Records |
Author |
Bach, D.; Schneider, R.; Gerthsen, D.; Verbeeck, J.; Sigle, W. |
Title |
EELS of niobium and stoichiometric niobium-oxide phases: part 1: plasmon and Near-edges fine structure |
Type |
A1 Journal article |
Year |
2009 |
Publication |
Microscopy and microanalysis |
Abbreviated Journal |
Microsc Microanal |
Volume |
15 |
Issue |
6 |
Pages |
505-523 |
Keywords |
A1 Journal article; Electron microscopy for materials research (EMAT) |
Abstract |
A comprehensive electron energy-loss spectroscopy study of niobium (Nb) and stable Nb-oxide phases (NbO, NbO2, Nb2O5) was carried out. In this work (Part I), the plasmons and energy-loss near-edge structures (ELNES) of all relevant Nb edges (Nb-N2,3, Nb-M4,5, Nb-M2,3, Nb-M1, and Nb-L2,3) up to energy losses of about 2600 eV and the O-K edge are analyzed with respect to achieving characteristic fingerprints of Nb in different formal oxidation states (0 for metallic Nb, +2 for NbO, +4 for NbO2, and +5 for Nb2O5). Chemical shifts of the Nb-N2,3, Nb-M4,5, Nb-M2,3, and Nb-L2,3 edges are extracted from the spectra that amount to about 4 eV as the oxidation state increases from 0 for Nb to +5 for Nb2O5. Four different microscopes, including a 200 keV ZEISS Libra with monochromator, were used. The corresponding wide range of experimental parameters with respect to the primary electron energy, convergence, and collection semi-angles as well as energy resolution allows an assessment of the influence of the experimental setup on the ELNES of the different edges. Finally, the intensity of the Nb-L2,3 white-line edges is correlated with niobium 4d-state occupancy in the different reference materials. |
Address |
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Corporate Author |
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Thesis |
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Publisher |
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Place of Publication |
Cambridge, Mass. |
Editor |
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Language |
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Wos |
000272433200005 |
Publication Date |
2009-10-27 |
Series Editor |
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Series Title |
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Abbreviated Series Title |
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Series Volume |
|
Series Issue |
|
Edition |
|
ISSN |
1431-9276;1435-8115; |
ISBN |
|
Additional Links |
UA library record; WoS full record; WoS citing articles |
Impact Factor |
1.891 |
Times cited |
55 |
Open Access |
|
Notes |
|
Approved |
Most recent IF: 1.891; 2009 IF: 3.035 |
Call Number |
UA @ lucian @ c:irua:80320UA @ admin @ c:irua:80320 |
Serial |
790 |
Permanent link to this record |
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Author |
Ke, X.; Bals, S.; Cott, D.; Hantschel, T.; Bender, H.; Van Tendeloo, G. |
Title |
Three-dimensional analysis of carbon nanotube networks in interconnects by electron tomography without missing wedge artifacts |
Type |
A1 Journal article |
Year |
2010 |
Publication |
Microscopy and microanalysis |
Abbreviated Journal |
Microsc Microanal |
Volume |
16 |
Issue |
2 |
Pages |
210-217 |
Keywords |
A1 Journal article; Electron microscopy for materials research (EMAT) |
Abstract |
The three-dimensional (3D) distribution of carbon nanotubes (CNTs) grown inside semiconductor contact holes is studied by electron tomography. The use of a specialized tomography holder results in an angular tilt range of ±90°, which means that the so-called missing wedge is absent. The transmission electron microscopy (TEM) sample for this purpose consists of a micropillar that is prepared by a dedicated procedure using the focused ion beam (FIB) but keeping the CNTs intact. The 3D results are combined with energy dispersive X-ray spectroscopy (EDS) to study the relation between the CNTs and the catalyst particles used during their growth. The reconstruction, based on the full range of tilt angles, is compared with a reconstruction where a missing wedge is present. This clearly illustates that the missing wedge will lead to an unreliable interpretation and will limit quantitative studies |
Address |
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Corporate Author |
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Thesis |
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Publisher |
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Place of Publication |
Cambridge, Mass. |
Editor |
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Language |
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Wos |
000276137200011 |
Publication Date |
2010-02-26 |
Series Editor |
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Series Title |
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Abbreviated Series Title |
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Series Volume |
|
Series Issue |
|
Edition |
|
ISSN |
1431-9276;1435-8115; |
ISBN |
|
Additional Links |
UA library record; WoS full record; WoS citing articles |
Impact Factor |
1.891 |
Times cited |
42 |
Open Access |
|
Notes |
Esteem 026019; Fwo; Iap-Vi |
Approved |
Most recent IF: 1.891; 2010 IF: 3.259 |
Call Number |
UA @ lucian @ c:irua:82279 |
Serial |
3642 |
Permanent link to this record |
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Author |
Jinschek, J.R.; Bals, S.; Gopal, V.; Xus, X.; Kisielowski, C. |
Title |
Probing local stoichiometry in InGaN based quantum wells of solid-state LEDs |
Type |
A3 Journal article |
Year |
2004 |
Publication |
Microscopy and microanalysis |
Abbreviated Journal |
Microsc Microanal |
Volume |
10 |
Issue |
S:2 |
Pages |
294-295 |
Keywords |
A3 Journal article; Electron microscopy for materials research (EMAT) |
Abstract |
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Address |
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Corporate Author |
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Thesis |
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Publisher |
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Place of Publication |
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Editor |
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Language |
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Wos |
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Publication Date |
2008-01-04 |
Series Editor |
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Series Title |
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Abbreviated Series Title |
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Series Volume |
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Series Issue |
|
Edition |
|
ISSN |
1431-9276;1435-8115; |
ISBN |
|
Additional Links |
UA library record |
Impact Factor |
1.891 |
Times cited |
|
Open Access |
|
Notes |
|
Approved |
Most recent IF: 1.891; 2004 IF: 2.389 |
Call Number |
UA @ lucian @ c:irua:87599 |
Serial |
2714 |
Permanent link to this record |
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|
|
Author |
Bals, S.; Radmilovic, V.; Kisielowski, C. |
Title |
TEM annular objective apertures fabricated by FIB |
Type |
A1 Journal article |
Year |
2004 |
Publication |
Microscopy and microanalysis |
Abbreviated Journal |
Microsc Microanal |
Volume |
10 |
Issue |
S:2 |
Pages |
1148-1149 |
Keywords |
A1 Journal article; Electron microscopy for materials research (EMAT) |
Abstract |
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Address |
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Corporate Author |
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Thesis |
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Publisher |
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Place of Publication |
Cambridge, Mass. |
Editor |
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Language |
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Wos |
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Publication Date |
2008-01-04 |
Series Editor |
|
Series Title |
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Abbreviated Series Title |
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Series Volume |
|
Series Issue |
|
Edition |
|
ISSN |
1431-9276;1435-8115; |
ISBN |
|
Additional Links |
UA library record |
Impact Factor |
1.891 |
Times cited |
|
Open Access |
|
Notes |
|
Approved |
Most recent IF: 1.891; 2004 IF: 2.389 |
Call Number |
UA @ lucian @ c:irua:87603 |
Serial |
3475 |
Permanent link to this record |
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Author |
Idrissi, H.; Turner, S.; Mitsuhara, M.; Wang, B.; Hata, S.; Coulombier, M.; Raskin, J.-P.; Pardoen, T.; Van Tendeloo, G.; Schryvers, D. |
Title |
Point defect clusters and dislocations in FIB irradiated nanocrystalline aluminum films : an electron tomography and aberration-corrected high-resolution ADF-STEM study |
Type |
A1 Journal article |
Year |
2011 |
Publication |
Microscopy and microanalysis |
Abbreviated Journal |
Microsc Microanal |
Volume |
17 |
Issue |
6 |
Pages |
983-990 |
Keywords |
A1 Journal article; Electron microscopy for materials research (EMAT) |
Abstract |
Focused ion beam (FIB) induced damage in nanocrystalline Al thin films has been characterized using advanced transmission electron microscopy techniques. Electron tomography was used to analyze the three-dimensional distribution of point defect clusters induced by FIB milling, as well as their interaction with preexisting dislocations generated by internal stresses in the Al films. The atomic structure of interstitial Frank loops induced by irradiation, as well as the core structure of Frank dislocations, has been resolved with aberration-corrected high-resolution annular dark-field scanning TEM. The combination of both techniques constitutes a powerful tool for the study of the intrinsic structural properties of point defect clusters as well as the interaction of these defects with preexisting or deformation dislocations in irradiated bulk or nanostructured materials. |
Address |
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Corporate Author |
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Thesis |
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Publisher |
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Place of Publication |
Cambridge, Mass. |
Editor |
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Language |
|
Wos |
000297832300018 |
Publication Date |
2011-10-27 |
Series Editor |
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Series Title |
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Abbreviated Series Title |
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Series Volume |
|
Series Issue |
|
Edition |
|
ISSN |
1431-9276;1435-8115; |
ISBN |
|
Additional Links |
UA library record; WoS full record; WoS citing articles |
Impact Factor |
1.891 |
Times cited |
25 |
Open Access |
|
Notes |
Iap; Fwo |
Approved |
Most recent IF: 1.891; 2011 IF: 3.007 |
Call Number |
UA @ lucian @ c:irua:93627 |
Serial |
2653 |
Permanent link to this record |
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Author |
Bals, S.; Van Aert, S.; Verbeeck, J.; Van Tendeloo, G. |
Title |
Structural, chemical and electronic characterization of ceramic materials using quantitative (scanning) transmission electron microscopy |
Type |
A1 Journal article |
Year |
2007 |
Publication |
Microscopy and microanalysis |
Abbreviated Journal |
Microsc Microanal |
Volume |
13 |
Issue |
S:3 |
Pages |
332-333 |
Keywords |
A1 Journal article; Electron microscopy for materials research (EMAT) |
Abstract |
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Address |
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Corporate Author |
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Thesis |
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Publisher |
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Place of Publication |
Cambridge, Mass. |
Editor |
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Language |
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Wos |
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Publication Date |
2008-02-13 |
Series Editor |
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Series Title |
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Abbreviated Series Title |
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Series Volume |
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Series Issue |
|
Edition |
|
ISSN |
1431-9276;1435-8115; |
ISBN |
|
Additional Links |
UA library record |
Impact Factor |
1.891 |
Times cited |
|
Open Access |
|
Notes |
|
Approved |
Most recent IF: 1.891; 2007 IF: 1.941 |
Call Number |
UA @ lucian @ c:irua:96553 |
Serial |
3224 |
Permanent link to this record |
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Author |
Batenburg, K.J.; Bals, S.; Van Aert, S.; Roelandts, T.; Sijbers, J. |
Title |
Ultra-high resolution electron tomography for materials science : a roadmap |
Type |
A1 Journal article |
Year |
2011 |
Publication |
Microscopy and microanalysis |
Abbreviated Journal |
Microsc Microanal |
Volume |
17 |
Issue |
S:2 |
Pages |
934-935 |
Keywords |
A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab |
Abstract |
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Address |
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Corporate Author |
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Thesis |
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Publisher |
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Place of Publication |
Cambridge, Mass. |
Editor |
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Language |
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Wos |
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Publication Date |
2011-10-07 |
Series Editor |
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Series Title |
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Abbreviated Series Title |
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Series Volume |
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Series Issue |
|
Edition |
|
ISSN |
1431-9276;1435-8115; |
ISBN |
|
Additional Links |
UA library record |
Impact Factor |
1.891 |
Times cited |
|
Open Access |
|
Notes |
|
Approved |
Most recent IF: 1.891; 2011 IF: 3.007 |
Call Number |
UA @ lucian @ c:irua:96554 |
Serial |
3792 |
Permanent link to this record |
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Author |
