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Author Title Year Publication Volume Times cited Additional Links
Tinck, S.; Bogaerts, A. Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon 2016 Journal of physics: D: applied physics 49 UA library record; WoS full record; WoS citing articles
Tinck, S.; Bogaerts, A. Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry 2016 Journal of physics: D: applied physics 49 5 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Khosravian, N.; Van der Paal, J.; Verlackt, C.C.W.; Yusupov, M.; Kamaraj, B.; Neyts, E.C. Multi-level molecular modelling for plasma medicine 2016 Journal of physics: D: applied physics 49 11 UA library record; WoS full record; WoS citing articles
Van der Paal, J.; Verlackt, C.C.; Yusupov, M.; Neyts, E.C.; Bogaerts, A. Structural modification of the skin barrier by OH radicals : a reactive molecular dynamics study for plasma medicine 2015 Journal of physics: D: applied physics 48 20 UA library record; WoS full record; WoS citing articles
Tinck, S.; Tillocher, T.; Dussart, R.; Bogaerts, A. Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study 2015 Journal of physics: D: applied physics 48 9 UA library record; WoS full record; WoS citing articles
Gul, B.; Tinck, S.; De Schepper, P.; Aman-ur-Rehman; Bogaerts, A. Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching 2015 Journal of physics: D: applied physics 48 7 UA library record; WoS full record; WoS citing articles