toggle visibility
Search within Results:
Display Options:
Number of records found: 70

Select All    Deselect All
 | 
Citations
 | 
   print
Positive and negative streamer propagation in volume dielectric barrier discharges with planar and porous electrodes”. Zhang Q‐Z, Zhang L, Yang D‐Z, Schulze J, Wang Y‐N, Bogaerts A, Plasma Processes And Polymers 18, 2000234 (2021). http://doi.org/10.1002/ppap.202000234
toggle visibility
Inactivation of the endotoxic biomolecule lipid A by oxygen plasma species : a reactive molecular dynamics study”. Yusupov M, Neyts EC, Verlackt CC, Khalilov U, van Duin ACT, Bogaerts A, Plasma processes and polymers 12, 162 (2015). http://doi.org/10.1002/ppap.201400064
toggle visibility
Impact of plasma oxidation on structural features of human epidermal growth factor”. Yusupov M, Lackmann J-W, Razzokov J, Kumar S, Stapelmann K, Bogaerts A, Plasma processes and polymers 15, 1800022 (2018). http://doi.org/10.1002/ppap.201800022
toggle visibility
Molecular understanding of the possible mechanisms of oligosaccharide oxidation by cold plasma”. Yusupov M, Dewaele D, Attri P, Khalilov U, Sobott F, Bogaerts A, Plasma processes and polymers (2022). http://doi.org/10.1002/ppap.202200137
toggle visibility
Influence of ion energy-distributions and matrix effects on spark source-mass spectrometric analysis”. Vos L, Van Grieken R, International journal of mass spectrometry and ion processes 51, 63 (1983). http://doi.org/10.1016/0020-7381(83)85029-3
toggle visibility
Influence of ion-source geometry in spark source-mass spectrometric analysis”. Vos L, Van Grieken R, International journal of mass spectrometry and ion processes 59, 221 (1984). http://doi.org/10.1016/0168-1176(84)85098-3
toggle visibility
Influence of spark generator parameters in the analysis of graphite-electrodes by spark source-mass spectrometry”. Vos L, Van Grieken R, International journal of mass spectrometry and ion processes 55, 233 (1984). http://doi.org/10.1016/0168-1176(84)87087-1
toggle visibility
Self-consistent 30-band simulation approach for (non-)uniformly strained confined heterostructure tunnel field-effect transistors”. Verreck D, Verhulst AS, Van de Put ML, Sorée B, Magnus W, Collaert N, Mocuta A, Groeseneken G, Simulation of Semiconductor Processes and, Devices (SISPAD)AND DEVICES (SISPAD 2017) , 29 (2017)
toggle visibility
Cold atmospheric plasma treatment of melanoma and glioblastoma cancer cells”. Vermeylen S, De Waele J, Vanuytsel S, De Backer J, Van der Paal J, Ramakers M, Leyssens K, Marcq E, Van Audenaerde J, L J Smits E, Dewilde S, Bogaerts A, Plasma processes and polymers 13, 1195 (2016). http://doi.org/10.1002/ppap.201600116
toggle visibility
Magnetoexcitons in type-II self-assembled quantum dots and quantum-dot superlattices”. Veljkovic D, Tadić, M, Peeters FM, Recent developments in advanced materials and processes 518, 51 (2006)
toggle visibility
Atomic structure of alloys close to phase transitions”. Van Tendeloo G, Schryvers D, Nucleation and growth processes in materials 580, 283 (2000)
toggle visibility
Influence of Gap Size and Dielectric Constant of the Packing Material on the Plasma Behaviour in a Packed Bed DBD Reactor: A Fluid Modelling Study: Influence of Gap Size and Dielectric Constant…”. Van Laer K, Bogaerts A, Plasma processes and polymers 14, 1600129 (2017). http://doi.org/10.1002/ppap.201600129
toggle visibility
Ceramide cross-linking leads to pore formation: Potential mechanism behind CAP enhancement of transdermal drug delivery”. Van der Paal J, Fridman G, Bogaerts A, Plasma processes and polymers 16, 1900122 (2019). http://doi.org/10.1002/PPAP.201900122
toggle visibility
Urban soil exploration through multi-receiver electromagnetic induction and stepped-frequency ground penetrating radar”. Van de Vijver E, Van Meirvenne M, Vandenhaute L, Delefortrie S, De Smedt P, Saey T, Seuntjens P, Environmental science : processes &, impacts 17, 1271 (2015). http://doi.org/10.1039/C5EM00023H
toggle visibility
Ab initio modeling of few-layer dilute magnetic semiconductors”. Tiwari S, Van de Put ML, Sorée B, Vandenberghe WG, International Conference on Simulation of Semiconductor Processes and Devices : [proceedings] T2 –, International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 27-29, 2021, Dallas, TX , 141 (2021). http://doi.org/10.1109/SISPAD54002.2021.9592535