Van Aert, S.; Verbeeck, J.; Bals, S.; Erni, R.; van Dyck, D.; Van Tendeloo, G. |
Title |
Atomic resolution mapping using quantitative high-angle annular dark field scanning transmission electron microscopy |
Type |
A1 Journal article |
Year |
2009 |
Publication |
Microscopy and microanalysis |
Abbreviated Journal |
Microsc Microanal |
Volume |
15 |
Issue |
S:2 |
Pages |
464-465 |
Keywords |
A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab |
Abstract |
|
Address |
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Corporate Author |
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Thesis |
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Publisher |
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Place of Publication |
Cambridge, Mass. |
Editor |
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Language |
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Wos |
000208119100230 |
Publication Date |
2009-07-27 |
Series Editor |
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Series Title |
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Abbreviated Series Title |
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Series Volume |
|
Series Issue |
|
Edition |
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ISSN |
1431-9276;1435-8115; |
ISBN |
|
Additional Links |
UA library record; WoS full record; WoS citing articles |
Impact Factor |
1.891 |
Times cited |
1 |
Open Access |
|
Notes |
|
Approved |
Most recent IF: 1.891; 2009 IF: 3.035 |
Call Number |
UA @ lucian @ c:irua:96555UA @ admin @ c:irua:96555 |
Serial |
178 |
Permanent link to this record |
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Author |
Verbeeck, J.; Van Aert, S.; Zhang, L.; Haiyan, T.; Schattschneider, P.; Rosenauer, A. |
Title |
Computational aspects in quantitative EELS |
Type |
A1 Journal article |
Year |
2010 |
Publication |
Microscopy and microanalysis |
Abbreviated Journal |
Microsc Microanal |
Volume |
16 |
Issue |
S:2 |
Pages |
240-241 |
Keywords |
A1 Journal article; Electron microscopy for materials research (EMAT) |
Abstract |
|
Address |
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Corporate Author |
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Thesis |
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Publisher |
|
Place of Publication |
Cambridge, Mass. |
Editor |
|
Language |
|
Wos |
|
Publication Date |
2010-08-26 |
Series Editor |
|
Series Title |
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Abbreviated Series Title |
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Series Volume |
|
Series Issue |
|
Edition |
|
ISSN |
1431-9276;1435-8115; |
ISBN |
|
Additional Links |
UA library record |
Impact Factor |
1.891 |
Times cited |
|
Open Access |
|
Notes |
|
Approved |
Most recent IF: 1.891; 2010 IF: 3.259 |
Call Number |
UA @ lucian @ c:irua:96556UA @ admin @ c:irua:96556 |
Serial |
454 |
Permanent link to this record |
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|
|
Author |
van den Broek, W.; Van Aert, S.; van Dyck, D. |
Title |
Fully automated measurement of the modulation transfer function of charge-coupled devices above the Nyquist frequency |
Type |
A1 Journal article |
Year |
2012 |
Publication |
Microscopy and microanalysis |
Abbreviated Journal |
Microsc Microanal |
Volume |
18 |
Issue |
2 |
Pages |
336-342 |
Keywords |
A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab |
Abstract |
The charge-coupled devices used in electron microscopy are coated with a scintillating crystal that gives rise to a severe modulation transfer function (MTF). Exact knowledge of the MTF is imperative for a good correspondence between image simulation and experiment. We present a practical method to measure the MTF above the Nyquist frequency from the beam blocker's shadow image. The image processing has been fully automated and the program is made public. The method is successfully tested on three cameras with various beam blocker shapes. |
Address |
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Corporate Author |
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Thesis |
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Publisher |
|
Place of Publication |
Cambridge, Mass. |
Editor |
|
Language |
|
Wos |
000302084700011 |
Publication Date |
2012-02-14 |
Series Editor |
|
Series Title |
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Abbreviated Series Title |
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Series Volume |
|
Series Issue |
|
Edition |
|
ISSN |
1431-9276;1435-8115; |
ISBN |
|
Additional Links |
UA library record; WoS full record; WoS citing articles |
Impact Factor |
1.891 |
Times cited |
15 |
Open Access |
|
Notes |
Fwo |
Approved |
Most recent IF: 1.891; 2012 IF: 2.495 |
Call Number |
UA @ lucian @ c:irua:96557 |
Serial |
1297 |
Permanent link to this record |