y.; Bogaerts, A. |
Multiple void formation in plasmas containing multispecies charged grains |
2006 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
74 |
21 |
UA library record; WoS full record; WoS citing articles |
|
|
Bleiner, D.; Bogaerts, A. |
Multiplicity and contiguity of ablation mechanisms in laser-assisted analytical micro-sampling |
2006 |
Spectrochimica acta: part B : atomic spectroscopy |
61 |
48 |
UA library record; WoS full record; WoS citing articles |
|
|
de Bleecker, K.; Bogaerts, A.; Goedheer, W.J. |
Nanoparticle growth and transport mechanisms in capacitively coupled silane discharges: a numerical investigation |
2005 |
|
|
|
UA library record; WoS full record; |
|
|
Bogaerts, A.; Chen, Z. |
Nanosecond laser ablation of Cu: modeling of the expansion in He background gas, and comparison with expansion in vacuum |
2004 |
Journal of analytical atomic spectrometry |
19 |
39 |
UA library record; WoS full record; WoS citing articles |
|
|
Georgieva, V.; Bogaerts, A. |
Negative ion behavior in single- and dual-frequency plasma etching reactors: particle-in-cell/Monte Carlo collision study |
2006 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
73 |
7 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Gijbels, R. |
New developments and applications in GDMS |
1999 |
Fresenius' journal of analytical chemistry |
364 |
17 |
UA library record; WoS full record; WoS citing articles |
|
|
Khalilov, U.; Pourtois, G.; Huygh, S.; van Duin, A.C.T.; Neyts, E.C.; Bogaerts, A. |
New mechanism for oxidation of native silicon oxide |
2013 |
The journal of physical chemistry: C : nanomaterials and interfaces |
117 |
24 |
UA library record; WoS full record; WoS citing articles |
|
|
Mao, M.; Benedikt, J.; Consoli, A.; Bogaerts, A. |
New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
47 |
UA library record; WoS full record; WoS citing articles |
|
|
Van Gaens, W.; Iseni, S.; Schmidt-Bleker, A.; Weltmann, K.-D.; Reuter, S.; Bogaerts, A. |
Numerical analysis of the effect of nitrogen and oxygen admixtures on the chemistry of an argon plasma jet operating at atmospheric pressure |
2015 |
New journal of physics |
17 |
29 |
UA library record; WoS full record; WoS citing articles |
|
|
Van Gaens, W.; Bruggeman, P.J.; Bogaerts, A. |
Numerical analysis of the NO and O generation mechanism in a needle-type plasma jet |
2014 |
New journal of physics |
16 |
34 |
UA library record; WoS full record; WoS citing articles |
|
|
Jiang, W.; Zhang, Y.; Bogaerts, A. |
Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors |
2014 |
New journal of physics |
16 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Gul, B.; Tinck, S.; De Schepper, P.; Aman-ur-Rehman; Bogaerts, A. |
Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching |
2015 |
Journal of physics: D: applied physics |
48 |
7 |
UA library record; WoS full record; WoS citing articles |
|
|
Georgieva, V.; Bogaerts, A.; Gijbels, R. |
Numerical investigation of ion energy distribution functions in single and dual frequency capacitively coupled plasma reactors |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
69 |
97 |
UA library record; WoS full record; WoS citing articles |
|
|
de Bleecker, K.; Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Numerical investigation of particle formation mechanisms in silane discharges |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
69 |
74 |
UA library record; WoS full record; WoS citing articles |
|
|
Tinck, S.; De Schepper, P.; Bogaerts, A. |
Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas |
2013 |
Plasma processes and polymers |
10 |
3 |
UA library record; WoS full record; WoS citing articles |
|