toggle visibility
Carrier transport in a two-dimensional topological insulator nanoribbon in the presence of vacancy defects”. Tiwari S, Van de Put ML, Sorée B, Vandenberghe WG, International Conference on Simulation of Semiconductor Processes and Devices : [proceedings] T2 –, International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 24-26, 2018, Austin, TX , 92 (2018). http://doi.org/10.1109/SISPAD.2018.8551720
toggle visibility
Do ICP-MS based methods fulfill the EU monitoring requirements for the determination of elements in our environment?”.Tirez K, Vanhoof C, Bronders J, Seuntjens P, Bleux N, Berghmans P, De Brucker N, Vanhaecke F, Environmental science : processes &, impacts 17, 2034 (2015). http://doi.org/10.1039/C5EM00289C
toggle visibility
Concurrent effects of wafer temperature and oxygen fraction on cryogenic silicon etching with SF6/O2plasmas”. Tinck S, Tillocher T, Georgieva V, Dussart R, Neyts E, Bogaerts A, Plasma processes and polymers 14, 1700018 (2017). http://doi.org/10.1002/ppap.201700018
toggle visibility
Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas”. Tinck S, De Schepper P, Bogaerts A, Plasma processes and polymers 10, 714 (2013). http://doi.org/10.1002/ppap.201300005
toggle visibility
Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma”. Tinck S, Bogaerts A, Shamiryan D, Plasma processes and polymers 8, 490 (2011). http://doi.org/10.1002/ppap.201000189
toggle visibility
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI)”. Tinck S, Bogaerts A, Plasma processes and polymers 9, 522 (2012). http://doi.org/10.1002/ppap.201100093
toggle visibility
Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation”. Tinck S, Altamirano-Sánchez E, De Schepper P, Bogaerts A, Plasma processes and polymers 11, 52 (2014). http://doi.org/10.1002/ppap.201300062
toggle visibility
The effect of O2 in a humid O2/N2/NOx gas mixture on NOx and N2O remediation by an atmospheric pressure dielectric barrier discharge”. Teodoru S, Kusano Y, Bogaerts A, Plasma processes and polymers 9, 652 (2012). http://doi.org/10.1002/ppap.201100187
toggle visibility
Plasma‐treated liquids in medicine: Let's get chemical”. Tampieri F, Gorbanev Y, Sardella E, Plasma Processes and Polymers 20, e2300077 (2023). http://doi.org/10.1002/ppap.202300077
toggle visibility
Incorporation of fluorescent dyes in atmospheric pressure plasma coatings for in-line monitoring of coating homogeneity”. Somers W, Dubreuil MF, Neyts EC, Vangeneugden D, Bogaerts A, Plasma processes and polymers 11, 678 (2014). http://doi.org/10.1002/ppap.201300178
toggle visibility
Plasma-based liquefaction of methane: The road from hydrogen production to direct methane liquefaction”. Snoeckx R, Rabinovich A, Dobrynin D, Bogaerts A, Fridman A, Plasma processes and polymers 14, 1600115 (2017). http://doi.org/10.1002/ppap.201600115
toggle visibility
Influence of Al content on the properties of MgO grown by reactive magnetron sputtering”. Saraiva M, Chen H, Leroy WP, Mahieu S, Jehanathan N, Lebedev O, Georgieva V, Persoons R, Depla D, Plasma processes and polymers 6, S751 (2009). http://doi.org/10.1002/ppap.200931809
toggle visibility
Investigation of plasma-induced chemistry in organic solutions for enhanced electrospun PLA nanofibers”. Rezaei F, Gorbanev Y, Chys M, Nikiforov A, Van Hulle SWH, Cos P, Bogaerts A, De Geyter N, Plasma processes and polymers 15, 1700226 (2018). http://doi.org/10.1002/ppap.201700226
toggle visibility
Ab-initio study of magnetically intercalated Tungsten diselenide”. Reyntjens PD, Tiwari S, Van de Put ML, Sorée B, Vandenberghe WG, International Conference on Simulation of Semiconductor Processes and Devices : [proceedings] T2 –, International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 23-OCT 06, 2020 , 97 (2020). http://doi.org/10.23919/SISPAD49475.2020.9241592
toggle visibility
Phosphatidylserine flip-flop induced by oxidation of the plasma membrane: a better insight by atomic scale modeling”. Razzokov J, Yusupov M, Vanuytsel S, Neyts EC, Bogaerts A, Plasma processes and polymers 14, 1700013 (2017). http://doi.org/10.1002/ppap.201700013
toggle visibility
Select All    Deselect All
 | 
Citations
 | 
   print

Save Citations:
Export Records: